Method for preparing array substrate, array substrate, and display device
A technology for array substrates and substrate substrates, which is applied in the fields of preparation of array substrates, display devices, and array substrates. It can solve problems such as uneven brightness and darkness of display devices, and reduced contact conductivity, so as to improve the reduction of contact conductivity and increase the conductivity. performance effect
Active Publication Date: 2020-05-05
BOE TECH GRP CO LTD +1
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Problems solved by technology
[0004] The invention provides a method for preparing an array substrate, an array substrate, and a display device, which are used to solve the gap between the conductive material and the metal reflective layer caused by the protective film formed on the surface of the metal reflective layer in the existing method for preparing the array substrate. The contact conductivity is reduced, which leads to the problem of uneven brightness and darkness of the display device
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[0045] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, not all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the protection scope of the present invention.
[0046] The embodiment of the present invention provides a preparation method of an array substrate to solve the contact conductivity between the conductive material and the metal reflection layer caused by the protective film formed on the surface of the metal reflection layer in the existing preparation method of the array substrate Decrease, which in turn leads to the problem of uneven brightness and darkness in the display device.
[0047] Such...
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The invention relates to the technical field of display and discloses a preparation method of an array substrate, the array substrate and a display device. The preparation method of the array substrate comprises the steps of forming a film of a passivation layer at one side of a substrate; forming a pattern of a metal reflecting layer on the film of the passivation layer; and forming a passivationlayer via hole in the film of the passivation layer through a composition process and forming a thinning area in an electrode coverage area, used for being connected with a source-drain electrode layer, in the metal reflecting layer. The thinning area is formed in the electrode coverage area, used for being connected with the source-drain electrode layer, in the metal reflecting layer in the composition process of forming the passivation layer via hole, and at least one part of protection film in the electrode coverage area can be removed, so that the conductivity of the electrode coverage area can be improved, and the problem of uneven brightness of the display device due to the fact that the contact conductivity between a conductive material and the metal reflecting layer is reduced dueto the protection film formed on the surface of the metal reflecting layer is solved.
Description
Technical field [0001] The invention relates to the field of display technology, in particular to a method for preparing an array substrate, an array substrate, and a display device. Background technique [0002] Liquid crystal display devices can be divided into transmission type, total reflection type and transflective type according to the different light sources used. Among them, the total reflection type display device uses the front light source or the ambient light source as the light source, and does not need to use the backlight source, so the power consumption is low. In the TN (Twiste Dnematic) mode total reflection liquid crystal display device, a metal reflective layer is provided on the surface of the array substrate to reflect the light incident from the outside. The array substrate needs to be made by 6 photolithography processes. , 6 photolithography process to form the gate layer, the active layer, the source and drain electrode layer, the passivation layer, th...
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IPC IPC(8): H01L27/12G02F1/1368
CPCG02F1/136227H01L27/1214H01L27/1259
Inventor 周刚杨小飞沈武林
Owner BOE TECH GRP CO LTD