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Droplet Generation for Laser-Generated Plasma Light Sources

A plasma and laser technology, applied in plasma, microlithography exposure equipment, optics, etc., can solve problems affecting positioning stability and other issues

Active Publication Date: 2022-07-19
KLA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As such, the environment experienced by the target material from the nozzle to the irradiation site can affect positioning stability

Method used

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  • Droplet Generation for Laser-Generated Plasma Light Sources
  • Droplet Generation for Laser-Generated Plasma Light Sources
  • Droplet Generation for Laser-Generated Plasma Light Sources

Examples

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Embodiment Construction

[0062] Reference will now be made in greater detail to the disclosed subject matter that is illustrated in the accompanying drawings. At the outset, it should be understood that like drawing numbers on the different figures identify identical or functionally similar structural elements of the invention. It is to be understood that the claimed invention is not limited to the disclosed aspects. Furthermore, it is to be understood that this invention is not limited to the particular methods, materials and modifications described and as such may, of course, vary. It is also to be understood that the terminology used herein is for the purpose of describing particular aspects only and is not intended to limit the scope of the invention.

[0063] figure 1An embodiment of a light source (generally designated 100 ) and droplet generator 102 for generating EUV light is shown. For example, light source 100 may be configured to generate in-band EUV light (eg, light having a wavelength...

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Abstract

The present invention is directed to a device having: a nozzle for dispensing a liquid target material; one or more intermediate chambers, each positioned to receive the target material and formed with an outlet aperture for outputting the target material for downstream irradiation in a laser-generated plasma LPP chamber. In some disclosed embodiments, a control system is included for controlling one or more of gas temperature, gas pressure, and gas composition in one, some, or all of the intermediate chambers of the device. In one embodiment, an intermediate chamber having an adjustable length is disclosed.

Description

[0001] Cross-references to related applications [0002] This application relates to and claims the benefit of the earliest available effective filing date from the applications listed below ("related applications") (e.g., asserting the earliest available priority date other than a provisional patent application or pursuant to 35 USC § 119 ("Related Applications") e) Claim the rights and interests of the provisional patent application, any and all parent cases, former parent cases, former second generation parent cases, etc.). [0003] Related applications: [0004] For purposes of additional statutory requirements of the USPTO, this application constitutes the designation of Application Serial No. 62 / 253,631, filed on November 10, 2015, of Brian Ahr, Alexander Bykanov, Rudy Garcia, Layton Hale and Oleg Khodykin are inventors entitled DROPLETGENERATION FOR A LASER PRODUCED Formal (non-provisional) patent application to US Provisional Patent Application PLASMA LIGHT SOURCE),...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H05G2/00G03F7/20
CPCH05G2/003H05G2/006H05G2/008H05H1/24G03F7/70033H05H2240/00
Inventor B·阿尔A·毕卡诺维R·加西亚L·C·哈尔O·可哈达金
Owner KLA CORP