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Plasma processing apparatus and radio frequency filtering circuit therefor

A technology of radio frequency filtering and processing devices, applied in the field of radio frequency, to reduce the adjustment difficulty and improve the accuracy

Pending Publication Date: 2018-07-10
ADVANCED MICRO FAB EQUIP INC CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the adjustments between the filters at all levels will affect each other, the introduction of each additional level of filter will greatly increase the difficulty of adjusting and setting the filter. Therefore, those skilled in the art are in urgent need of a filter circuit that can reduce the difficulty of adjustment.

Method used

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  • Plasma processing apparatus and radio frequency filtering circuit therefor
  • Plasma processing apparatus and radio frequency filtering circuit therefor
  • Plasma processing apparatus and radio frequency filtering circuit therefor

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Embodiment Construction

[0029] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0030] figure 2 A schematic structural diagram of a plasma processing device is shown, including a vacuum reaction chamber 100, the vacuum reaction chamber includes a substantially cylindrical reaction chamber side wall 105 made of metal material, and an insulating window 130 is arranged above the reaction chamber side wall 105 , an inducti...

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Abstract

The present invention provides a radio frequency (RF) filtering circuit and a plasma processing apparatus employing the RF filtering circuit, wherein the RF filtering circuit comprises a primary filter and a secondary filter, the secondary filter comprises two or more filters connected in parallel, the primary filter is selectively connected to one of the secondary filters through a switch; the RFfiltering circuit further comprises a heating means and a DC power supply for heating the heating means; the primary and secondary filters are disposed between the heating device and the DC power source for filtering radio frequency signals from the heating device into the DC power supply. Utilizing the RF filtering circuit of the present invention may greatly reduce the tuning difficulty, improving the accuracy of the RF filtering circuit.

Description

technical field [0001] The present invention relates to the field of radio frequency technology, in particular to a radio frequency filter circuit capable of filtering out multiple radio frequency power signals and a plasma processing device including the radio frequency filter circuit. Background technique [0002] In the field of radio frequency technology, it is usually necessary to filter out excess radio frequency energy, and for this purpose, a radio frequency filter needs to be set. Moreover, in some processing techniques such as plasma processing, RF sources with multiple RF frequencies are usually used to control different characteristics of plasma processing. In order to filter out the RF energy of multiple different RF frequencies, it is necessary to set up filters with the same number of RF signals to be filtered out, such as figure 1 As shown, when the number of radio frequency signals to be filtered is 3, it is necessary to set up a three-stage filter connecte...

Claims

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Application Information

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IPC IPC(8): H03H1/02H01J37/32
CPCH01J37/32174H03H1/0007H03H1/02
Inventor 梁洁崔强叶如彬
Owner ADVANCED MICRO FAB EQUIP INC CHINA