Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mask plate and mask plate preparation method

A mask and etching zone technology, applied in metal material coating process, vacuum evaporation coating, coating and other directions, can solve problems such as mask or product damage, prevent damage and improve evaporation yield Effect

Active Publication Date: 2020-05-26
KUNSHAN GO VISIONOX OPTO ELECTRONICS CO LTD
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of this, the embodiments of the present invention are dedicated to providing a mask and a mask preparation method to solve the problem that the evaporation particles generated during the evaporation process can easily cause damage to the mask or products

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask plate and mask plate preparation method
  • Mask plate and mask plate preparation method
  • Mask plate and mask plate preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0023] figure 1 Shown is a schematic structural diagram of the mask plate provided by the first embodiment of the present invention. Such as figure 1 As shown, the mask plate 1 provided by the first embodiment of the present invention includes several rectangular opening units 11 opened on the mask plate base material and several elongated non-etching regions 12 arranged parallel to each other adjacent to the opening units 11. At the same time, ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The embodiment of the invention provides a mask plate and a production method thereof. Fully-etched areas comprise a plurality of opening units, wherein a semi-etched area is arranged around each opening unit. According to the mask plate, through a manner of setting semi-etched areas around the opening units, evaporation residual particles adhered to a glass substrate fall into the range of the semi-etched areas of the mask plate in the transmission process of the glass substrate, so that the occurrence of the situation that the mask plate or the evaporation product is damaged by the residualparticles in the evaporation process is effectively avoided; and the evaporation yield is effectively improved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a mask and a method for preparing the mask. Background technique [0002] During the evaporation process of the glass substrate of the display device, the evaporation particles are likely to remain on the glass substrate that is not cleaned cleanly, and the remaining particles on the glass substrate and the remaining particles on the glass substrate transmission channel are easily brought in by the transmission of the glass substrate. Different evaporation chambers (including general metal mask chambers and precision metal mask chambers, etc.), thus causing damage to the mask. [0003] Especially when the particles are brought into the cavity of the precision metal mask, the particles brought into the cavity of the precision metal mask can easily cause dents on the mesh surface of the precision metal mask, which directly causes the product to appear fixed. Irreversible damage s...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/04C23C14/24
CPCC23C14/042C23C14/24
Inventor 欧凌涛甘帅燕卓林海
Owner KUNSHAN GO VISIONOX OPTO ELECTRONICS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com