56 results about "Plasma lamp" patented technology

The invention discloses an atomization mechanism for a plasma mass spectrometer, and relates to the technical field of atomizers, the atomization mechanism comprises an atomization cup, an atomization head and a sample introduction hopper which are respectively arranged at two openings of the atomization cup, a transmission mechanism arranged in the atomization cup, and an atomization nozzle communicated with the interior of the atomization cup, the sample feeding hopper is rotationally connected with the inner wall of the atomizing cup, and the transmission mechanism is in transmission connection with the sample feeding hopper; to-be-atomized liquid flows into the sample feeding hopper through the atomizing head; atomized airflow flows into the atomizing cup through the sample injection hopper and can be blown to liquid in the sample injection hopper; the transmission mechanism can drive the sample feeding hopper to rotate under the action of atomized airflow; and the liquid is atomized in the atomizing cup and then is discharged through the atomizing nozzle. In the atomization process, the transmission mechanism can drive the sample feeding hopper to rotate under the action of atomization airflow, powder and particles in liquid raw materials can be well decomposed through rotation of the sample feeding hopper, the stability of the concentration of liquid fed into a plasma light source is guaranteed, and meanwhile the atomizer can be prevented from being blocked.

The invention provides a laser maintaining plasma light source utilizing an annular light beam, which comprises a first shaping part, a second shaping part, a reflecting mirror, a dichroscope, a reflector and a gas chamber, and plasma can be formed in the gas chamber. The first shaping part comprises a conical optical element, and the pumping laser can form an annular light beam through the first shaping part. The second shaping part comprises one or more lenses, and the second shaping part can shape the annular light beam. Pump laser forms an annular light beam through the first shaping part, the annular light beam is shaped through the second shaping part and then is irradiated to the reflector, the pump laser is irradiated to the reflector through the reflector and the dichroscope, and the reflector is used for converging the pump laser to plasma to maintain the form of the plasma. When the pump laser passes through the gas cavity in the process of irradiating the reflector for the first time through the dichroscope, the gas cavity is located in the inner ring area of the annular light beam.

The invention provides a novel laser-driven plasma light source, and relates to the technical field of plasma light sources, the laser wavelength of the light source and the numerical aperture of a light beam are adjustable, and the laser beam can be automatically focused. Comprising a near-infrared semiconductor laser module, a light path system, a xenon lamp system, a wavelength control system, a diaphragm driving control system, a focus self-positioning system and an upper computer control system. The temperature and current of the semiconductor laser can be accurately regulated and controlled, so that the wavelength of the semiconductor laser is accurately controlled, and the light emitting stability of the laser-driven plasma light source is improved.

The LSP broadband light source may include a pump source configured to generate a pump beam and one or more collimating optical elements configured to collimate the pump beam into a collimated pump beam. The light source may include one or more focusing optical elements and a beamsplitter located at a conjugate plane between the one or more collimating optical elements and the one or more focusing optical elements. The light source may include a gas containment structure. The beamsplitter may be configured to split the collimated pump beam into a set of pump beamlets, wherein the one or more focusing optical elements are configured to focus the set of pump beamlets to a set of focus positions within the gas to generate multiple plasma regions at the different focus positions.

The invention provides a high-pressure laser maintenance plasma light source device with multiple windows, and relates to the technical field of plasma generation and maintenance. The basic structure of the device comprises an adjustable electrode insulation packaging system, a light path collection system with specific wavelength selection, and a circulating water cooling system. The adjustable electrode insulation packaging system is arranged in the center of the light source device and used for generating an initial plasma area, and the electrode distance and the electrode tip shape can be changed according to actual requirements. The light path collecting system with specific wavelength selection is arranged in the light source device and is used for selectively collecting plasma radiation light and transmitting the plasma radiation light to the light outlet window, and the collected radiation wave band can be selected according to actual requirements and the divergence angle of the radiation light output by the light source device can be changed; the circulating water cooling system is arranged outside the light source device and used for reducing the temperature of the light source device in the working process. According to the scheme, an adjustable electrode insulation packaging system is integrally designed, the light source device is provided with a light path collecting system with an enhancing effect and specific wavelength selection, parts are simplified, assembly is easy, the occupied size is small, and the laser maintaining plasma light source device with the high-pressure-resistant capacity in the working process is achieved.

The invention provides a reflector with an infrared absorption coating film and a laser maintenance plasma light source, the reflector with the infrared absorption coating film is applied to the laser maintenance plasma light source, a reflecting surface used for reflecting light is formed on the inner surface of the reflector, and the reflecting surface is a curved surface. The reflecting surface is provided with a first film coating area and a second film coating area, the first film coating area is provided with an infrared reflecting film, and the infrared reflecting film can reflect infrared light and is used for converging pumping laser to plasma of the laser maintaining plasma light source. The second coating area is provided with an infrared absorption film, and the infrared absorption film can absorb infrared light and is used for reducing or preventing pump laser from being reflected back to a laser of the laser maintaining plasma light source. The infrared reflecting film and the infrared absorbing film can reflect visible light and / or ultraviolet light and are used for collecting at least part of wide-spectrum light emitted by plasma.

The invention provides a device for efficiently and uniformly etching diamond micro-powder by laser-assisted plasma, which comprises a vacuum cavity, the vacuum cavity comprises a cylindrical section and a circular truncated cone section, the cylindrical section is positioned above the circular truncated cone section, and the bottom end of the cylindrical section is connected with the large-caliber end of the circular truncated cone section; a powder inlet, an axial flow fan and a collecting port are arranged on a bottom plate of the vacuum cavity; the powder feeding device is connected with the powder inlet; a laser is arranged on the bottom plate and located on the outer side of the powder inlet. Plasma light sources are symmetrically arranged on the side face of the cylindrical section, and plasma light source bias electrodes right opposite to the two sides are arranged in the vacuum cavity. According to the diamond micro-powder etching device, the vacuum cavity in a specific shape is matched with the axial flow fan, so that the diamond micro-powder can be continuously dispersed in the vacuum cavity to participate in the etching process, and the effects of improving the contact sufficiency of the diamond micro-powder and argon ions in the etching process and enhancing the activation among diamond carbon atoms are achieved; and the etching efficiency and uniformity are improved.

A multi-mirror laser sustained plasma broadband light source is disclosed.SOLUTION: The light source may include a gas containment structure for containing a gas. The light source includes a pump source 202 configured to generate pump illumination 204 and a first reflector element 206 configured to direct a portion of the pump illumination 204 into a gas to sustain a plasma. The first reflector is configured to collect a portion of the broadband light emitted from the plasma. The light source also includes one or more additional reflector elements 214 disposed opposite the first reflector. The one or more additional reflector elements 214 are configured to reflect unabsorbed pump illumination 204 and broadband light not collected by the first reflector element 206 back to the plasma.SELECTED DRAWING: Figure 2A

The invention discloses a method for preventing and treating Chinese rose insect pests by using a spectrum period, which is characterized in that a blue LED lamp, a purple LED lamp and a sulfur plasma lamp are utilized to respectively irradiate Chinese rose plants, high-frequency and low-frequency sound waves are matched to oscillate Chinese roses, the Chinese rose insect pests are effectively prevented and treated by selecting a proper spectrum combination, and target insect pests can be accurately prevented and treated. Meanwhile, the arranged lamplight can meet the illumination requirement of garden landscapes, the garden maintenance cost is reduced, the huge application potential is shown in the field of pest and disease damage management, and the goal of sustainable development of ecological gardens is met.

A compact LSP broadband light includes a gas containment structure containing a mixture of a first inert gas and a second inert gas, a filter tube positioned within the gas containment structure, an input window, and a pumping source. The laser pumping source directs an optical pump through the input window to maintain plasma within the filter tube. The first inert gas absorbs broadband light in first and second wavelength bands. The filter tube absorbs broadband light having a wavelength below a selected threshold. The absorption of broadband light by the first inert gas and the filter tube provides long pass filtering to protect one or more downstream optical elements. The gas containment structure includes an output optical window for transmitting filtered broadband light. The gas containing structure comprises a gas inlet and a gas outlet which are used for generating a reverse vortex mode in the filter pipe.

The invention provides a power adjusting method and device for a laser light source and a laser maintenance plasma LSP light source, and the method comprises the steps: obtaining a first power signal of the LSP light source, the first power signal being used for representing the change of the output power of the LSP light source along with the time; processing the first power signal to obtain a first jitter signal, the first jitter signal representing a periodic fluctuation characteristic of the first power signal; based on the first jitter signal, a first calibration signal is determined, and the first calibration signal and the first jitter signal are the same in amplitude and frequency and opposite in phase; and adjusting the output power of the laser light source based on the first calibration signal. The first jitter signal in the first power signal is separated to determine the first calibration signal, and the output power of the laser light source is adjusted by using the first calibration signal, so that jitter of the LSP output power caused by periodic oscillation of a flow field can be suppressed, and the stability of the output power of the LSP light source is improved.

A refillable plasma lamp assembly for laser-sustained plasma light sources is disclosed. The lamp assembly includes a transparent lamp body defining a sealed internal volume, a glass-to-metal fitting with a metal flange, and a glass-to-metal seal hermetically coupling the lamp body and fitting. The lamp flange is configured to connect to an external gas fitting for supplying and removing working gas to and from the sealed internal volume during plasma operation. The lamp body may be connected to a glass portion of the glass-to-metal fitting via a glass-to-glass connection. The lamp assembly may include a fill port for gas exchange between the lamp flange and the external gas fitting. This construction enables dynamic control of gas composition and pressure in semiconductor metrology and inspection applications. The refillable design improves safety by permitting unpressurized shipping and resists deterioration from reactive gases.

The present invention discloses a solid-state microwave plasma light source modulation method and system. Taking advantage of the ease of low-voltage control of solid-state microwave sources, the system broadens a spectrum range of a certain width on both sides, centered around the operating frequency. When the microwave light source emits light, the actual operating frequency generates high-frequency oscillations at a certain period within the spectrum range broadened from this central frequency point, causing the frequency point to continuously change. During the startup phase of the microwave plasma light source, a continuous wave operating mode is used while the spectrum is broadened. During the stable arc discharge phase, when thermal equilibrium is reached, a pulse power modulation waveform with a certain duty cycle is superimposed on the spectrum broadening. By varying the duty cycle and modulation frequency, the system reduces electromagnetic radiation and improves the luminous efficiency of the microwave light source under conditions of equal input power.

An LSP broadband light source is disclosed. The light source may include a gas containment structure for containing a gas. The light source may include a laser pump source configured to generate an optical pump to maintain a plasma within the gas containment structure to generate broadband light. The light source may include a tapered window configured to transmit broadband light through an aperture in a wall of the gas containment structure, the tapered window including a tapered section including a tapered surface, wherein the tapered surface is configured to deflect light impinging on a peripheral portion of the tapered window away from a portion of the gas containment structure to protect the portion of the gas containment structure.

A light-emitting plasma lamp bulb for solar ultraviolet simulation includes a bulb cover having a spherical shape or a rod shape through which ultraviolet rays are transmittable, discharge gas contained in the bulb cover, and a first light-emitting material and a second light-emitting material, wherein the first light-emitting material includes at least one of mercury (Hg) and mercury iodide (HgI2), and the second light-emitting material includes sulfur (S8), wherein light emitted from the bulb has a maximum optical power intensity in a range of 395 to 455 nm which is an ultraviolet-visible boundary region, wherein, when compared using a same ultraviolet dose in an ultraviolet region of 290 to 400 nm, an integrated intensity of a visible and infrared region of 400 to 850 nm is equal to or less than ⅕ of an integrated intensity of a visible and infrared region of a standard solar spectrum (ASTM G173, AM 1.5G).

This invention relates to a high-frequency plasma light source (1), wherein, in the operating state, a quasi-capacitively coupled plasma is formed by at least two plasma anchors (6, 7), thus the plasma region with the highest energy density is spatially decoupled from the plasma anchors (6, 7). The high-frequency plasma light source (1) includes: - a pressure chamber (5) containing a gaseous medium, in the operating state, a luminescent plasma is formed within the pressure chamber; - an impedance converter (4) assembly connected to the pressure chamber (5) and including a coupling pin (8) for coupling electromagnetic waves into the high-frequency plasma light source (1) and having an internal guide... The inner conductor (9) and the outer conductor (9b) are coaxial conductors (9a) and (9b), wherein a dielectric pressure seal (13) and at least one conductive or dielectric connector (10, 12) are provided between the inner conductor (9a) and the outer conductor (9b), an inner conductor plasma anchor (6) extending into the pressure chamber (5) and electrically and mechanically connected to the inner conductor (9a) of the coaxial conductor (9), and an outer conductor plasma anchor (7) having a first end (7a) located in the pressure chamber (5) and a second end (7b) mechanically connected to the inner surface of the pressure chamber (5).

The invention provides a honeycomb rectification structure and device, a plasma light source and semiconductor equipment, the honeycomb rectification structure is applied to a laser-maintained plasma light source, the honeycomb rectification structure comprises a plurality of honeycomb units which are adjacently arranged, the honeycomb units form a channel structure used for allowing airflow to pass through, and the channel structure is used for allowing the airflow to pass through. The axial extension directions of the plurality of honeycomb units are parallel; and the heat exchange runners are arranged between the adjacent honeycomb units, allow heat exchange media to flow through and are used for absorbing heat of the honeycomb units. The honeycomb rectifying device comprises the honeycomb rectifying structure. And the heat exchange circulation system is connected with the heat exchange flow channel of the honeycomb rectification structure and used for driving the heat exchange medium to circularly pass through the heat exchange flow channel and discharging heat of the heat exchange medium.

A laser produced plasma (LPP) light source comprises a rotating target assembly (2) supplying a target (3) into an interaction zone (4) with a focused beam of a high-repetition-rate pulsed laser. High effective cooling of the light source is provided by thermal radiation of a peripheral part of the rotating target assembly and through a meander-shaped gap (16) between the rotating target assembly (2) and a fixed heat exchanger (17) with a gas blowing through the slit gap. High brightness and high output power of LPP light source are provided.

This application relates to the field of semiconductor technology, and in particular to a laser-suppressed plasma source and its adjustment and control method and semiconductor device. The laser-suppressed plasma source includes a controller and a laser generator, a beam shaping unit, a discharge lamp chamber, a beam collecting unit and a detection unit arranged sequentially along the optical path. The controller is connected to the detection unit. The beam shaping unit includes an adjustment mechanism and an optical mechanism. The adjustment mechanism is connected to the controller. The optical mechanism includes at least one optical module. The adjustment mechanism is drivenly connected to at least one optical module. Since the detection unit can acquire the coupling power of the illumination beam in real time and feed the coupling power back to the controller, the controller dynamically generates control commands based on the coupling power and controls the adjustment mechanism to precisely adjust the position of the optical module. This allows the coupling power to be maintained near its maximum value, significantly improving the coupling power.

The utility model discloses a plasma light source radiator, which relates to the technical field of plasma light sources, and adopts the specific scheme that a flow guide channel penetrates through the inside of a light source body, a high-heat-conduction radiating shell is sleeved outside the light source body, dense radiating fins are integrally formed on the surface of the shell, and a fan and a temperature sensor are arranged at the top of the shell. The flow guide channel is additionally arranged in the light source and matched with the driving fan to forcibly flow airflow, so that the airflow accurately penetrates through a core heating area, and heat is rapidly taken away; meanwhile, the temperature sensor is in linkage with the fan to start and stop, pure fin heat dissipation is automatically switched to when the load is low, the energy-saving requirement is met, the use requirement of an existing high-power plasma light source can be met, and the service life is prolonged.

A high-power vacuum ultraviolet laser-sustained broadband plasma light source is disclosed. The light source includes a laser pump source to sustain a plasma within a gas chamber assembly. The gas chamber assembly includes a gas chamber and a laser input for directing a laser pump beam into a plasma region and a laser output for transmitting unabsorbed laser pump light outside the chamber. The gas chamber assembly includes one or more broadband output windows. The gas chamber assembly includes one or more transparent nozzles configured to direct gas flow into the plasma region and transmit the one or more laser pump beams to the plasma region. The gas chamber assembly includes one or more transparent cones configured to shield one or more optical collection paths from gas flow. The gas chamber assembly includes gas inlets and outlets for maintaining gas flow through the plasma region.

A method of forming a high pressure plasma lamp includes providing a lamp bulb. The lamp bulb includes an upper channel and a lower channel. The method includes inserting an upper electrode element into the upper channel of the lamp bulb. The method includes providing a glass tubular structure attached to a lower electrode element. The method includes filling the lamp bulb with a liquefied gas via the lower channel of the lamp bulb. The method includes inserting the lower electrode element and the glass tubular structure into the lower channel.

The invention relates to a high-frequency plasma light source (1) in which, in the operating state, a plasma is formed which is quasi-capacitively coupled by at least two plasma anchors (6, 7), and thus the regions of the plasma with the highest energy density are spatially decoupled from the plasma anchors (6, 7), wherein the high-frequency plasma light source (1) - a pressure chamber (5) with a gaseous medium, in which the light-emitting plasma is formed in the operating state, - an assembly (4) of an impedance transformer connected to the pressure chamber (5), which assembly has a coupling pin (8) for coupling electromagnetic waves into the high-frequency plasma light source (1) and a coaxial conductor (9) with an inner conductor (9a) and an outer conductor (9b), wherein a dielectric pressure termination element (13) and at least one electrically conductive or dielectric connection (10, 12) are present between the inner conductor (9a) and the outer conductor (9b), - an inner conductor plasma armature (6) which projects into the pressure chamber (5) and is electrically and mechanically connected to the inner conductor (9a) of the coaxial conductor (9) and - an outer conductor plasma armature (7) having a first end (7a) arranged within the pressure chamber (5) and another end (7b) mechanically connected to the inner surface of the pressure chamber (5).

A plasma lamp in a broadband plasma source for inspection tools is disclosed. The plasma lamp includes a plasma bulb configured to hold a gas and generate a plasma within the plasma bulb. The plasma bulb is formed of a material that is at least partially transparent to illumination from the pump laser and at least a portion of the broadband radiation emitted by the plasma. The plasma bulb includes a tapered bladder. The tapered bladder is configured to interrupt a plume rising from the plasma.

The invention provides a laser-maintained plasma light source, a using method thereof and optical equipment. A laser maintained plasma light source includes a container, a first electrode, a second electrode, and a laser. The container containing the ionizable medium is provided with a first chamber and a second chamber which are communicated with each other. The first electrode and the second electrode can ionize the ionizable medium in the first chamber and form a first luminous point. A laser focus point of the laser can be moved from the first light emitting point to the second chamber such that a second light emitting point is formed in the second chamber. The use method of the laser-maintained plasma light source comprises the following steps of: exciting the ionizable medium in the first chamber of the container to ionize through the electrode, and forming a first luminous point; enabling the laser to move relative to the container, and enabling a laser focus point of the laser to move from the first luminous point to a second cavity communicated with the first cavity, so that the ionizable medium in the second cavity is ionized to form a second luminous point. The light emitting area, the power and the radiation brightness of the light source can be improved.

A laser-sustained broadband light source is disclosed. The light source may include a gas containment structure containing a mixture 103 of a first noble gas and a second noble gas. The light source may include a laser pump source 106 for generating an optical pump 108 to sustain a plasma 112 within the gas containment structure. The first noble gas absorbs broadband light 113a within a first wavelength band and a second wavelength band. The light source may include a filter 104 located within the gas containment structure and configured to absorb broadband light 113b emitted by the plasma having wavelengths below a selected wavelength threshold. Absorption of the broadband light 113b by the first noble gas and the filter 104 provides long-pass filtering of the broadband light below the selected wavelength to protect one or more downstream optical elements from damage.

The embodiment of the invention relates to a multi-mirror laser-maintained plasma light source. The light source may include a gas containment structure for containing a gas. The light source includes a pump source configured to generate pump illumination and a first reflector element configured to direct a portion of the pump illumination into the gas to maintain a plasma. The first reflector is configured to collect a portion of broadband light emitted from the plasma. The light source also includes one or more additional reflector elements positioned opposite the first reflector. The one or more additional reflector elements are configured to reflect back to the plasma unabsorbed pump illumination and broadband light not collected by the first reflector element.

The invention discloses a laser maintained broadband light source. The light source may include a gas containment structure containing a mixture of a first inert gas and a second inert gas. The light source may include a laser pumping source to generate optical pumping to maintain plasma within the gas containment structure. The first inert gas absorbs broadband light in a first wavelength band and a second wavelength band. The light source may include a filter positioned within the gas containment structure and configured to absorb the broadband light emitted by the plasma having a wavelength below a selected wavelength threshold. Absorbing broadband light by the first inert gas and the filter provides long pass filtering of broadband light below the selected wavelength to protect one or more downstream optical elements from damage.

The invention provides a generation method and device of a laser-maintained plasma light source and semiconductor equipment, and the generation method comprises the following steps: injecting a first gas into a discharge chamber irradiated by laser to generate plasma; after it is determined that the plasma is ignited and enters the maintaining stage, second gas is injected into the discharge cavity to generate laser maintaining plasma meeting preset conditions; the ionization energy of the first gas is smaller than that of the second gas. By adopting the generation method of the laser maintenance plasma light source provided by the invention, the success rate that the second gas with high ionization energy is excited and ignited is improved, meanwhile, the starting voltage and the maintenance power of the generation device are reduced, the service lives of a bulb, an electrode and other elements in the discharge chamber are prolonged, and the circuit safety is improved; and instability, arc discharge or plasma shrinkage caused by electric field concentration are avoided, so that the laser maintains the stability and uniformity of a plasma generation process.

The application provides a high-voltage ignition long-life wide-spectrum plasma lamp, relates to the field of radio frequency microwave plasma light source, wherein an external high-voltage module is used to output a high-voltage pulse signal, the high-voltage pulse signal is input to two ends of the top of a lamp bulb, the high-voltage module generates a high-voltage ignition signal through discharge, gas in the lamp bulb is broken down to generate initial plasma, a microcontroller controls a radio frequency microwave power signal source to output radio frequency microwave energy, a high-intensity electric field is generated through a resonant cavity to maintain plasma discharge, and the microcontroller maintains the discharge by means of the radio frequency microwave energy after the high-voltage ignition signal is removed; the signal of the radio frequency microwave power signal source is adjusted to control the plasma arc distribution through the electric field, so that the arc center gradually moves from between the electrodes to the end of the resonant cavity and away from the electrodes. The application uses the radio frequency microwave mode to excite discharge, improves the system light emitting efficiency and output light power of the wide-spectrum light source, avoids the contact between the lamp bulb electrode and the plasma, reduces light attenuation, and prolongs the service life.