A kind of cleaning equipment and its cleaning method before evaporation
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 浙江环迪工贸有限公司
- Publication Date
- 2020-09-22
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Abstract
Description
technical field
[0001] The invention relates to a cleaning device used for evaporation before deposition and a cleaning method thereof. Background technique
[0002] Evaporation is the process of evaporating or sublimating the substance to be filmed in a vacuum, so that it is deposited on the surface of the workpiece or substrate. It can deposit metals, semiconductors, semiconductors, etc. on the surface of metals, semiconductors, insulators, and even plastics, paper, and fabrics. Thin films of insulators, alloys with different composition ratios, compounds, and some organic polymers.
[0003] However, the surface of the evaporated material needs to be cleaned before evaporation, and the existing cleaning equipment has a general cleaning effect on the evaporated material, and cannot effectively clean the evaporated material. Contents of the invention
[0004] The technical problem to be solved by the present invention is to provide a cleaning device and cleaning method be...