Unlock instant, AI-driven research and patent intelligence for your innovation.

Nozzle cleaning device, coating device, and nozzle cleaning method

A technology of cleaning device and nozzle, applied in the direction of spraying device, spraying device, etc., can solve the problems of reduced cleaning performance and reduced coating quality, etc.

Active Publication Date: 2018-11-23
DAINIPPON SCREEN MTG CO LTD
View PDF9 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There is a problem that the cleaning performance decreases due to the shape change
In addition, the above-mentioned friction may generate friction powder and enter the discharge port, and the friction powder may be supplied to the surface of the substrate together with the coating liquid, resulting in a decrease in coating quality.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Nozzle cleaning device, coating device, and nozzle cleaning method
  • Nozzle cleaning device, coating device, and nozzle cleaning method
  • Nozzle cleaning device, coating device, and nozzle cleaning method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0038] figure 1 It is a figure which schematically shows the whole structure of the coating apparatus equipped with one embodiment of the nozzle cleaning apparatus of this invention. The coating device 1 is directed from figure 1 A slit coater for coating the upper surface Wf of the substrate W conveyed in a horizontal posture on the left-hand side of the right-hand side with a coating liquid. In addition, in order to clarify the arrangement relationship of each part of the device, in each of the following figures, the conveyance direction of the substrate W is referred to as the "X direction", and the figure 1 The horizontal direction from the left-hand side to the right-hand side is called "+X direction", and the opposite direction is called "-X direction". In addition, in the horizontal direction Y perpendicular to the X direction, the front side of the device is referred to as "-Y direction", and the rear side of the device is referred to as "+Y direction". Moreover,...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a nozzle cleaning technology. The recessed part of a nozzle connection member is pressed on the top end of the nozzle, then the top end is cleaned, the local wear of the nozzle connection member is avoided, the service life of the nozzle connection member is prolonged, and generated powder is reduced. The nozzle cleaning device comprises a nozzle connection member, which is provided with a recessed part with an inner surface that can be abutted on the top end, and a driving part. When the nozzle connection member is pressed on the top end, the driving part drives the nozzle connection member to move in the extension direction of a vent relative to the top end. In a state that the nozzle connection member does not press the top end, the nozzle connection member utilizes the end of the opening side of the recessed part of the inner surface to clamp the top end; in other aspect, when the nozzle connection member presses the top end, the top end and the recessed part come close to each other, the recessed part is elastically deformed, and the pressed range between the internal surface and the top end is enlarged.

Description

technical field [0001] The present invention relates to a coating device and a nozzle cleaning technology, wherein the coating device sprays a coating liquid from a discharge port provided at the tip of the nozzle to coat a glass substrate for a liquid crystal display device, a semiconductor substrate, a plasma display (PDP: Plasma Glass substrates for display panels, glass substrates for photomasks, substrates for color filters, substrates for memory disks, substrates for solar cells, substrates for electronic paper, and other substrates for precision electronic devices, rectangular glass substrates, flexible substrates for thin-film liquid crystals A substrate for organic electroluminescence (EL: Electro Luminescence) (hereinafter simply referred to as a "substrate") is cleaned by removing deposits adhering to the tips of the nozzles by a nozzle cleaning technique. Background technique [0002] Conventionally, in order to apply a coating liquid to a substrate, for example,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B05B15/50B05B1/04
CPCB05B1/044B05B15/50
Inventor 安陪裕滋高村幸宏
Owner DAINIPPON SCREEN MTG CO LTD