Ultraviolet lamp system and method

A technology of ultraviolet radiation and relationship, applied in the field of ultraviolet lamp system, can solve problems such as reducing the life of plasma lamp, and achieve the effect of reducing microwave energy

Inactive Publication Date: 2002-07-10
NORDSON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The temperature increase corresponding to this excess infrared energy can significantly reduce the lifetime of the plasma lamp and produce additional, undesired effects

Method used

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  • Ultraviolet lamp system and method
  • Ultraviolet lamp system and method
  • Ultraviolet lamp system and method

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Embodiment Construction

[0017] The invention relates to a microwave-excited UV lamp system configured to uniformly irradiate a substrate located in a microwave chamber processing space with UV radiation. In the present invention, the substrate is positioned in the process volume close to a microwave-excited plasma lamp to increase the intensity of the ultraviolet radiation. In addition, the present invention incorporates a reflector which is capable of providing relatively uniform illumination in a surrounding relationship with respect to the substrate - or around the substrate. In addition, the present invention separates the substrates with a UV transmissive conduit, which can supply fragile substrates and provide sufficient airflow to cool the microwave generator and plasma lamp. Additionally, the present invention allows substrates to enter the microwave chamber and travel through the process volume without actual leakage of microwaves from the chamber. In addition, the well-defined relative pos...

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Abstract

An ultraviolet radiation generating system and methods is disclosed for treating a coating on a substrate, such as a coating on a fiber optic cable. The system comprises a microwave chamber having one or more ports capable of permitting the substrate to travel within or through a processing space of the microwave chamber. A microwave generator is coupled to the microwave chamber for exciting a longitudinally-extending plasma lamp mounted within the processing space of the microwave chamber. The plasma lamp emits ultraviolet radiation for irradiating the substrate in the processing space. A reflector is mounted within the processing space of the microwave chamber and is capable of reflecting ultraviolet radiation to uniformly irradiate the substrate in a surrounding fashion. When the system is operating, the microwave chamber is substantially closed to emission of microwave energy and ultraviolet radiation.

Description

technical field [0001] The present invention relates generally to ultraviolet lamp systems, and more particularly to microwave excited ultraviolet lamp systems configured to irradiate a substrate within a microwave chamber with ultraviolet radiation. Background technique [0002] UV lamp systems are commonly used to heat and cure materials such as adhesive coats, sealants, paints and coatings. Certain UV lamp systems have an electrodeless light source and operate by energizing an electrodeless plasma lamp with radio frequency energy or microwave energy. In an electrodeless UV lamp system that relies on microwave energy excitation, the electrodeless plasma lamp is mounted within a metallic microwave cavity—or chamber. One or more microwave generators are integrated inside the microwave chamber via waveguides. A microwave generator provides microwave energy to excite and maintain a plasma from a gas mixture enclosed within a plasma lamp. The plasma emits a specific spectrum...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G21K5/00A61N5/00B01J19/12B05C9/12B05D3/06B29C35/08C03C25/12C08J3/28F21V7/22G01J1/00G02B6/44G21K5/04G21K5/10H01J65/04H05H1/46
CPCH01J65/044
Inventor P·G·基奥J·W·施米特孔斯
Owner NORDSON CORP
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