Mark point graph structure for easy laser marking and preparation method thereof

Abstract

The invention discloses a Mark point graph structure for easy laser marking; the Mark point graph structure comprises Mark points in a spiral form; the Mark point is used for monocrystalline PERC superposing with the selective emitter technology; a preparation method adjusts laser parameters, and lasers spiral Mark points on four corners of a silicon chip. The Mark point graph is a spiral graph, and can prevent problems encountered by a normal concentric circle graph; the spiral new graph can be fully compatible with existing laser doped equipment without increasing any cost, and is good in industrialization production process stability; the making time of the Mark point graph structure is 0.1-0.2s, thus shortening the whole SE structure making time, improving the production power, and increasing enterprise incomes; the Mark point graph structure and the making method are worthy of promotion.

Description

technical field [0001] The invention relates to the technical field of laser marking, in particular to a Mark dot graphic structure convenient for laser marking and a preparation method thereof. Background technique [0002] With the development of crystalline silicon battery science and technology, PERC battery has gradually become the mainstream of the market. In the next few years of development, PERC battery and PERC superimposed new technology battery will gradually mature and move towards industrial production. PERC superimposed SE technology is an effective The technical path to improve battery efficiency is also a technical means that is easy to implement and low in cost. The superimposed SE technology is realized by laser doping technology, and the laser doping pattern Mark point is a key to this technology. point. [0003] In the selective emitter structure made by laser, it is necessary to print the alignment mark points of the battery during printing. Generally,...

AI Technical Summary

Problems solved by technology

[0004] The conventional alignment of Mark points to create graphics is a set of concentric circles, as shown in the manual figure 2 As shown, although this graphic can realize circular mark points, the disadvantage is that it is easy to repeatedly mark and damage silicon wafers, and it takes 0.5s to make mark points at the same time, which seriously affects the production line capacity

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