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Display substrate, manufacturing method thereof, and display device

A technology for displaying substrates and manufacturing methods, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., and can solve problems such as the influence of etching accuracy and the electrical characteristics of semiconductor layers, and achieve the effect of easy etching accuracy

Active Publication Date: 2022-01-18
HEFEI XINSHENG OPTOELECTRONICS TECH CO LTD +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, due to the influence of the etching precision of the wet etching process, when the metal material layer is etched, the semiconductor layer below the metal material layer will have an over-etching phenomenon (that is, the semiconductor layer is etched), which affects Electrical properties of semiconductor layers

Method used

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  • Display substrate, manufacturing method thereof, and display device
  • Display substrate, manufacturing method thereof, and display device
  • Display substrate, manufacturing method thereof, and display device

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Embodiment Construction

[0048] In order to make the purpose, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings. Obviously, the described embodiments are only some of the embodiments of the present invention, rather than all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0049] With the progress of the manufacturing process of display products, new display technologies gradually replace the old thin film transistor liquid crystal display (English: Thin Film Transistor Liquid Crystal Display; abbreviation: TFT LCD) technology, for example, organic light-emitting diode (English: Organic Light-Emitting Diode (abbreviation: OLED) products are gradually replacing liquid crystal display products in the field o...

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Abstract

The invention discloses a display substrate, a manufacturing method thereof, and a display device, belonging to the field of display technology. The method includes: sequentially forming a gate, a gate insulating layer, and a semiconductor layer on a base substrate; forming a conductive material layer on the base substrate formed with the semiconductor layer; etching the conductive material layer to obtain a source and drain layer, Wherein, the portion on the conductive material layer that is in contact with the semiconductor layer is etched by a dry etching process. The invention helps to avoid the influence of the etching process on the electrical characteristics of the semiconductor layer. The invention is used in the manufacture of display substrates.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a display substrate, a manufacturing method thereof, and a display device. Background technique [0002] The display substrate is the main display component of the display device. According to its structure, the display substrate can be divided into etch stop layer (English: Etch Stop Layer; abbreviation: ESL) structure display substrate, back channel etching (English: Back Channel Etched; abbreviation: BCE) structure display substrate and top gate (English: Top Gate) structure display substrate. The BCE structure shows that the substrate has the advantages of simple structure, which is the key direction of future research and development. [0003] The BCE structure display substrate includes a base substrate, and a gate, a gate insulating layer (English: Gate Insulator; GI for short), a semiconductor layer, a source-drain metal layer, etc., which are sequentially arranged on t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/44H01L21/34H01L29/786H01L29/417
CPCH01L29/401H01L29/41733H01L29/66969H01L29/78603H01L29/7869
Inventor 胡迎宾袁广才赵策丁远奎程磊磊李伟张扬马睿
Owner HEFEI XINSHENG OPTOELECTRONICS TECH CO LTD
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