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Developing solution management apparatus

A technology for managing devices and developing solution, which is applied in photography, optics, instruments, etc., and can solve problems such as difficult management of developing solution

Inactive Publication Date: 2018-07-31
HIRAMA LAB
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] However, it is still difficult to achieve satisfactory developer management with the above-mentioned various developer management attempts

Method used

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Examples

Experimental program
Comparison scheme
Effect test

no. 1 approach 〕

[0091] figure 1 It is a schematic diagram for demonstrating the developing process of the developer solution management apparatus D of this embodiment. The developer solution management device D of the present invention is shown together with the development process equipment A, the replenishing solution storage unit B, the circulating stirring mechanism C, and the like.

[0092] First, the development process facility A will be briefly described.

[0093] The development process equipment A is mainly composed of a developer solution storage tank 61, an overflow tank 62, a developer chamber shield 64, a roller conveyor 65, a developer solution spray nozzle 67, and the like. A developer is stored in the developer storage tank 61 . The composition of the developer is managed by replenishing the replenisher. The developer storage tank 61 includes a liquid level gauge 63 and an overflow tank 62 , and manages an increase in the amount of liquid due to replenishment of the replen...

no. 2 approach 〕

[0127] figure 2 It is a schematic diagram for demonstrating the developing process of the developer solution management apparatus D of this embodiment. The developer solution management device D of the present invention is shown together with the development process equipment A, the replenishing solution storage unit B, the circulating stirring mechanism C, and the like. In addition, the same reference numerals are attached to the same structure as the structure of 1st Embodiment in some cases, and description is abbreviate|omitted.

[0128] The measurement unit 1 of the developer solution management device D includes a conductivity meter 11, and a characteristic value of the developer solution related to the dissolved photoresist concentration of the developer solution and a value of the developer solution related to the absorbed carbon dioxide concentration of the developer solution. Multiple measuring devices for measuring characteristic values. For example, an absorptom...

no. 3 approach 〕

[0186] image 3 It is a schematic diagram for demonstrating the developing process of the developer solution management apparatus D of this embodiment. The developer solution management device D of the present invention is shown together with the development process equipment A, the replenishing solution storage unit B, the circulating stirring mechanism C, and the like. In addition, the same reference numerals are attached to the same structure as the structure of 1st Embodiment and 2nd Embodiment, and description is abbreviate|omitted in some cases.

[0187] The developer management device D of the present embodiment includes a measurement unit 1 , a control unit 21 , and a calculation unit 36 ​​. In this embodiment, different from the second embodiment, the control mechanism 21 and the calculation mechanism 36 for performing calculations are constituted by separate devices.

[0188] The measuring unit 1 includes a conductivity meter 11 , a first characteristic value measu...

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Abstract

The invention provides a developing solution management apparatus capable of realizing development processing capable of maintaining desired development performance and maintaining a desired line width and a remaining film thickness of a wiring pattern on a substrate, and monitoring conductivity of the developing solution, the concentration of dissolved photoresist, and the concentration of absorbed carbon dioxide. A control unit and an alarm mechanism are provided. The control unit includes a data storage unit that stores conductivity data, and the conductivity data has a concentration regiondetermined by using the dissolved photoresist concentration and the absorbed carbon dioxide concentration as indexes, and has a conductivity value of the developing solution that achieves the predetermined development performance; and a the control unit that uses the conductivity value of the determined concentration region as a control target value so that the conductivity becomes a control target value to send a signal to a control valve, and the alarm mechanism issues an alarm when at least one of the conductivity, the dissolved photoresist concentration, and the absorbed carbon dioxide concentration deviate from a set management range.

Description

technical field [0001] The present invention relates to a method of managing a developer and a device for managing a developer, and in particular to a developer for developing alkalinity that is repeatedly used for developing a photoresist film in a development process of a circuit board of a semiconductor or a liquid crystal panel. A developer management device that manages the developer. Background technique [0002] In the development process of photolithography for realizing fine wiring processing of semiconductors, liquid crystal panels, etc., as a chemical solution for dissolving the photoresist film formed on the substrate, a developing solution that exhibits alkalinity (hereinafter called "alkaline developer"). [0003] In the manufacturing process of semiconductors and liquid crystal panel substrates, the size of wafers and glass substrates, and the miniaturization and high integration of wiring processing have been progressing in recent years. Under such circumst...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/30G03F7/32
CPCG03F7/3071G03F7/322G03F7/0032G03F7/32G03F7/70483H01L21/027
Inventor 中川俊元
Owner HIRAMA LAB