Mask and preparation method thereof

Abstract

The invention relates to a mask and a preparation method thereof. The mask comprises a mask frame and a mask body fixedly arranged on the mask frame. A first area provided with a plurality of pixel holes used for displaying and a second area arranged around the first area and provided with a plurality of auxiliary pixel holes are arranged on the mask body. The size of the first auxiliary pixel holes in the second area is smaller than that of the pixel holes in the first area. According to the mask and the preparation method thereof, the mask body is provided with the second area around the first area, the size of the first auxiliary pixel holes in the second area is smaller than that of the pixel holes in the first area, so that the strength of the FMM from a non-etched area to the fully-etched area is between the strength of the non-etched area and the strength of the fully-etched area, the stress is changed gradually and is reduced gradually behind an area AA (including the first area and the second area), and accordingly, the area AA is prevented from being broken, and the purpose of balancing the strength and uniformity of the FMM is achieved.

Description

technical field [0001] The present application relates to the field of display technology, in particular to a mask plate and a preparation method thereof. Background technique [0002] AMOLED has been favored due to its advantages such as low driving voltage and long life of light-emitting elements. And because AMOLED (Active-matrix organic light emitting diode, the Chinese full name is active matrix organic light emitting diode or active matrix organic light emitting diode, known as the next generation display technology) needs to be used when realizing full color through evaporation technology Go to FMM (fine metal mask, high-precision metal mask plate) to ensure the position and size of the evaporated organic material. [0003] However, the process of chamber magnetic bonding, alignment, mask cleaning, handling, and netting in evaporation technology has high requirements on the strength of the mask. Poor strength may cause FMM to be easily damaged during use. Moreover, ...

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Problems solved by technology

[0003] However, the process of chamber magnetic bonding, alignment, mask cleaning, handling, and netting in evaporation technology has high requirements on the strength of the mask. Poor strength may cause FMM to be easily damaged during use.

Moreover, based on the particularity of the structure of the FMM and the requirements for the accuracy of the evaporation position, the FMM needs to etch away more materials, especially on the FMM with a larger AA area (Active Area, effective display area), the amount of etching is relatively large. More likely to cause FMM to be damaged during production and operation