Cultivation method for lodging-resistant and high-yield corn
A cultivation method and lodging resistance technology, applied in grain cultivation and other directions, can solve problems such as excessive density and underdeveloped root system, and achieve the effects of enhanced root vitality, developed root system, and significant corn lodging effect.
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[0052]A specific embodiment of the present invention will be described in detail below, but it should be understood that the protection scope of the present invention is not limited by the specific embodiment.
[0053] A kind of corn lodging resistance high-yield cultivation method provided by the embodiment of the present invention, its specific method is as follows:
[0054] 1. Plow the land and apply enough basal fertilizer: the plowing depth should reach more than 25cm, and the plowing depth is required to be consistent and the ridges should be turned evenly; combined with plowing, 40% to 50% of all organic fertilizers, nitrogen fertilizers and 70% to 80% of phosphate fertilizers should be used. % as basal fertilizer for full-layer deep application; before site preparation, use 50% acetochlor 100-150g or 90% acetochlor 80-100g, mix with water 30-40kg, evenly spray the soil surface to seal the weeds, and then rake land preparation.
[0055] 2. Seed preparation: use commerc...
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