Tool and method for detecting tiny bubbles in immersion flow field of immersion lithography machine

A technology for detecting tooling and lithography machines, which is used in measurement devices, optomechanical equipment, microlithography exposure equipment, etc., and can solve the problems of micro-bubble detection devices that cannot obtain global images at the same time, detect bubble loss, and exposure defects.

Pending Publication Date: 2020-10-27
ZHEJIANG CHEER TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The present invention solves the problem that the micro-bubble detection device in the immersion flow field of the existing immersion lithography machine cannot obtain the global image of the entire flow field at the same time at the same time, and it is easy to lose the detected bubbles, which may eventually cause exposure defects, etc. Based on the current situation, it is possible to obtain a global image of the entire flow field at the same time more effectively, reduce or avoid the phenomenon of missing bubbles, and improve the quality of the final lithography exposure. Micro-bubble detection tooling in the immersion flow field of the immersion lithography machine and its detection method

Method used

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  • Tool and method for detecting tiny bubbles in immersion flow field of immersion lithography machine
  • Tool and method for detecting tiny bubbles in immersion flow field of immersion lithography machine
  • Tool and method for detecting tiny bubbles in immersion flow field of immersion lithography machine

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Experimental program
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Effect test

Embodiment 1

[0038] figure 1 , image 3 In the shown embodiment, an immersion lithography machine immersion microbubble detection tool in the immersion flow field includes an immersion flow field maintenance system with an immersion head 30, a simulated objective lens 10 and a simulated silicon wafer 40, and also includes a camera system 60 and The camera pose adjustment system 50, the shooting system 60 includes a shooting camera, a camera lens and a shooting light source 01; the camera pose adjustment system 50 is used to adjust the shooting camera along the X axis, the Y axis or the Z axis (see image 3) in the direction of motion adjustment, where the Z axis is used to realize the focusing and layered scanning movement of the shooting camera, the X axis and the Y axis; the immersion flow field is located on the XY plane formed by the X axis and the Y axis, and its position is constant ; When detecting bubbles, gradually move the camera and take pictures on the XY plane, so that the cap...

Embodiment 2

[0040] figure 2 , Figure 4 In the shown embodiment, a method for detecting micro-bubbles in an immersion lithography machine in an immersion flow field includes the following detection steps

[0041] A1 Fix the immersion head, the simulated objective lens and the test sample to be detected on the micro-bubble detection tooling in the immersion flow field of the immersion lithography machine described in the technical solution of embodiment 1;

[0042] A2 Install the micro-bubble detection tooling in the immersion flow field of the immersion lithography machine, the test sample to be detected, the immersion head and the simulated objective lens on the workpiece table in sequence;

[0043] A3 Install the shooting camera to the corresponding adjustment position of the camera pose adjustment system, use the camera pose adjustment system to focus on the flow field where the immersion flow field is close to the upper layer of the simulated objective lens, and set an appropriate l...

Embodiment 3

[0057] figure 2 , Figure 4 In the shown embodiment, in the B5 detection step of Embodiment 2, the detection method adopted is that the photographing camera first does not move at one position, and drives the movement of the silicon wafer according to the movement mode of the silicon wafer under the scanning condition of the lithography machine. , that is, to simulate the exposure movement, use the shooting camera to monitor the air bubbles during the simulated exposure movement; after completing the monitoring of a site, move to the next small area in the submerged flow field to repeat the monitoring process of the simulated exposure movement, and so on until monitoring Small areas cover the entire submerged flow field. Others are identical with embodiment 2.

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Abstract

The invention discloses a tool and a method for detecting tiny bubbles in an immersion flow field of an immersion lithography machine, and the tool comprises an immersion flow field maintenance system, a photographing system, and a camera pose adjustment system, and the photographing system comprises a photographing camera, a camera lens, and a photographing light source. The camera pose adjustment system is used for adjusting motion adjustment of the shooting camera in the X-axis, Y-axis or Z-axis direction, and the Z-axis is used for realizing focusing and layered scanning motion of the shooting camera. The photographing light source is arranged above the simulation objective lens and used for providing a backlight source for bubble detection in the immersion flow field, the photographing camera and the camera lens are arranged below the simulation silicon wafer and located below the immersion flow field, and the photographing camera is arranged on the camera pose adjustment system.Image data processing is carried out on the shot images, and the bubble size and position on each image are detected. The global image of the whole flow field at the same moment is more effectively obtained, the phenomenon of bubble loss during detection is reduced or avoided, and the final photoetching exposure quality is improved.

Description

technical field [0001] The invention relates to a micro-bubble detection technology, in particular to a micro-bubble detection tool used in an immersion flow field of an immersion photolithography machine and a detection method thereof. Background technique [0002] Usually lithography equipment is based on optical lithography, which uses an optical system to accurately project and expose the pattern on the mask onto a substrate coated with photoresist, such as a silicon wafer substrate. Immersion lithography refers to filling water between the exposure lens and the silicon wafer to form an immersion liquid flow field, or an immersion liquid flow field with a higher refractive index to replace the corresponding air in traditional dry lithography technology. Since the refractive index of water is larger than that of air, this increases the numerical aperture of the lens group, thereby obtaining a smaller characteristic linewidth. However, an important problem of immersion li...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G01N21/88
CPCG03F7/7085G03F7/2041G03F7/70341G01N21/8851G01N2021/8887G01N2021/8874G01N2021/8861G01N2021/888
Inventor 不公告发明人
Owner ZHEJIANG CHEER TECH CO LTD
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