A kind of ITO film ink for printing and preparation method thereof

A technology of ink and film, which is applied in the field of ITO film ink for printing, can solve the problems of very high production process requirements, high production cost, and high cost, and achieve the effects of good ink stability, good density, and reduced subsequent production costs

Active Publication Date: 2021-03-26
ZHUZHOU KENENG NEW MATERIAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the large-scale application of flat-panel displays in TVs, mobile phones and other industries is also booming. At present, the method of forming transparent films on ITO on glass is mainly magnetron sputtering, but this method requires the use of ITO targets. Large-size ITO The production process of the target material is very demanding, and the main technology is still in the hands of foreign companies
Moreover, the highest utilization rate of ITO target materials for magnetron sputtering is less than 35%, and after the film is formed, a very expensive photolithography machine is required to engrave the film into the required pattern, and the subsequent production cost is very high

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Add 1 kg of ITO powder with a purity of 99.99% and D50 of 0.02 μm (mass ratio of indium oxide to tin oxide is 90:10), 50 g of analytical pure SDS, 50 g of analytical pure JA-282 dispersant and 100 g of distilled water into the mixing tank and stir Evenly, add tetramethylammonium hydroxide to adjust the pH to 2, add it to the planetary ball mill tank, adjust the speed of the planetary ball mill to 100r / min, and get the final ink after 12 hours of ball milling; print the prepared ITO ink on the FTO through a screen printing machine The substrate is then dried at 100°C, and finally the substrate is placed in a sintering furnace and sintered at 600°C for 6 hours to obtain an ITO film.

[0030] After the ITO thin film ink film is formed, the thickness of the ITO film is 153nm, and the surface particles have high crystallinity, uniform particle size, good density, and a resistivity of 4.8*10 -4 , bandgap width 3.8eV, electron mobility 25cm 2 V -1 the s -1 , Visible light b...

Embodiment 2

[0032] Add 1 kg of ITO powder with a purity of 99.99% and D50 of 0.05 μm (mass ratio of indium oxide to tin oxide is 95:5), 30 g of analytical pure SDS, 100 g of analytical pure JA-282 dispersant and 100 g of distilled water into the mixing tank and stir Evenly, add tetramethylammonium hydroxide to adjust the pH to 5, add it to the planetary ball mill tank, adjust the speed of the planetary ball mill to 100r / min, and get the final ink after 24 hours of ball milling; print the prepared ITO ink on the FTO through a screen printing machine and then dried at 110°C, and finally put the substrate in a sintering furnace, and sintered at 600°C for 8 hours to obtain an ITO thin film.

[0033] After the ITO thin film ink film is formed, the thickness of the ITO film is 165nm, and the surface particles have high crystallinity, uniform particle size, good density, and a resistivity of 5.4*10 -4 , bandgap width 3.85eV, electron mobility 26cm 2 V -1 the s -1 , visible light band transmit...

Embodiment 3

[0035] Add 1 kg of ITO powder with a purity of 99.99% and a D50 of 0.1 μm (the mass ratio of indium oxide to tin oxide is 97:3), 10 g of analytical pure SDS, 10 g of analytical pure JA-282 dispersant and 300 g of distilled water into the mixing tank and stir Evenly, adjust the pH to 7, add it to the planetary ball mill tank, adjust the speed of the planetary ball mill to 200r / min, and get the final ink after 72 hours of ball milling; print the configured ITO ink on the FTO substrate by a screen printing machine, and then heat it at 120°C After drying, the substrate is placed in a sintering furnace and sintered at 600°C for 12 hours to obtain an ITO film.

[0036] After the ITO thin film ink film is formed, the thickness of the ITO film is 176nm, and the surface particles have high crystallinity, uniform particle size, good density, and a resistivity of 5.7*10 -4 , bandgap width 3.79eV, electron mobility 27cm 2 V -1 the s -1 , visible light band transmittance 89.6%, ultraviole...

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Abstract

The invention discloses ITO film ink for printing and a preparation method thereof. The ITO film ink comprises ITO powder, SDS, a JA-282 dispersant, water and other main components. The preparation method comprises uniformly stirring the ITO powder, SDS, JA-282 dispersant and water, adjusting the pH value of a system to 2-7 with a pH regulator, and carrying out ball milling dispersion to obtain the ITO film ink. The ink has good stability, long-term storage without delamination, precipitation and hydrolysis, and completely meets requirements of silk screen or ink jet printing, and a film layerafter film formation is compact, high in crystallinity and excellent in photoelectric performance, and can completely replace the conventional ITO film prepared through magnetron sputtering.

Description

technical field [0001] The invention relates to an ITO film ink for printing, in particular to an ink which can replace the existing magnetron sputtering process to prepare an ITO film and a preparation process thereof, belonging to the technical field of ITO film preparation. Background technique [0002] ITO thin film is an n-type semiconductor material with high electrical conductivity, high visible light transmittance, high mechanical hardness and good chemical stability. It is the most commonly used thin-film material for transparent electrodes in liquid crystal displays, plasma displays, electroluminescent displays, touch screens, solar cells, and other electronic instruments. [0003] The main component of the transparent film electrode film layer is indium tin oxide. In the case of a thickness of only a few thousand angstroms, indium oxide has high transmittance and tin oxide has strong conductivity. The ITO glass currently used in liquid crystal displays and OLED d...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09D11/02C09D11/0235C09D11/03C09D11/30C09D11/38
CPCC09D11/02C09D11/0235C09D11/03C09D11/30C09D11/38
Inventor 赵科湘赵子逸
Owner ZHUZHOU KENENG NEW MATERIAL CO LTD
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