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Porous film observation window

A porous film and thin film technology, which can be used in measurement devices, material analysis by measuring secondary emissions, and material analysis by optical means, which can solve problems such as large background noise, inability to achieve high-resolution imaging, and easy damage. , to achieve the effect of high-resolution imaging, fast and effective observation and positioning

Pending Publication Date: 2018-06-15
SUZHOU IN SITU CHIP TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The observation and characterization of samples in the biological field such as viruses, cells, etc. are sensitive to changes in the surrounding environment and are prone to damage
Therefore, in the micro-nano characterization means, the above points have many restrictions on the carrier. Although the copper mesh carbon film carrier that exists on the market today can meet most of the observation needs, there are still many deficiencies. For example, it cannot be realized. High-resolution imaging, high background noise, poor affinity for biological samples, difficult to locate, etc.

Method used

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Embodiment Construction

[0034] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.

[0035] Such as figure 1 As shown, the present invention relates to a porous film observation window 100, which includes a substrate 110 and a film 120 with a predetermined thickness. The substrate 110 includes a first surface 111 and a second surface 112 oppositely disposed. Moreover, the thin film 120 is disposed on both the first surface 111 and the second surface 112 . The thin film 120 may be formed on both surfaces of the substrate 110 by means of coating or the like. The shape and size of the film 120 should be consistent with the shape and size of the substrate 110 .

[0036] The substrate 110 is also provided with an observation groove 113 penetratin...

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Abstract

The invention discloses a porous film observation window. The window comprises a substrate and thin films with preset thickness; the substrate comprises a first surface and a second surface which areoppositely arranged; the thin films with the preset thickness are arranged on the first surface and the second surface, and the shapes and sizes of the thin films are conform to the shape and size ofthe substrate; observation grooves penetrating through the first surface and the second surface are formed in the substrate, and the observation grooves also penetrate through the thin film located onthe first surface or the second surface; a plurality of through holes penetrating through the thin films which are not penetrated by the observation grooves are formed in the thin films which are notpenetrated by the observation grooves at intervals, and the through holes correspond to the observation grooves so that samples can be observed through the through holes. According to the window, part of the samples extending out of the through holes or arranged above the through holes can be observed through the arranged through holes to achieve high-definition imaging of the samples.

Description

technical field [0001] The invention relates to the technical field of micro-nano characterization, in particular to a porous film observation window. Background technique [0002] Micro-nano characterization technology plays the most intuitive and basic role in scientific research, and is highly valued by a wide range of researchers. For nanomaterials and biological samples such as viruses and cells, many characterization methods such as TEM (Transmission Electron Microscopy) require a supporting film that allows electron beams to pass through. However, X-ray equipment requires high-quality pressure-resistant and high- and low-energy X-ray transmittance supporting film, and the supporting carrier film needs to meet the requirements of ultra-thin, high temperature resistance, and high pressure resistance to ensure the X-ray transmittance and X-ray transmission. - Vacuum requirements for radiation equipment. The observation and characterization of samples in the biological ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/84G01N21/01G01N23/22
CPCG01N21/01G01N21/8422G01N23/22G01N23/2204G01N2021/0112
Inventor 胡慧珊温赛赛马硕王新亮
Owner SUZHOU IN SITU CHIP TECH CO LTD
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