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Window scanning type exposure device

An exposure device and scanning technology, applied in the field of precision instruments and machinery, can solve the problems of the influence of the shading plate, the protection structure of the optical element and the replacement method are not given, etc.

Active Publication Date: 2018-10-16
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the resolution of the exposure device and method is significantly affected by the straightness and roughness of the edge of the shading plate, and the protection structure and replacement method of the relevant optical elements are not given.

Method used

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  • Window scanning type exposure device

Examples

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Embodiment Construction

[0026] Embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0027] refer to figure 1 , a window scanning exposure device, including a scanning unit 1, a back plate 2, a horizontal drive unit 3, an anti-aging sleeve 4, a quartz strip 5, a cover plate 6, and a vertical drive unit 7.

[0028] refer to figure 2 , 2 horizontal driving units 3 and 2 vertical driving units 7 are installed on the backplane 2, and the scanning unit 1 is installed on the horizontal driving unit 3 and the vertical driving unit 7; it is characterized in that the scanning unit 1 includes 4 apertures Plate 8, four diaphragm plates 8 are coplanarly installed, and form a rectangular window at the gap between the quartz strip 5 and the exposure window 12.

[0029] refer to image 3 A wide groove 9 is processed under the quartz strip 5 on the back plate 2 .

[0030] refer to Figure 4 , the cover plate 6 is processed with an exposure windo...

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Abstract

The invention discloses a window scanning type exposure device. The device is installed coplanarly through four blades, a rectangular window is formed at the position of a gap between a quartz strip and an exposure window, high-resolution projection type exposure control is carried out, and simultaneously, convenient change of easily consumable optical elements and the temperature control of the optical elements and light blocking elements under long-time laser environment can be realized. The invention can be used for establishing the projection type exposure device with high resolution and high movement / positioning precision.

Description

technical field [0001] The invention belongs to the technical field of precision instruments and machinery, in particular to a window scanning exposure device. Background technique [0002] In recent years, as the advanced chip manufacturing industry gradually develops towards functional integration and volume miniaturization, contact and proximity exposure can no longer meet the needs of exposure systems for small-process lithography machines. Projection exposure uses an optical system to condense light and realize exposure, so the production of masks can be multiplied and enlarged. It is a new exposure mode with high resolution and low mask interference. However, the projective exposure mode requires the exposure window to be strictly coplanar, low roughness at the edge of the window, and high motion / positioning accuracy. In addition, the projection exposure device is a key component in a cutting-edge lithography machine, and the replacement of easily-weary optical compon...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70358G03F7/70725G03F7/70891
Inventor 吴剑威温众普崔继文谭久彬
Owner HARBIN INST OF TECH
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