Anti-rotation device, motion table system and photolithography equipment
An anti-rotation and workpiece table technology, applied in the field of photolithography, can solve the problems of cable pipeline hazards, workpiece table cannot be moved, workpiece table loses positioning ability, etc., and achieve the effect of avoiding resistance
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[0055]The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0056] The technical solution of the present invention will be described in detail below with specific embodiments. The following specific embodiments may be combined with each other, and the same or similar concepts or processes may not be repeated in some embodiments.
[0057] figure 1 It is a structural representation of a motion platform system of the present invention Figure 1 ; figure 2 It is a structural representation of a motion platform system of...
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