A Position Compensation Method for Calibration Plate of Direct-Writing Exposure Machine
A compensation method and calibration plate technology, applied in the field of lithography, can solve problems such as insufficient position accuracy and large calibration errors, achieve good system errors, improve production quality, and solve the effects of poor alignment
Active Publication Date: 2020-11-06
SUZHOU YUANZHUO OPTOELECTRONICS TECH CO LTD
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[0005] The present invention aims to provide a position compensation method for a calibration plate of a direct-writing exposure machine to solve the problems of large calibration errors and insufficient position accuracy in the prior art
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[0034] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the drawings in the embodiments of the present invention.
[0035] See figure 1 , figure 2 , a kind of position compensation method for the calibration plate of direct writing exposure machine of the present invention, comprises the following steps:
[0036] Step S1: Establish a plane coordinate system on the calibration board of the substrate platform, calibrate the positional relationship between the fixed first alignment camera and the movable second alignment camera, and determine the first alignment camera and the second alignment camera The offset error value of the bit camera;
[0037] Step S2: Calculate the offset vector for each calibration point along the X-axis and Y-axis directions of the coordinate system, and obtain the error compensation value of each calibration point;
[0038] Step S3: Calculate the error compensat...
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The invention aims to provide a position compensation method for a calibration plate of a direct writing type exposure machine, and solves the problems of relatively large calibration error and insufficient position precision in the prior art. The method comprises the following steps: S1, a plane coordinate system is established on the calibration plate of a substrate platform, a position relationbetween a fixed first alignment camera and a movable second alignment camera is calibrated, and an offset error value between the first alignment camera and the second alignment camera is determined;S2, an offset vector is calculated for each calibration point in the X-axis and Y-axis directions of the coordinate system so as to obtain an error compensation value of each calibration point; and S3, an error compensation value of a coordinate point P on a PCB on the substrate platform is calculated through a linear interpolation method, and position compensation is carried out on the coordinate point P by using the calculated error compensation value to obtain real coordinates of the coordinate point P.
Description
technical field [0001] The invention relates to the technical field of photolithography, in particular to a position compensation method for a calibration plate of a direct-writing exposure machine. Background technique [0002] Photolithography is used to print a pattern of features on the surface of a substrate. Such substrates may include substrates used in the fabrication of semiconductor devices, various integrated circuits, flat panel displays (eg, liquid crystal displays), circuit boards, biochips, micromechanical electronic chips, optoelectronic circuit chips, and the like. Direct writing lithography technology plays a very important role in the field of semiconductor and PCB production by replacing the direct image transfer technology exposed by traditional masks or film negatives. [0003] During the production and assembly process of the direct writing lithography machine, due to certain errors and position deviations in the substrate platform, system and exposur...
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IPC IPC(8): G03F7/20
Inventor 廖绍良徐国栋张雷李伟成
Owner SUZHOU YUANZHUO OPTOELECTRONICS TECH CO LTD