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Patterning device cooling systems in a lithographic apparatus

A lithography equipment and patterning technology, which is applied in microlithography exposure equipment, photomechanical equipment, exposure equipment for photo-plate making process, etc., can solve the problem of not being able to provide the required level

Active Publication Date: 2018-04-20
ASML NETHERLANDS BV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, with the continued trend towards device size scaling, these correction systems cannot provide the required level of alignment and / or overlay accuracy required for the development of these reduced devices

Method used

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  • Patterning device cooling systems in a lithographic apparatus
  • Patterning device cooling systems in a lithographic apparatus
  • Patterning device cooling systems in a lithographic apparatus

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Embodiment Construction

[0021] The disclosed embodiments merely exemplify the invention. The scope of the invention should not be limited to the disclosed embodiments. The invention is defined by the appended claims.

[0022] Embodiments described in the specification and references to "an example," "one embodiment," "an embodiment," "an exemplary embodiment," "some embodiments," etc. indicate that the embodiments may include particular features, structures or characteristics, but not every embodiment necessarily includes the particular features, structures or characteristics. Furthermore, the phrases are not necessarily referring to the same embodiment. Further, when a specific feature, structure or characteristic is described in conjunction with an embodiment, it should be understood that it is within the scope of those skilled in the art to implement the feature, structure or characteristic in combination with other embodiments whether or not explicitly described.

[0023] Before describing the...

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PUM

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Abstract

The invention discloses patterning device cooling systems in a lithographic apparatus. According to one embodiment of the invention, a lithographic apparatus (100) includes a patterning device supportstructure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to US Application No. 62 / 192,347, filed July 14, 2015, which is hereby incorporated by reference in its entirety. technical field [0003] The present disclosure relates to a system and method for controlling the temperature of an object, such as a patterning device in a lithographic apparatus, by flowing a gas across its surface. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus may, for example, be used in the manufacture of integrated circuits (ICs). In this case, a patterning device such as a mask or reticle may produce the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred to a target portion (eg, a portion comprising one or several dies) on a substrate (eg, a silicon wafer). Transfer of the patt...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70783G03F7/70858G03F7/70875G03F7/70733G03F7/70891
Inventor L·J·A·范博克霍温C·C·瓦尔德M·L·范德加格J·G·C·库南
Owner ASML NETHERLANDS BV