40 results about "Plasma lamp" patented technology

The invention discloses an atomization mechanism for a plasma mass spectrometer, and relates to the technical field of atomizers, the atomization mechanism comprises an atomization cup, an atomization head and a sample introduction hopper which are respectively arranged at two openings of the atomization cup, a transmission mechanism arranged in the atomization cup, and an atomization nozzle communicated with the interior of the atomization cup, the sample feeding hopper is rotationally connected with the inner wall of the atomizing cup, and the transmission mechanism is in transmission connection with the sample feeding hopper; to-be-atomized liquid flows into the sample feeding hopper through the atomizing head; atomized airflow flows into the atomizing cup through the sample injection hopper and can be blown to liquid in the sample injection hopper; the transmission mechanism can drive the sample feeding hopper to rotate under the action of atomized airflow; and the liquid is atomized in the atomizing cup and then is discharged through the atomizing nozzle. In the atomization process, the transmission mechanism can drive the sample feeding hopper to rotate under the action of atomization airflow, powder and particles in liquid raw materials can be well decomposed through rotation of the sample feeding hopper, the stability of the concentration of liquid fed into a plasma light source is guaranteed, and meanwhile the atomizer can be prevented from being blocked.

The LSP broadband light source may include a pump source configured to generate a pump beam and one or more collimating optical elements configured to collimate the pump beam into a collimated pump beam. The light source may include one or more focusing optical elements and a beamsplitter located at a conjugate plane between the one or more collimating optical elements and the one or more focusing optical elements. The light source may include a gas containment structure. The beamsplitter may be configured to split the collimated pump beam into a set of pump beamlets, wherein the one or more focusing optical elements are configured to focus the set of pump beamlets to a set of focus positions within the gas to generate multiple plasma regions at the different focus positions.

The invention provides a device for efficiently and uniformly etching diamond micro-powder by laser-assisted plasma, which comprises a vacuum cavity, the vacuum cavity comprises a cylindrical section and a circular truncated cone section, the cylindrical section is positioned above the circular truncated cone section, and the bottom end of the cylindrical section is connected with the large-caliber end of the circular truncated cone section; a powder inlet, an axial flow fan and a collecting port are arranged on a bottom plate of the vacuum cavity; the powder feeding device is connected with the powder inlet; a laser is arranged on the bottom plate and located on the outer side of the powder inlet. Plasma light sources are symmetrically arranged on the side face of the cylindrical section, and plasma light source bias electrodes right opposite to the two sides are arranged in the vacuum cavity. According to the diamond micro-powder etching device, the vacuum cavity in a specific shape is matched with the axial flow fan, so that the diamond micro-powder can be continuously dispersed in the vacuum cavity to participate in the etching process, and the effects of improving the contact sufficiency of the diamond micro-powder and argon ions in the etching process and enhancing the activation among diamond carbon atoms are achieved; and the etching efficiency and uniformity are improved.

A multi-mirror laser sustained plasma broadband light source is disclosed.SOLUTION: The light source may include a gas containment structure for containing a gas. The light source includes a pump source 202 configured to generate pump illumination 204 and a first reflector element 206 configured to direct a portion of the pump illumination 204 into a gas to sustain a plasma. The first reflector is configured to collect a portion of the broadband light emitted from the plasma. The light source also includes one or more additional reflector elements 214 disposed opposite the first reflector. The one or more additional reflector elements 214 are configured to reflect unabsorbed pump illumination 204 and broadband light not collected by the first reflector element 206 back to the plasma.SELECTED DRAWING: Figure 2A

A compact LSP broadband light includes a gas containment structure containing a mixture of a first inert gas and a second inert gas, a filter tube positioned within the gas containment structure, an input window, and a pumping source. The laser pumping source directs an optical pump through the input window to maintain plasma within the filter tube. The first inert gas absorbs broadband light in first and second wavelength bands. The filter tube absorbs broadband light having a wavelength below a selected threshold. The absorption of broadband light by the first inert gas and the filter tube provides long pass filtering to protect one or more downstream optical elements. The gas containment structure includes an output optical window for transmitting filtered broadband light. The gas containing structure comprises a gas inlet and a gas outlet which are used for generating a reverse vortex mode in the filter pipe.

The invention provides a power adjusting method and device for a laser light source and a laser maintenance plasma LSP light source, and the method comprises the steps: obtaining a first power signal of the LSP light source, the first power signal being used for representing the change of the output power of the LSP light source along with the time; processing the first power signal to obtain a first jitter signal, the first jitter signal representing a periodic fluctuation characteristic of the first power signal; based on the first jitter signal, a first calibration signal is determined, and the first calibration signal and the first jitter signal are the same in amplitude and frequency and opposite in phase; and adjusting the output power of the laser light source based on the first calibration signal. The first jitter signal in the first power signal is separated to determine the first calibration signal, and the output power of the laser light source is adjusted by using the first calibration signal, so that jitter of the LSP output power caused by periodic oscillation of a flow field can be suppressed, and the stability of the output power of the LSP light source is improved.

A refillable plasma lamp assembly for laser-sustained plasma light sources is disclosed. The lamp assembly includes a transparent lamp body defining a sealed internal volume, a glass-to-metal fitting with a metal flange, and a glass-to-metal seal hermetically coupling the lamp body and fitting. The lamp flange is configured to connect to an external gas fitting for supplying and removing working gas to and from the sealed internal volume during plasma operation. The lamp body may be connected to a glass portion of the glass-to-metal fitting via a glass-to-glass connection. The lamp assembly may include a fill port for gas exchange between the lamp flange and the external gas fitting. This construction enables dynamic control of gas composition and pressure in semiconductor metrology and inspection applications. The refillable design improves safety by permitting unpressurized shipping and resists deterioration from reactive gases.

The present invention discloses a solid-state microwave plasma light source modulation method and system. Taking advantage of the ease of low-voltage control of solid-state microwave sources, the system broadens a spectrum range of a certain width on both sides, centered around the operating frequency. When the microwave light source emits light, the actual operating frequency generates high-frequency oscillations at a certain period within the spectrum range broadened from this central frequency point, causing the frequency point to continuously change. During the startup phase of the microwave plasma light source, a continuous wave operating mode is used while the spectrum is broadened. During the stable arc discharge phase, when thermal equilibrium is reached, a pulse power modulation waveform with a certain duty cycle is superimposed on the spectrum broadening. By varying the duty cycle and modulation frequency, the system reduces electromagnetic radiation and improves the luminous efficiency of the microwave light source under conditions of equal input power.

A light-emitting plasma lamp bulb for solar ultraviolet simulation includes a bulb cover having a spherical shape or a rod shape through which ultraviolet rays are transmittable, discharge gas contained in the bulb cover, and a first light-emitting material and a second light-emitting material, wherein the first light-emitting material includes at least one of mercury (Hg) and mercury iodide (HgI2), and the second light-emitting material includes sulfur (S8), wherein light emitted from the bulb has a maximum optical power intensity in a range of 395 to 455 nm which is an ultraviolet-visible boundary region, wherein, when compared using a same ultraviolet dose in an ultraviolet region of 290 to 400 nm, an integrated intensity of a visible and infrared region of 400 to 850 nm is equal to or less than ⅕ of an integrated intensity of a visible and infrared region of a standard solar spectrum (ASTM G173, AM 1.5G).

This invention relates to a high-frequency plasma light source (1), wherein, in the operating state, a quasi-capacitively coupled plasma is formed by at least two plasma anchors (6, 7), thus the plasma region with the highest energy density is spatially decoupled from the plasma anchors (6, 7). The high-frequency plasma light source (1) includes: - a pressure chamber (5) containing a gaseous medium, in the operating state, a luminescent plasma is formed within the pressure chamber; - an impedance converter (4) assembly connected to the pressure chamber (5) and including a coupling pin (8) for coupling electromagnetic waves into the high-frequency plasma light source (1) and having an internal guide... The inner conductor (9) and the outer conductor (9b) are coaxial conductors (9a) and (9b), wherein a dielectric pressure seal (13) and at least one conductive or dielectric connector (10, 12) are provided between the inner conductor (9a) and the outer conductor (9b), an inner conductor plasma anchor (6) extending into the pressure chamber (5) and electrically and mechanically connected to the inner conductor (9a) of the coaxial conductor (9), and an outer conductor plasma anchor (7) having a first end (7a) located in the pressure chamber (5) and a second end (7b) mechanically connected to the inner surface of the pressure chamber (5).

The invention provides a honeycomb rectification structure and device, a plasma light source and semiconductor equipment, the honeycomb rectification structure is applied to a laser-maintained plasma light source, the honeycomb rectification structure comprises a plurality of honeycomb units which are adjacently arranged, the honeycomb units form a channel structure used for allowing airflow to pass through, and the channel structure is used for allowing the airflow to pass through. The axial extension directions of the plurality of honeycomb units are parallel; and the heat exchange runners are arranged between the adjacent honeycomb units, allow heat exchange media to flow through and are used for absorbing heat of the honeycomb units. The honeycomb rectifying device comprises the honeycomb rectifying structure. And the heat exchange circulation system is connected with the heat exchange flow channel of the honeycomb rectification structure and used for driving the heat exchange medium to circularly pass through the heat exchange flow channel and discharging heat of the heat exchange medium.

This application relates to the field of semiconductor technology, and in particular to a laser-suppressed plasma source and its adjustment and control method and semiconductor device. The laser-suppressed plasma source includes a controller and a laser generator, a beam shaping unit, a discharge lamp chamber, a beam collecting unit and a detection unit arranged sequentially along the optical path. The controller is connected to the detection unit. The beam shaping unit includes an adjustment mechanism and an optical mechanism. The adjustment mechanism is connected to the controller. The optical mechanism includes at least one optical module. The adjustment mechanism is drivenly connected to at least one optical module. Since the detection unit can acquire the coupling power of the illumination beam in real time and feed the coupling power back to the controller, the controller dynamically generates control commands based on the coupling power and controls the adjustment mechanism to precisely adjust the position of the optical module. This allows the coupling power to be maintained near its maximum value, significantly improving the coupling power.

The utility model discloses a plasma light source radiator, which relates to the technical field of plasma light sources, and adopts the specific scheme that a flow guide channel penetrates through the inside of a light source body, a high-heat-conduction radiating shell is sleeved outside the light source body, dense radiating fins are integrally formed on the surface of the shell, and a fan and a temperature sensor are arranged at the top of the shell. The flow guide channel is additionally arranged in the light source and matched with the driving fan to forcibly flow airflow, so that the airflow accurately penetrates through a core heating area, and heat is rapidly taken away; meanwhile, the temperature sensor is in linkage with the fan to start and stop, pure fin heat dissipation is automatically switched to when the load is low, the energy-saving requirement is met, the use requirement of an existing high-power plasma light source can be met, and the service life is prolonged.

A high-power vacuum ultraviolet laser-sustained broadband plasma light source is disclosed. The light source includes a laser pump source to sustain a plasma within a gas chamber assembly. The gas chamber assembly includes a gas chamber and a laser input for directing a laser pump beam into a plasma region and a laser output for transmitting unabsorbed laser pump light outside the chamber. The gas chamber assembly includes one or more broadband output windows. The gas chamber assembly includes one or more transparent nozzles configured to direct gas flow into the plasma region and transmit the one or more laser pump beams to the plasma region. The gas chamber assembly includes one or more transparent cones configured to shield one or more optical collection paths from gas flow. The gas chamber assembly includes gas inlets and outlets for maintaining gas flow through the plasma region.

A method of forming a high pressure plasma lamp includes providing a lamp bulb. The lamp bulb includes an upper channel and a lower channel. The method includes inserting an upper electrode element into the upper channel of the lamp bulb. The method includes providing a glass tubular structure attached to a lower electrode element. The method includes filling the lamp bulb with a liquefied gas via the lower channel of the lamp bulb. The method includes inserting the lower electrode element and the glass tubular structure into the lower channel.

The invention relates to a high-frequency plasma light source (1) in which, in the operating state, a plasma is formed which is quasi-capacitively coupled by at least two plasma anchors (6, 7), and thus the regions of the plasma with the highest energy density are spatially decoupled from the plasma anchors (6, 7), wherein the high-frequency plasma light source (1) - a pressure chamber (5) with a gaseous medium, in which the light-emitting plasma is formed in the operating state, - an assembly (4) of an impedance transformer connected to the pressure chamber (5), which assembly has a coupling pin (8) for coupling electromagnetic waves into the high-frequency plasma light source (1) and a coaxial conductor (9) with an inner conductor (9a) and an outer conductor (9b), wherein a dielectric pressure termination element (13) and at least one electrically conductive or dielectric connection (10, 12) are present between the inner conductor (9a) and the outer conductor (9b), - an inner conductor plasma armature (6) which projects into the pressure chamber (5) and is electrically and mechanically connected to the inner conductor (9a) of the coaxial conductor (9) and - an outer conductor plasma armature (7) having a first end (7a) arranged within the pressure chamber (5) and another end (7b) mechanically connected to the inner surface of the pressure chamber (5).

A laser-sustained broadband light source is disclosed. The light source may include a gas containment structure containing a mixture 103 of a first noble gas and a second noble gas. The light source may include a laser pump source 106 for generating an optical pump 108 to sustain a plasma 112 within the gas containment structure. The first noble gas absorbs broadband light 113a within a first wavelength band and a second wavelength band. The light source may include a filter 104 located within the gas containment structure and configured to absorb broadband light 113b emitted by the plasma having wavelengths below a selected wavelength threshold. Absorption of the broadband light 113b by the first noble gas and the filter 104 provides long-pass filtering of the broadband light below the selected wavelength to protect one or more downstream optical elements from damage.

The invention provides a generation method and device of a laser-maintained plasma light source and semiconductor equipment, and the generation method comprises the following steps: injecting a first gas into a discharge chamber irradiated by laser to generate plasma; after it is determined that the plasma is ignited and enters the maintaining stage, second gas is injected into the discharge cavity to generate laser maintaining plasma meeting preset conditions; the ionization energy of the first gas is smaller than that of the second gas. By adopting the generation method of the laser maintenance plasma light source provided by the invention, the success rate that the second gas with high ionization energy is excited and ignited is improved, meanwhile, the starting voltage and the maintenance power of the generation device are reduced, the service lives of a bulb, an electrode and other elements in the discharge chamber are prolonged, and the circuit safety is improved; and instability, arc discharge or plasma shrinkage caused by electric field concentration are avoided, so that the laser maintains the stability and uniformity of a plasma generation process.

The application provides a high-voltage ignition long-life wide-spectrum plasma lamp, relates to the field of radio frequency microwave plasma light source, wherein an external high-voltage module is used to output a high-voltage pulse signal, the high-voltage pulse signal is input to two ends of the top of a lamp bulb, the high-voltage module generates a high-voltage ignition signal through discharge, gas in the lamp bulb is broken down to generate initial plasma, a microcontroller controls a radio frequency microwave power signal source to output radio frequency microwave energy, a high-intensity electric field is generated through a resonant cavity to maintain plasma discharge, and the microcontroller maintains the discharge by means of the radio frequency microwave energy after the high-voltage ignition signal is removed; the signal of the radio frequency microwave power signal source is adjusted to control the plasma arc distribution through the electric field, so that the arc center gradually moves from between the electrodes to the end of the resonant cavity and away from the electrodes. The application uses the radio frequency microwave mode to excite discharge, improves the system light emitting efficiency and output light power of the wide-spectrum light source, avoids the contact between the lamp bulb electrode and the plasma, reduces light attenuation, and prolongs the service life.

The application discloses a pulse-continuous composite fiber laser sustained plasma light source, and solves the problem that the existing high-brightness pulse fiber laser sustained plasma light source is prone to extinguishing when the pulse interval is greater than or equal to the relaxation time of the plasma, and specifically comprises a pulse-continuous composite fiber laser, an arc lamp and a laser transmission conversion assembly; the pulse-continuous composite fiber laser is used for outputting composite laser containing pulse laser and continuous laser; the arc lamp is used for generating initial plasma; the input end of the laser transmission conversion assembly is connected with the output end of the pulse-continuous composite fiber laser through an optical fiber, the output end of the laser transmission conversion assembly corresponds to the arc lamp, the laser transmission conversion assembly is used for receiving the composite laser, coupling the pulse laser and the continuous laser in the composite laser, and focusing the pulse laser and the continuous laser to the central region of the plasma in the arc lamp; the optical system F number range of each component in the laser transmission conversion assembly is 0-9.

This invention discloses a high color rendering index (Ra) and long lifespan magnetic ring-coupled plasma light source and its preparation method. The light source is an electrodeless source, comprising a bulb shell, an inorganic ceramic protective layer, a luminescent filler encapsulated inside the bulb shell, a mixed buffer gas, and a magnetic ring coupler fitted outside the bulb shell. The luminescent filler contains sulfur (S), selenium (Se), rare earth triiodine compounds, alkali metal bromine compounds, and alkali metal iodine compounds. The mixed buffer gas is a mixture of argon (Ar) and krypton (Kr) or argon (Ar) and xenon (Xe). The preparation method includes five steps: bulb shell pretreatment, inorganic ceramic protective layer preparation, luminescent filler filling, vacuuming and gas filling, and fusion sealing. This invention achieves ultra-high color rendering indexes (Ra>95, R9>90) by optimizing the luminescent formula and structural design. It contains no toxic substances and meets environmental standards, solving the technical pain points of poor color rendering, short lifespan, and insufficient environmental friendliness of traditional plasma light sources.

The invention discloses a separated collecting mirror for a plasma light source system and a manufacturing method thereof, and belongs to the technical field of plasma light sources, the separated collecting mirror comprises a plurality of fan-shaped plane mirror units and a circular plane mirror, the circular plane mirror is arranged at the central position, and the plurality of fan-shaped plane mirror units are arranged around the circular plane mirror; the fan-shaped angles of the fan-shaped plane mirror units are designed in a matched mode according to the light-emitting taper angle of the plasma light source, and the spliced separated collecting mirror keeps the consistent reflection light collecting effect within the whole clear aperture range. The manufacturing method comprises the steps of wedge angle processing of the fan-shaped plane mirror units, outer arc processing, inner arc transition processing, preparation of the central circular plane mirror, fine polishing processing of the lens, a reflecting surface coating process, lens assembling arrangement and clamping fixation. According to the invention, the plurality of fan-shaped plane mirrors form an integral reflecting surface, so that the processing difficulty of a single lens unit can be reduced, and the uniformity of a film layer can be improved through sub-unit film coating.

An illumination source and method are disclosed for improving brightness uniformity. The illumination source may include a laser sustained plasma light source configured to generate a broadband light beam. The illumination source may include an adjustable reflector configured to be adjusted based on one or more signals indicative of a brightness distribution of the broadband light beam emitted along one or more directions. The illumination source may include a set of optics. The set of optics may be configured to split the broadband light beam into a first and second broadband light beam, invert the second broadband light beam, and recombine the first and second broadband light beam. The set of optics may be configured to image the illumination source at least twice, to receive a first and second broadband light beam and then combine the first and second broadband light beam.

The invention relates to the field of semiconductors, in particular to a plasma light source and semiconductor equipment. The plasma light source comprises a laser module used for emitting one or more laser beams; the optical shaping module is used for shaping the one or more laser beams, so that the laser beams form a plurality of laser spots in the plasma container, and each laser spot is used for forming and maintaining a plasma core; the light source collection module is used for acquiring and outputting radiation light emitted by the plurality of plasma cores; the control module is used for acquiring an oscillation signal of a plasma flow field in the plasma container and adjusting the laser module and / or the optical shaping module when the oscillation signal reflects that the plasma flow field is not in a steady state so as to adjust the distance between the at least two plasma cores and / or the size of at least one plasma core; therefore, the plasma flow field is in a steady state. The stability of the output power of the plasma light source can be improved.

The application discloses an atomizing mechanism for a plasma mass spectrometer, and relates to the technical field of atomizers.The atomizing mechanism comprises an atomizing cup, an atomizing head and a sample feeding hopper which are arranged at two openings of the atomizing cup respectively, a transmission mechanism arranged in the atomizing cup, and an atomizing nozzle which is in communication with the inside of the atomizing cup, the sample feeding hopper is rotationally connected with the inner wall of the atomizing cup, and the transmission mechanism is in transmission connection with the sample feeding hopper; the liquid to be atomized flows into the sample feeding hopper through the atomizing head; the atomizing gas flows into the atomizing cup through the sample feeding hopper and can blow the liquid in the sample feeding hopper; the transmission mechanism can drive the sample feeding hopper to rotate under the action of the atomizing gas; and the liquid is discharged through the atomizing nozzle after being atomized in the atomizing cup. In the atomizing process, the transmission mechanism can drive the sample feeding hopper to rotate under the action of the atomizing gas, the rotation of the sample feeding hopper can well decompose the powder and particles in the liquid raw material, the stability of the liquid concentration sent to the plasma light source is ensured, and meanwhile, the atomizer can be prevented from being blocked.

The invention discloses a plasma light source system and method for laser and electric field coupling energy injection, and relates to the technical field of plasma light sources. Wherein the laser system generates laser and focuses the laser to the plasma light source, and energy is injected into the plasma light source through the laser; voltage is applied to the plasma light source generator, the plasma light source is lightened, and energy is injected into the plasma light source through an electric field. Through laser and electric field coupling energy injection, the energy injection efficiency of the plasma light source is improved, energy waste is reduced, and the service life of the plasma light source is remarkably prolonged.

The invention discloses a method and device for improving the brightness and ultraviolet intensity of a plasma light source, and belongs to the technical field of plasma luminescence. The device comprises a laser emitting device, an optical element device, a gas sealing device, a plasma heating device and a power supply device, the optical element device is used for focusing laser to the center of the plasma, the gas sealing device is used for sealing high-pressure gas, the optical element device is located between the laser emitting device and the plasma, and the plasma heating device is embedded in the side wall of the gas sealing device. According to the device, the independent plasma heating device and main laser heating are introduced for cooperative work, active composite heating of the plasma is achieved, energy can be injected into the plasma more effectively through the synergistic effect, the core temperature and the electron density of the plasma are remarkably improved, and therefore the total radiation brightness of the light source is greatly enhanced.

The invention provides a laser-driven plasma light source device and a control method thereof, and relates to the technical field of plasma light sources, the laser-driven plasma light source device comprises a laser module, a dichroic mirror, an adaptive mirror and a xenon lamp module; the laser module is used for emitting near-infrared laser; the dichroic mirror is positioned on an emission light path of the laser module and is used for transmitting the near-infrared laser to the adaptive mirror; the self-adaptive mirror is located on a transmission light path of the dichroic mirror, the self-adaptive mirror comprises a reflector array, the angle and the direction of each reflector are adjustable, and the self-adaptive mirror is used for receiving the laser transmitted by the dichroic mirror and reflecting and converging the laser to the centers of the positive electrode and the negative electrode of the xenon lamp module so as to excite the plasma; and the collimator is also used for collimating the light beam excited by the xenon lamp module and reflecting the light beam to the dichroic mirror, and the light beam is reflected to the light outlet through the dichroic mirror. The laser focusing position can be changed by adjusting the angle and the direction of each reflecting mirror, the laser excitation efficiency is improved, and finally the light emitting performance of the wide-spectrum light source is improved.

A laser generated plasma (LPP) light source includes a rotating target assembly (2) that supplies a target (3) together with a focused beam of high repetition frequency pulsed laser light into an interaction zone (4). The light source is efficiently cooled by thermal radiation of the peripheral portion of the rotating target assembly and by blowing gas through a serpentine gap (16) between the rotating target assembly (2) and the stationary heat exchanger (17). This achieves high brightness and high output power of the LPP light source.

A high-power vacuum ultraviolet laser-sustained broadband plasma light source is disclosed. The light source includes a laser pump source to sustain a plasma within a gas chamber assembly. The gas chamber assembly includes a gas chamber and a laser input for directing a laser pump beam into a plasma region and a laser output for transmitting unabsorbed laser pump light outside the chamber. The gas chamber assembly includes one or more broadband output windows. The gas chamber assembly includes one or more transparent nozzles configured to direct gas flow into the plasma region and transmit the one or more laser pump beams to the plasma region. The gas chamber assembly includes one or more transparent cones configured to shield one or more optical collection paths from gas flow. The gas chamber assembly includes gas inlets and outlets for maintaining gas flow through the plasma region.