Chemical liquid management system and expense computing method and system for substrate processing device

The technology of a substrate processing device and a management system is applied to the liquid medicine management system of the substrate processing device, the cost calculation and the system field, and can solve the problems of difficulty in earning profits and the like

Inactive Publication Date: 2018-12-07
HIRAMA LAB
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] Therefore, the substrate manufacturer must bear the temporary huge cost burden for purchasing the concentration control device, the chemical solution preparation device, and the chemical solution regeneration device, as well as various efforts and burdens involved in the...

Method used

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  • Chemical liquid management system and expense computing method and system for substrate processing device
  • Chemical liquid management system and expense computing method and system for substrate processing device
  • Chemical liquid management system and expense computing method and system for substrate processing device

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Experimental program
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Effect test

no. 1 approach 〕

[0108] figure 1 It is a schematic diagram for explaining a chemical solution management system of a substrate processing apparatus including a chemical solution preparation device, a concentration management device, and an integrated flow meter according to the present embodiment. In the description of this embodiment, the following chemical solution management will be described: taking a 2.38% concentration of TMAH aqueous solution (developing solution) as an example as a chemical solution, and replenishing it with a 20% TMAH aqueous solution (developing solution) as a replenishing liquid. Stock solution), unused 2.38% TMAH aqueous solution (new solution of developer solution) and pure water for concentration management.

[0109] exist figure 1In this method, using the developer solution preparation device 3 as an example of the chemical solution preparation device, the new developer solution is automatically prepared and supplied from the stock solution of the chemical solu...

no. 2 approach 〕

[0147] figure 2 It is a schematic diagram for explaining a chemical solution management system of a substrate processing apparatus including a chemical solution regeneration device, a concentration management device, and an integrated flow meter according to the present embodiment.

[0148] exist figure 2 In this process, the chemical solution used in the development process facility 1 which is an example of a substrate processing apparatus is regenerated so that it can be reused by the developer solution regeneration device 4 which is an example of a chemical solution regeneration device. The regenerated developer that is regenerated by the developer regenerating device 4 is supplied to the developing process equipment 1 as one of the replenishing liquids. The developing solution regenerating device 4 is connected to the developing process equipment 1 via a piping 85 as a piping for regenerating liquid.

[0149] In addition, as figure 2 In the developer solution managem...

no. 3 approach 〕

[0166] image 3 It is a schematic diagram for explaining a chemical solution management system of a substrate processing device including a concentration management device, a chemical solution preparation device, a chemical solution regeneration device, and an integrated flow meter according to the present embodiment.

[0167] In this embodiment is in figure 1 In the chemical solution management system of the substrate processing apparatus of the first embodiment shown, the figure 2 The developer solution regenerating device 4 as an example of the chemical solution regenerating device described in the second embodiment shown is formed. The development process equipment 1 , the developer solution management device 2 , the developer solution preparation device 3 , and other components of this embodiment are the same as those of the first and second embodiments, and thus redundant description thereof will be omitted.

[0168] image 3 The chemical solution management system o...

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PUM

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Abstract

The invention provides a chemical liquid management system for a substrate processing device which is most suitable for managing chemical liquid used for manufacturing a substrate to be in the optimalstate, a computing method for chemical liquid management expenses for the substrate processing device and a computing system for chemical liquid management expenses for the substrate processing device. In the chemical liquid management system for the substrate processing device, a piping provided with an accumulative flow meter connects the substrate processing device with a chemical liquid preparing device preparing new liquid of chemical liquid and a chemical liquid regenerator for regenerating the chemical liquid being used. A concentration management device measures the concentration of the chemical liquid of the substrate processing device, adding the stoste or the new liquid and regenerated liquid of the chemical liquid, managing the chemical liquid to be with the optimal concentration. The accumulative flow of the supplied added liquid is metered by the accumulative flow meter which is connected with a network directly.

Description

technical field [0001] The present invention relates to a chemical solution management system of a substrate processing device that processes substrates using various chemical solutions that are repeatedly used in the manufacturing process of semiconductor or liquid crystal display substrates, a calculation method of the chemical solution management cost of the substrate processing device, and substrate processing The liquid medicine management cost calculation system of the device. Background technique [0002] In the manufacturing process of semiconductors or liquid crystal display substrates, for example, various chemical solutions such as developing solutions, etching solutions, stripping solutions, antistatic agents, and cleaning solutions are used. These chemical liquids (hereinafter, these chemical liquids are collectively referred to as "chemical liquids" when there is no need to specifically distinguish these chemical liquids.) are maintained and managed to be used ...

Claims

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Application Information

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IPC IPC(8): G03F7/30
CPCG03F7/30G03F7/42G03F7/70483G06Q30/0283H01L21/6715
Inventor 中川俊元
Owner HIRAMA LAB
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