A kind of multi-harmonic gan/algan resonant tunneling diode
A resonant tunneling and diode technology, applied in the direction of diodes, semiconductor devices, electrical components, etc., can solve the problems of small quantum well width and barrier layer thickness, only one, and limited application field
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[0027] as attached figure 2 shows a low-power GaN / AlGaN-based resonant tunneling diode, including an intrinsic GaN substrate 1, an AlN buffer layer 2, n + - GaN collector layer 3, i-GaN first isolation layer 4, i-AlGaN first barrier layer 5, i-GaN quantum well layer 6, i-AlGaN second barrier layer 7, i-GaN second barrier layer Isolation layer 8, i-GaN emitter layer 9, AlN, Si 3 N 4 or SiO 2 The passivation layer 10 and the metal electrode pin 11 in the collector area and the metal electrode pin 12 in the emitter area. Epitaxial AlN buffer layer 2 on the upper surface of intrinsic GaN substrate 1, epitaxial n on the upper surface of AlN buffer layer 2 + - GaN collector layer 3, n + - epitaxial i-GaN first isolation layer 4, i-AlGaN first potential barrier layer 5, i-GaN quantum well layer 6, i-AlGaN second potential barrier layer 7, i- GaN second isolation layer 8 and n + - GaN emitter layer 9; i-GaN first isolation layer 4, i-AlGaN first barrier layer 5, i-GaN quantum ...
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