Polarizer, manufacturing method thereof, and display panel

Abstract

The invention discloses a polaroid and a manufacturing method thereof. The manufacturing method includes the steps of providing a substrate; manufacturing an alignment layer on one surface of the substrate, and conducting alignment on the alignment layer to form rectangular arrays and aligned alignment areas on the alignment layer, wherein the alignment areas are arranged at intervals; manufacturing a composite layer with dichroic dye and liquid crystal mixtures on the surface of the alignment layer, wherein the liquid crystals, facing the alignment areas, in the composite layer deflect underthe alignment force of the alignment layer and become nonopaque. The invention further discloses a display panel. By making an appropriate part of the polaroid be of an opaque grid-shaped structure, when the polaroid serves as a lower polaroid of the display panel, the polaroid can achieve a function similar to that of a black matrix in a color filter and even can completely replace the black matrix, so that the thickness is reduced and even the black matrix can be removed. The light density of the part corresponding to the black matrix is increased, the film thickness of the black matrix is reduced, accordingly an ox-horn phenomenon of color resistance is correspondingly alleviated, and normal display of the display panel is ensured.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to a polarizer, a manufacturing method thereof, and a display panel. Background technique [0002] With the development of display technology, liquid crystal display technology has become one of the mainstreams in the real industry. In the current liquid crystal display structure, the thin film transistor (Thin Film Transistor, TFT for short) substrate and the color filter (CF for short) substrate are respectively located on both sides of the liquid crystal, and the inside of the color filter substrate has R, G, B color resistance and BM (Black Matrix, ie black matrix) is located between each color resist to prevent light leakage. [0003] However, if the OD (Optical Density, that is, optical density) of the BM is insufficient, it will cause problems of light leakage and color mixing in the product, and often due to the existence of the BM on the CF side and the leve...

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Problems solved by technology

[0003] However, if the OD (Optical Density, that is, optical density) of the BM is insufficient, it will cause problems of light leakage and color mixing in the product, and often due to the existence of the BM on the CF side and the leveling of the RGB photoresist, resulting in R, G, B There are horns in the color resistance, which will cause the R, G, B color resistance and the transparent conductive layer on the surface of the BM to break, resulting in abnormal display. If you want to increase the OD of the BM, you must increase the thickness of the BM, which will directly lead to R, G, The aggravation of the problem of B color resistance horns affects the normal display effect

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