Uniform gas feeding device of fluidized bed reactor

Abstract

The invention discloses a uniform gas feeding device of a fluidized bed reactor. The device includes a cone, wherein semi-circular pipes are symmetrically distributed on the outer surface of the cone.The semi-circular pipes are provided with a pipe mouth c and a pipe mouth d, which are symmetrically distributed left and right and are longitudinally extended, and a pipe mouth a and a pipe mouth bwhich are transversally extended. The pipe mouth a and the pipe mouth b are communicated with each other and are communicated with the semi-circular pipes. The pipe mouth c and pipe mouth d are communicated with each other and are communicated with the semi-circular pipes. The semi-circular pipes are communicated with the cone. By means of the device, gas can be uniformly distributed in silicon powder and channeling short-circuit is not liable to form. Reaction gas and the silicon powder have larger contact area, so that reaction efficiency of the fluidized bed reactor is effectively improved.Distributor heads are uniformly distributed on the semi-circular pipes, so that when the gas is fed into the reactor, a cyclone-like spiral upward action force is formed on the reaction gas, so thatreaction effect is better.

Description

technical field [0001] The invention relates to a uniform air intake device for a fluidized bed reactor, belonging to the technical field of research and development of reaction equipment. Background technique [0002] Organosilicon materials have excellent high and low temperature resistance, biocompatibility, etc., and are widely used in industries and other fields. Fluidized bed reactors are one of the key equipment for organosilicon production. In fluidized bed reactors Internally, due to the large diameter of the fluidized bed reactor, there is a phenomenon of uneven radial distribution of the bed, and the gas is only fed from the bottom, which is easy to form a channel flow phenomenon. At the same time, the distribution holes of the gas distribution plate at the bottom of the fluidized bed reactor There is no silicon powder leakage prevention measure, and there is a phenomenon of silicon powder blockage between the distribution plate and the gas inlet of methyl chlor...

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Problems solved by technology

[0002] Organosilicon materials have excellent high and low temperature resistance, biocompatibility, etc., and are widely used in industries and other fields. Fluidized bed reactors are one of the key equipment for organosilicon production. In fluidized bed reactors Internally, due to the large diameter of the fluidized bed reactor, there is a phenomenon of uneven radial distribution of the bed, and the gas is only fed from the bottom, which is easy to form a channel flow phenomenon. At the same time, the distribution holes of the gas distribution plate at the bottom of the fluidized bed reactor There is no silicon powder leakage prevention measure, and there is a phenomenon of silicon powder blockage between the distribution plate and the gas inlet of methyl chloride. Therefore, a uniform gas inlet device for the fluidized bed reactor is designed to effectively solve the problem of uneven gas distribution in the fluidized bed reactor. problem, improve the reaction efficiency of the fluidized bed reactor

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