Semiconductor sensor and method for manufacturing same
Patent Information
- Authority / Receiving Office
- CN Β· China
- Current Assignee / Owner
- DENSO CORP
- Publication Date
- 2019-04-02
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Abstract
Description
[0001] Cross-reference of related applications
[0002] This application is based on Japanese Patent Application No. 2016-158534 filed on August 12, 2016, the contents of which are cited here. technical field
[0003] The present invention relates to a semiconductor sensor and a manufacturing method thereof. Background technique
[0004] For example, Patent Document 1 proposes a structure in which a semiconductor chip is covered with a cast resin portion so that a part of the semiconductor chip is exposed. This structure can be manufactured as follows. First, a semiconductor chip is prepared. In addition, a mold in which a space portion is formed by an upper mold and a lower mold is prepared. The upper mold has a protruding portion protruding from a portion of the upper mold corresponding to the periphery of the exposed portion of the semiconductor chip.
[0005] Next, the film was affixed to the entire surface of the upper mold facing the lower mold. In addition, a sem...