A kind of cleaning equipment and its cleaning method before evaporation

A technology for cleaning equipment and vapor deposition, which is applied in the directions of cleaning methods using liquids, cleaning methods using tools, cleaning methods and utensils, etc., and can solve the problems of general cleaning effect of objects to be evaporated.
CN108543750BActive Publication Date: 2020-09-22浙江环迪工贸有限公司

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
浙江环迪工贸有限公司
Publication Date
2020-09-22

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Abstract

The invention discloses a cleaning equipment before evaporation, which includes a box body and a box cover. The box body is provided with a water tank, a power supply, a control device, an electric motor and an electric cylinder. The water tank, power supply, control device, electric motor The electric cylinder and the electric cylinder are all fixedly connected to the box. The motor is provided with a coupling, the coupling is connected to a rotating shaft, and the box is provided with a first pneumatic finger for clamping the object to be evaporated. The second pneumatic finger is provided with a turntable bearing. The first pneumatic finger and the second pneumatic finger are both electrically connected to the electric cylinder. The water tank is provided with a water pipe, and the water pipe is bolted to the water tank. connection, the water pipe is provided with an electric water pump, the electric water pump is flange connected to the water pipe, the motor, electric cylinder and electric water pump are all electrically connected to the control device; the cleaning equipment used before evaporation can effectively Wait for the evaporated material to be cleaned.
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Description

technical field

[0001] The invention relates to a cleaning device used for evaporation before deposition and a cleaning method thereof. Background technique

[0002] Evaporation is the process of evaporating or sublimating the substance to be filmed in a vacuum, so that it is deposited on the surface of the workpiece or substrate. It can deposit metals, semiconductors, semiconductors, etc. on the surface of metals, semiconductors, insulators, and even plastics, paper, and fabrics. Thin films of insulators, alloys with different composition ratios, compounds, and some organic polymers.

[0003] However, the surface of the evaporated material needs to be cleaned before evaporation, and the existing cleaning equipment has a general cleaning effect on the evaporated material, and cannot effectively clean the evaporated material. Contents of the invention

[0004] The technical problem to be solved by the present invention is to provide a cleaning device and cleaning method be...

Claims

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