Etching solution concentration adjusting method

A technology of concentration adjustment and etching solution, which is applied in the direction of ratio control of various fluids, can solve the problems of pollution, increase of enterprise cost, high corrosion, etc., and achieve the effect of reducing cost, reducing pollution and restoring concentration

Inactive Publication Date: 2018-08-21
ASYS IND TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Etching solution itself is highly corrosive, even highly toxic. After use, the etching solution cannot be discharged directly, otherwise it will cause serious pollution
At present, there are generally two methods for treating the used etching solution. One is to send it to a professional treatment plant for harmless treatment, and the other is to recycle it by a professional chemical supply plant. The above two methods will generate additional costs. increased business costs

Method used

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Examples

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Comparison scheme
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Embodiment Construction

[0030] The embodiments of the present invention will be described in detail below in conjunction with the examples, but the present invention can be implemented in many different ways defined and covered by the claims.

[0031] The invention discloses a method for adjusting the concentration of etching solution, which comprises the following steps:

[0032] Step 1: Recover the liquid after using the etching liquid to obtain the recovered liquid;

[0033] Step 2: Use a concentration meter to detect the concentration of all additives in the recovery solution to obtain the concentration of each additive;

[0034] Step 3: Use a liquid level gauge to detect the volume of the recovered liquid to obtain the volume of the recovered liquid;

[0035] Step 4: Add an adjustment solution containing each additive to the recovery solution, and the solvent of each additive is the same to obtain the target etching solution.

[0036] In the embodiment of the present invention, the recovered l...

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PUM

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Abstract

The invention discloses an etching solution concentration adjusting method, comprising the steps that (1) liquid after the usage of the etching solution is recycled, obtaining the recycling liquid; (2) a concentration meter is adopted for concentration detection on all additives in the recycling liquid, obtaining the concentration of each additive; (3) the volume of the recycling liquid is detected by means of a liquid level meter, obtaining the volume of the recycling liquid; (4) the recycling liquid is added with adjusting solution having various additives, obtaining the target etching liquid, wherein the solvents of the additives are the same. The invention is advantageous in that after using the etching liquid, the adjusting solution is added, and through controlling the amount of theadjusting solution, the concentration of etching liquid can be recovered, and thereby the etching liquid can be recycled, pollution and cost can be reduced, and the amount of the adjusting solution added is very small.

Description

technical field [0001] The invention relates to the etching industry, in particular to a method for adjusting the concentration of etching solution. Background technique [0002] Most of the etching solutions currently used in the etching industry are mixtures of various substances. As time goes by during the etching process, the concentration of certain substances in the etching solution will decrease to varying degrees, which will eventually lead to a decrease in the etching rate. When the etching rate drops to a certain level, the etching solution can no longer be used. The nature of the etching solution itself is highly corrosive, even highly toxic, and the used etching solution cannot be discharged directly, otherwise it will cause serious pollution. At present, there are generally two methods for treating the used etching solution. One is to send it to a professional treatment plant for harmless treatment, and the other is to recycle it by a professional chemical sup...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G05D11/02
CPCG05D11/02
Inventor 韦仁军袁薇张久军马芳
Owner ASYS IND TECH CORP
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