Silicon wafer texturing and transferring device
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- LESHAN TOPRAYCELL
- Publication Date
- 2018-04-27
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Abstract
Description
technical field
[0001] The invention relates to texturing of silicon wafers, in particular to a texturing transfer device for silicon wafers. Background technique
[0002] It is well known that silicon wafers need to be cleaned after a series of processing procedures. The purpose of cleaning is to eliminate all kinds of pollutants adsorbed on the surface of silicon wafers, and to make a suede structure that can reduce the reflection of sunlight on the surface. The degree of cleanliness directly affects the yield and reliability of cells. Texturing is the first process for manufacturing crystalline silicon cells, also known as "surface texturing". The effective textured structure makes the incident light reflect and refract multiple times on the surface of the silicon wafer, which increases the light absorption, reduces the reflectivity, and helps to improve the performance of the battery.
[0003] After the silicon wafer is cleaned, the silicon wafer needs to be transferre...