Method for measuring S parameter and terminal equipment
A parameter and end face technology, which is applied in the field of microwave characteristic measurement of wafer-level semiconductor devices, can solve problems such as large random errors, and achieve the effect of improving measurement accuracy.
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[0042] In the following description, specific details such as specific system structures and technologies are presented for the purpose of illustration rather than limitation, so as to thoroughly understand the embodiments of the present invention. It will be apparent, however, to one skilled in the art that the invention may be practiced in other embodiments without these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present invention with unnecessary detail.
[0043] In order to illustrate the technical solutions of the present invention, specific examples are used below to illustrate.
[0044] The embodiment of the present invention provides a method for detecting S parameters, the execution subject of the method may be an on-chip vector network analyzer, such as figure 1 As shown, the method includes the following steps:
[0045] In step 101, vector c...
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