Gas-liquid-solid three-phase abrasive flow polishing tool based on cavitation effect

Abstract

The invention discloses a gas-liquid-solid three-phase abrasive flow polishing tool based on a cavitation effect. The gas-liquid-solid three-phase abrasive flow polishing tool comprises a gas-liquid-solid mixing device, a cavitation polishing tool and a workpiece fixed platform, and a workpiece is installed on the workpiece fixed platform; the cavitation polishing tool is arranged above the workpiece, the lower bottom face of the cavitation polishing tool is parallel to the upper surface of the workpiece, the gas-liquid-solid mixing device is connected with the cavitation polishing tool and imports mixed gas-liquid-solid three-phase abrasive flow into the cavitation polishing tool. According to the gas-liquid-solid three-phase abrasive flow polishing tool based on the cavitation effect, gas is mixed into liquid-solid two-phase abrasive flow through the gas-liquid-solid mixing device, the collapse probability of bubbles on the workpiece surface is increased, and the polishing efficiencyis provided; a micro-pore, namely, a small pore is used for mixing of air at a gas inlet, so that the mixing quantity of high pressure gas is conveniently controlled, and the machining stability is improved; by utilizing the design of a flow channel with a large inlet and a small outlet, structural cavitation of liquid is realized, and the machining efficiency is improved; and through the designof rounded corners of the cavitation polishing tool, secondary cavitation of the liquid is realized, and the machining efficiency is improved.

Description

technical field [0001] The invention relates to an ultra-precision polishing tool, more specifically, to a gas-liquid-solid three-phase abrasive particle flow polishing tool based on cavitation effect. Background technique [0002] With the development of electronic information technology, precise and ultra-precise optical and semiconductor components are used more and more. It is becoming more and more important to achieve efficient ultra-smooth processing of the surface of optical materials and semiconductor materials. [0003] As an emerging polishing method, liquid polishing is gradually applied to the processing of optical materials and semiconductor materials due to the characteristics of no subsurface damage and low surface roughness during processing. However, the inherent defects of low liquid polishing efficiency are extremely limited. The actual use of liquid polishing is hindered, making it difficult to popularize liquid polishing technology on a large scale in ...

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to solve the defects in the above-mentioned prior art, and propose a gas-liquid-solid three-phase abrasive flow polishing tool based on the cavitation effect. On the basis of not increasing the processing cost, the structure of the polishing tool is changed to improve the current There are problems of low three-phase abrasive flow processing efficiency and uneven polishing removal

Images