A DI machine projection control system and method for compensating exposure position
A technology of exposure position and control system, which is applied to the exposure device of photolithography process, microlithography exposure equipment, photolithography process of pattern surface, etc. Accurate, high-quality exposure effects
Active Publication Date: 2020-08-28
源卓微电子(南通)有限公司
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[0005] The present invention aims to provide a DI machine projection control system and a method for compensating the exposure position, so as to solve the problems in the prior art that the platform moves unevenly in each area of the two-dimensional plane and the position accuracy is not enough
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[0040] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the drawings in the embodiments of the present invention.
[0041] See figure 1 , a DI machine projection control system is characterized in that it includes a main control system 1 and is electronically connected to the main control system 1:
[0042] The exposure carrier platform 2 is used to place the dry film. After the exposure process is started, under the control of the platform controller, it moves precisely in the direction of the X and Y axes of the plane;
[0043] Platform controller 3, used to control the in-plane displacement of the exposure carrier platform;
[0044] The projection system 4 includes several DMD projection subsystems, which are used to project the exposure pattern onto the dry film placed on the exposure carrier platform. The DMD projection subsystem includes a DMD control circuit, laser components, and o...
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The invention provides a DI machine projection control system and a compensation method for the exposure position in order to solve the problems of uneven movement and inadequate position accuracy ofthe exposure carrier platform in various areas of the two-dimensional plane in the prior art. The compensation method comprises the following steps: establishing a plane coordinate system on an exposure carrier platform, evenly dividing the exposure carrier platform into several exposure strips along the coordinate axis direction, and evenly dividing each exposure strip into several regions; carrying out pre-exposure, capturing the position of the exposure pattern by a camera system, and calculating the error compensation value of the exposure pattern of each region on each exposure strip; making compensation for the exposure position according to the error compensation value of each exposure strip passing through each region.
Description
technical field [0001] The invention relates to the technical field of laser direct imaging, in particular to a DI machine projection control system and a method for compensating exposure positions. Background technique [0002] Laser direct imaging technology is to directly image the PCB gerber image on dry film such as dry film by laser scanning method, which is used in the exposure process of pcb board production. After exposure, the image is left on the mask plate, combined with subsequent processes, to complete PCB board production. The core part of laser direct imaging equipment is composed of software part, exposure carrier platform part, platform driver part, projection system part and exposure control part. [0003] The software part is responsible for converting the original graphics of the PCB factory into the graphics format required by the equipment. The platform controller and the exposure platform part are responsible for loading dry film and other chemical ...
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IPC IPC(8): G03F7/20
CPCG03F7/2053G03F7/704G03F7/70775
Inventor 张峰张雷李伟成
Owner 源卓微电子(南通)有限公司