88results about How to "Improve exposure quality" patented technology

An illumination and modulation device is described, as well as a method for modulating the exposure intensity in the integrating digital screen imaging system (IDSI), comprising a light source, a light modulator, and various devices. The object of the invention is to present a device and a method with which the exposure quality can be optimized using simple means. The object on which the invention is based is attained by the fact that the device comprises at least one device for varying the number of cells of the light modulator used to expose the photosensitive material or by the fact that, in the method according to the invention, the number of cells of the light modulator used to expose the photosensitive material can be varied.

The embodiment of the invention discloses an exposure control method and device which are used in a candid camera with a video recording mode and a candid mode. The method comprises the following steps: after receiving a candid trigger signal, the candid camera converts the video recording mode to the candid mode; the candid exposure parameter in the candid mode is calculated according to a video exposure parameter in the video recording mode; and one frame of candid image is shot according to the candid exposure parameter. The candid camera in the embodiment of the invention has double functions of video recording and candid so that the candid exposure parameter of any moment can be calculated according to the video exposure parameter; as the video exposure parameter is characterized by changing according to the physical environment, the calculated candid exposure parameter can change to adapt to the environment and the exposure quality of the candid image can be increased; and when the candid function of the candid camera in the embodiment of the invention is not triggered, the candid camera can perform real-time recording of the video image, thus the double functions of the candid camera can be realized.

A reticle cleaning method for a lithography tool, wherein an inspection apparatus deployed in the lithography tool is used to perform the cleaning procedure on reticle in the EUV reticle pod, the reticle cleaning method comprising: transporting the EUV reticle pod to the upper chamber of the inspection apparatus; forming vacuum in the upper chamber of the inspection apparatus; transporting the inner box of the EUV reticle pod to the lower chamber of the inspection apparatus; forming vacuum in the lower chamber of the inspection apparatus; performing the cleaning process multiple times for gas filling and vacuum exhausting, wherein an inert gas is provided for the process of gas filling to be performed multiple times on the inner box to allow the particles in the inner box to be brought away by the flow field formed by the inert gas in the inner box; and transporting the inner box to a reticle library.

A maskless exposure system that has multiple maskless optical engines arranged in an (NM) matrix that form and project a pattern onto a substrate. A first stage system is capable of driving the maskless optical engines in a first direction, a second stage system capable of holding and moving the substrate in a second direction perpendicular to the first direction. A control system that processes data and synchronizing movement of the first and second stage systems and a vision system that detects the positions of the second stage system to synchronize movements with the multiple optical engines.

The invention discloses a method and a device for optimizing and editing an image, which belong to the technical field of image processing. The method comprises the following steps of: adjusting curves of an image to be optimized to obtain an image with modified curves, performing HSV conversion on each point corresponding to the image with modified curves to obtain a converted color value H, a converted purity value S and a converted brightness value V, weighing the obtained value of the S and then performing an RGB conversion to the color value H, the brightness value V and the weighed purity value S to acquire a saturation modified image. The device comprises a curve adjusting module, a first transformation module and a second transformation module. The method and the device for optimizing and editing the image make the color of the image brighter by adjusting the curves and modifying the saturation of the image to be optimized, do not break the tone of the image and have the effects of optimizing the display quality of the image.

The invention relates to the technical field of exposure treatment, and particularly discloses an ultraviolet light exposure system capable of emitting light in parallel. The system comprises a light source module, a condenser, a shutter, a curved mirror, an exposure table and other structures. A two-light-source assembly or a single-light-source assembly is adopted in the ultraviolet light exposure system capable of emitting light in parallel. The invention further provides an exposure machine with the ultraviolet light exposure system capable of emitting light in parallel. According to the ultraviolet light exposure system capable of emitting light in parallel, multiple UV-LED light sources are adopted and all irradiate the condenser, the light focus on the condenser, the UV-LED can emits continuous ultraviolet light, the heat dissipation performance is significantly improved, the parallel light is good in parallelism and high in uniformity, and ultraviolet light transmission is stable and is not affected by external factors, so that the uniformity of the ultraviolet light entering a printed circuit board is ensured, and the exposure quality is improved.

An exposure apparatus for an optical disc used for eliminating the vibrations in the propagating direction when a rotation mechanism rotates. The slider controller 40 and the spindle controller 41 of the exposure apparatus 1 are activated, and the then the optical disc begins to be rotated by an AC synchronized motor. Through a condensing device 9, laser beams emitted form the laser source 6 are irradiated on the optical disc for exposure. At this time, the optical disc is eccentrically chucked on the rotation mechanism, resulting a rotational vibration of the whole rotation mechanism. A measurer 17 is used for detecting a propagating component of the rotational vibration, and a vibrator controller 42 controls the vibrator 20 as the output of the measurer 17 approaches zero. Therefore, the vibration in the propagating direction of the base 2 is cancelled, and the propagation accuracy is increased and the exposure quality is enhanced.

The invention discloses a substrate adsorption device, photoetching equipment and an adsorption method, the adsorption device comprises an adsorption mechanism and a shaping mechanism arranged opposite to the adsorption mechanism, and a substrate accommodating space is formed between the adsorption mechanism and the shaping mechanism; the adsorption mechanism comprises a sucker, a plurality of suction holes are distributed in the surface of the sucker, and the sucker is used for adsorbing the substrate in the substrate accommodating space from the first side; the shaping mechanism is used foracting on the substrate in the substrate containing space from the second side opposite to the first side so as to be matched with the suction cup to level the substrate in the substrate containing space. According to the embodiment of the invention, the shaping mechanism opposite to the adsorption mechanism is arranged; the adsorption mechanism flattens the substrate through cooperation of the suction holes in the sucker, the adsorption substrate sheet, the shaping mechanism and the sucker, so that the substrate is completely adsorbed on the sucker, flattening and complete adsorption of the substrate with the large warping amount are achieved, the exposure quality and yield of the substrate are improved, and the production efficiency is improved.

The invention discloses a tool and a method for detecting tiny bubbles in an immersion flow field of an immersion lithography machine, and the tool comprises an immersion flow field maintenance system, a photographing system, and a camera pose adjustment system, and the photographing system comprises a photographing camera, a camera lens, and a photographing light source. The camera pose adjustment system is used for adjusting motion adjustment of the shooting camera in the X-axis, Y-axis or Z-axis direction, and the Z-axis is used for realizing focusing and layered scanning motion of the shooting camera. The photographing light source is arranged above the simulation objective lens and used for providing a backlight source for bubble detection in the immersion flow field, the photographing camera and the camera lens are arranged below the simulation silicon wafer and located below the immersion flow field, and the photographing camera is arranged on the camera pose adjustment system.Image data processing is carried out on the shot images, and the bubble size and position on each image are detected. The global image of the whole flow field at the same moment is more effectively obtained, the phenomenon of bubble loss during detection is reduced or avoided, and the final photoetching exposure quality is improved.

The invention provides an exposure device. The exposure device comprises a baffle assembly and a lens assembly, wherein an exposure hole is formed in the baffle plate assembly, and the lens assembly is arranged between the baffle plate assembly and a substrate to be exposed and is used for converging a diffraction light ray generated by a side edge of the exposure hole onto a region to be exposed of the substrate to be exposed. By the exposure, relatively high exposure accuracy can be achieved, and the exposure quality of the substrate to be exposed is improved.

The invention discloses a six-freedom-degree decoupling modeling method of a workpiece platform micro-motion part, and mainly relates to a six-freedom-degree decoupling modeling method of a photo-etching machine workpiece platform micro-motion part. The six-freedom-degree decoupling modeling method aims to solve the coupling problem of a vertical direction three-freedom-degree motion model of the photo-etching machine workpiece platform micro-motion part and a horizontal direction three-freedom-degree motion model of the photo-etching machine workpiece platform micro-motion part. The six-freedom-degree decoupling modeling method comprises the steps of 1 establishing the conversion relationships between centroid driving force of the workpiece platform micro-motion part and torque of the workpiece platform micro-motion part and driving force of a voice coil motor; 2 establishing the position relationship between an exposure center and the workpiece platform micro-motion part centroid; 3 conducting secondary derivation on the position relationship obtained in the step 2 and ignoring primary derivative items; 4 obtaining the relation between the driving force exerted on the workpiece platform micro-motion part centroid and the torque exerted on the workpiece platform micro-motion part centroid and the acceleration of the exposure area center according to the Newton second law; 5 listing equations about the centroid driving force and torque through the results obtained in the step 1and the step 4, and obtaining the relation between the exposure center position and the driving force of the voice coil motor. The invention belongs to the field of super precision manufacturing.

The present invention discloses a film type liquid heater and a uniform heating method thereof. End fixation plates are arranged at two ends of a barrel. A heating pipe is arranged in the barrel. Pipe ports run through the two end fixation plates, respectively. Connecting pipes are arranged in the pipe ports. Sealing connection components are arranged at inner ends of the two connecting pipes. A heating film layer is coated outside the heating pipe. Electrode layers are connected left and right sides of the heating film layer, and the electrode layers are connected to an external power supply. An insulating layer is coated outside the heating film layer. A flow splitting column is fixedly connected in the heating pipe. A heating chamber is formed between an inner side of the heating pipe and the flow splitting column. Flow splitting grooves are formed at left and right ends and on the inner side of the flow splitting column. Two outer ends of the flow splitting grooves are communicated with the connecting pipes, and the flow splitting grooves are communicated with the heating chamber. The heating film layer is electrified to generate heat. The heat is conducted inward to the heating pipe and the flow splitting column, and conducted outward to the barrel. Liquid flows into the heating chamber through the connecting pipes and the flow splitting grooves, so that the heating uniformity of the liquid flow flowing through the heating chamber is improved.

The invention discloses a fluid extracting-discharging apparatus used for extracting and discharging a gas-liquid mixture from the edge of an immersion liquid flow field in an immersion head to gas-liquid recycling equipment; the fluid extracting-discharging apparatus comprises a first extracting-discharging pipe, an atomizing cavity and a second extracting-discharging pipe connected in sequence;the gas-liquid mixture enters the atomizing cavity to be atomized through the first extracting-discharging pipe; then the atomized mixture enters the gas-liquid recycling equipment through the secondextracting-discharging pipe; by virtue of the fluid extracting-discharging apparatus, the anisotropic gas-liquid two-phase flow which flows to the fluid extracting-discharging apparatus can be converted into isotropous ''atomized-shaped'' single-phase flow, so that pressure balance in each position of the fluid extracting-discharging apparatus can be maintained; the invention also discloses an immersion type photoetching machine provided with the fluid extracting-discharging apparatus; and the immersion type photoetching machine is stable in the immersion liquid flow field, good in flow fieldsealing effect, and capable of effectively preventing a gas-liquid two-phase ''water plugging'' phenomenon generated in the pipeline by the gas-liquid mixture in the extracting and discharging position of the immersion liquid flow field, and improving exposure quality.

The invention discloses a doped cerium oxide photosensitizer suitable for photosensitive microcrystalline glass and a preparation method and application thereof, the doped cerium oxide photosensitizer is represented by a general formula Ce < 1-x > W < x > O < 2 >, and in the general formula, x is equal to 0.05-0.25. The catalyst is prepared by taking cerium nitrate, ammonium metatungstate hydrate and organic fuel as raw materials and adopting a sol-gel self-propagating combustion method. According to the cerium oxide doped photosensitizer provided by the invention, W ion doping is carried out on the existing photosensitizer CeO2, so that the light absorption performance of the photosensitizer CeO2 is improved, and the absorption peak of the photosensitizer CeO2 is moved, so that the absorption peak of the photosensitizer CeO2 is matched with the existing light source, and the nucleation efficiency and the exposure quality of photosensitive microcrystalline glass are improved.

The invention discloses an exposure machine tool, an exposure system and an exposure method thereof. Under the effect of specific light rays emitted by a light source, light sensitive coating shifts between an insulating state and a conductive state, so that fixation and separation of a substrate to be exposed is facilitated; meanwhile, electrostatic charges are released to the light sensitive coating via an electrostatic generator, and the substrate to be exposed is fixed in an electrostatic adsorbing manner without generating a raised partition baffle wall; in addition, the metal tool surface of the exposure machine tool is grounded, so that the electrostatic charges can be exported from the light sensitive coating via the metal tool surface, so that the substrate to be exposed and the light sensitive coating are separated, and movement of the substrate to be exposed is facilitated; in a word, the exposure machine tool ensures generation of static electricity and adsorption to the substrate to be exposed, and also achieves elimination of the existing electrostatic charges, so that the substrate to be exposed is convenient to take out, stage mura caused by negative adsorption of gas is avoided, the substrate to be exposed is protected against damage, and exposure quality of the substrate to be exposed is effectively improved.

The invention provides a double-table-board exposure machine and a method for controlling the opening and closing of the double-table-board exposure machine, the double-table-board exposure machine comprises a machine body which comprises a first table board and a second table board, a first door body and a second door body, an electric executing device which is arranged on the machine body, is mechanically connected with the first door body and the second door body and is used for controlling the first door body to move in the direction parallel to the table board according to a first door body driving signal, and a control device which is electrically connected with the electric executing device and used for outputting the first door body driving signal or a second door body driving signal according to an operation instruction, wherein the first door body is located on the first table board, a gap is formed between the first door body and the first table board, the second door body is located on the second table board, a gap is formed between the second door body and the second table board, and the first door body and the second door body are staggered in the direction perpendicular to the table boards. According to the double-table-board exposure machine, external dust can be prevented from entering the table boards, and poor exposure is avoided.