Array substrate, method for manufacturing same and display device

Abstract

The invention provides an array substrate, a method for manufacturing the same and a display device. The method for manufacturing the array substrate includes forming alignment mark covering layers in certain regions of a corresponding substrate by the aid of picture composition processes; forming a black matrix film in regions outside alignment marks on the substrate; removing the alignment mark covering layers by means of exposure so as to expose the alignment marks; carrying out picture composition processes on the black matrix film to form patterns of black matrixes. The alignment marks are formed in the certain regions of the corresponding substrate. Exposure wavelengths of the alignment mark covering layers are different from exposure wavelengths of the black matrix film. The array substrate, the method and the display device have the advantages that interference of black matrix films with high optical density (the optical density is usually higher than or equal to 4.0) on alignment mark recognizing, grasping and positioning in exposure procedures can be prevented by the aid of the method, the alignment marks can be accurately aligned by the black matrix film during exposure, accordingly, the exposure precision of the black matrixes can be improved, and the exposure quality and the performance of the array substrate can be enhanced.

Description

technical field [0001] The present invention relates to the field of display technology, in particular, to an array substrate, a manufacturing method thereof, and a display device. Background technique [0002] In the field of thin film transistor liquid crystal display (TFT-LCD), the color filter CF substrate and the array substrate are generally combined through a sealant (Sealant). In a traditional liquid crystal display panel, a layer of black matrix (BM, Black Matrix) is usually prepared on the side of the color filter CF substrate, which is used to separate the sub-pixels of each color, block the gaps between the sub-pixels of each color, and prevent color mixing and light leakage; The technology of color filter CF substrate or black matrix BM on the array substrate is called COA (CF OnArray, CF substrate attached to Array substrate) or BOA (BM On Array, BM attached to Array substrate), COA and BOA can solve The mismatch between the BM light-shielding area and the Arr...

AI Technical Summary

Problems solved by technology

[0003] However, due to the high optical density OD of the black matrix BM, after the BM photoresist is directly coated on the Array substrate, the exposure light commonly used by the exposure equipment cannot penetrate the BM layer, which will interfere with the BM mask on the Array substrate. The identification, capture and positioning of the alignment mark Mark on the substrate makes it impossible for the black matrix mask BM Mask to be accurately aligned with the Array substrate, so that the exposure machine can only rely on the equipment itself and the Array substrate and the black matrix mask BM Mask The physical and mechanical alignment of the above-mentioned alignment mark Mark cannot be pre-corrected and adjusted, which greatly reduces the exposure accuracy of BM, resulting in a large error in the total pitch TP (Total Pitch) of the black matrix pattern BM Pattern on the array substrate, that is, BM The difference between the actual value of pattern exposure and the design value CD Bias is relatively large, which eventually leads to abnormal film surface quality and function of the array substrate

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