A method and device for producing granular silicon
A production method and production device technology, applied in the field of granular silicon production methods and devices, can solve the problems of reduced purity in the production of granular silicon, and achieve the effect of ensuring accuracy and sphericity
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Embodiment 1
[0053] The polysilicon charge is processed to obtain a first mixture comprising non-particulate silicon seeds and granular silicon seeds. Specifically include: heating the polysilicon material to form a polysilicon liquid flow, and the heating temperature is 1000°C; dispersing the polysilicon liquid flow into polysilicon droplets, specifically including, using hydrogen gas at 100°C to impact the outflowing polysilicon liquid flow at a speed of 10m / s Dispersing the polysilicon liquid flow into polysilicon droplets; cooling the polysilicon droplets into a first mixture comprising non-granular silicon seeds and granular silicon seeds, specifically comprising, further transporting the polysilicon droplets along with hydrogen to a temperature of 100° C. In the polysilicon droplet cooling device, the polysilicon liquid flow is changed into a first mixture comprising non-granular silicon seed crystals and granular silicon seed crystals.
[0054] sieving the first mixture to separate ...
Embodiment 2
[0060] The polysilicon charge is processed to obtain a first mixture comprising non-particulate silicon seeds and granular silicon seeds. Specifically include: heating the polysilicon material to form a polysilicon liquid flow, and the heating temperature is 1800°C; dispersing the polysilicon liquid flow into polysilicon droplets, specifically including, using hydrogen gas at 100°C to impact the outflowing polysilicon liquid flow at a speed of 10m / s Dispersing the polysilicon liquid flow into polysilicon droplets; cooling the polysilicon droplets into a first mixture comprising non-granular silicon seeds and granular silicon seeds, specifically comprising, further transporting the polysilicon droplets along with hydrogen to a temperature of 100° C. In the polysilicon droplet cooling device, the polysilicon liquid flow is changed into a first mixture comprising non-granular silicon seed crystals and granular silicon seed crystals.
[0061] sieving the first mixture to separate ...
Embodiment 3
[0067] The polysilicon charge is processed to obtain a first mixture comprising non-particulate silicon seeds and granular silicon seeds. Specifically include: heating the polysilicon material to form a polysilicon liquid flow, and the heating temperature is 2300°C; dispersing the polysilicon liquid flow into polysilicon droplets, specifically including, using hydrogen gas at 100°C to impact the outflowing polysilicon liquid flow at a speed of 10m / s Dispersing the polysilicon liquid flow into polysilicon droplets; cooling the polysilicon droplets into a first mixture comprising non-granular silicon seeds and granular silicon seeds, specifically comprising, further transporting the polysilicon droplets along with hydrogen to a temperature of 100° C. In the polysilicon droplet cooling device, the polysilicon liquid flow is changed into a first mixture comprising non-granular silicon seed crystals and granular silicon seed crystals.
[0068] sieving the first mixture to separate ...
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Abstract
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