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Developing solution management apparatus

A technology for managing device and developer, applied in photography, optics, instruments, etc., can solve problems such as difficulty in managing developer

Inactive Publication Date: 2018-07-31
HIRAMA LAB
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] However, it is still difficult to achieve satisfactory developer management with the above-mentioned various developer management attempts

Method used

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Examples

Experimental program
Comparison scheme
Effect test

no. 1 approach 〕

[0092] figure 1 It is a schematic diagram for demonstrating the developing process of the developer solution management apparatus D of this embodiment. The developer solution management device D of the present invention is shown together with the development process equipment A, the replenishing solution storage unit B, the circulating stirring mechanism C, and the like.

[0093] First, the development process facility A will be briefly described.

[0094] The development process equipment A is mainly composed of a developer solution storage tank 61, an overflow tank 62, a developer chamber shield 64, a roller conveyor 65, a developer solution spray nozzle 67, and the like. A developer is stored in the developer storage tank 61 . The composition of the developer is managed by replenishing the replenisher. The developer storage tank 61 includes a liquid level gauge 63 and an overflow tank 62 , and manages an increase in the amount of liquid due to replenishment of the replen...

no. 2 approach 〕

[0121] figure 2 It is a schematic diagram for demonstrating the developing process of the developer solution management apparatus D of this embodiment. The developer solution management device D of the present invention is shown together with the development process equipment A, the replenishing solution storage unit B, the circulating stirring mechanism C, and the like. In addition, the same reference numerals are attached to the same structure as the structure of 1st Embodiment in some cases, and description is abbreviate|omitted.

[0122] The measurement unit 1 of the developer solution management device D includes a conductivity meter 11, and a characteristic value of the developer solution related to the dissolved photoresist concentration of the developer solution and a value of the developer solution related to the absorbed carbon dioxide concentration of the developer solution. Multiple measuring devices for measuring characteristic values. For example, an absorptom...

no. 3 approach 〕

[0179] image 3 It is a schematic diagram for demonstrating the developing process of the developer solution management apparatus D of this embodiment. The developer solution management device D of the present invention is shown together with the development process equipment A, the replenishing solution storage unit B, the circulating stirring mechanism C, and the like. In addition, the same reference numerals are attached to the same structure as the structure of 1st Embodiment and 2nd Embodiment, and description is abbreviate|omitted in some cases.

[0180] The developer management device D of the present embodiment includes a measurement unit 1 , a control unit 21 , and a calculation unit 36 ​​. In this embodiment, different from the second embodiment, the control mechanism 21 and the calculation mechanism 36 for performing calculations are constituted by separate devices.

[0181] The measuring unit 1 includes a conductivity meter 11 , a first characteristic value measu...

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Abstract

The invention provides a developing solution management apparatus capable of realizing developing processing that can maintain anticipated developing performance and maintain the anticipated line width and residual film thickness of a wiring pattern on a substrate. The developing solution management apparatus comprises a control mechanism and a display mechanism. The control mechanism comprises adata storage unit storing electric conductivity data which have an electric conductivity value of a developing solution which, confirmed in advance, can realize stipulated developing performance according to a concentration region determined with the concentration of a dissolving photoresist and the concentration of absorbed carbon dioxide of the developing solution that is repeatedly used and alkaline, as indexes; and a control unit which uses the confirmed electric conductivity value of the concentration region to send a control signal to a control valve in a manner of making the electric conductivity of the developing solution be the control target value. The display mechanism displays any of at least the electric conductivity value and the alkali component concentration value in the electric conductivity value, the alkali component concentration value, the dissolving photoresist concentration value and the absorbed carbon dioxide concentration value obtained from the developing solution.

Description

technical field [0001] The present invention relates to a developer solution management device, and more particularly, to a developer solution management device that develops alkalinity and is repeatedly used to develop a photoresist film in a development process of a circuit board of a semiconductor or a liquid crystal panel. Background technique [0002] In the development process of photolithography for realizing fine wiring processing of semiconductors, liquid crystal panels, etc., as a chemical solution for dissolving the photoresist film formed on the substrate, a developing solution that exhibits alkalinity (hereinafter called "alkaline developer"). [0003] In the manufacturing process of semiconductors and liquid crystal panel substrates, the size of wafers and glass substrates, and the miniaturization and high integration of wiring processing have been progressing in recent years. Under such circumstances, in order to achieve miniaturization and high integration i...

Claims

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Application Information

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IPC IPC(8): G03F7/30G03F7/32
CPCG03F7/3071G03F7/322G03F7/0025G03F7/70483G03F7/32H01L21/027
Inventor 中川俊元
Owner HIRAMA LAB