Rectangular waveguide evanescent mode based electromagnetic field probe spatial resolution calibration device

A technology of spatial resolution and rectangular waveguide, which is applied in the direction of measuring devices, measuring electrical variables, instruments, etc., can solve problems such as unfavorable testing and small gradients of electromagnetic fields, and achieve wide calibration bandwidth, constant field gradients, and high calibration accuracy.

Active Publication Date: 2019-07-05
BEIHANG UNIV
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The present invention aims at the defects of the existing electromagnetic field probe spatial resolution calibration device based on TEM or quasi-TEM type transmission line that the electromagnetic field gradient is small, which is not conducive to testing, and proposes an electromagnetic field probe spatial resolution calibration device based on the rectangular waveguide litter mode, The device utilizes the fading mode of the dominant mode of the rectangular waveguide, where the dominant mode of the rectangular waveguide is TE 10 Mode, that is, the electric field exists only in the section perpendicular to the direction of propagation, and perpendicular to the broadside of the section; the magnetic field has two components

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Rectangular waveguide evanescent mode based electromagnetic field probe spatial resolution calibration device
  • Rectangular waveguide evanescent mode based electromagnetic field probe spatial resolution calibration device
  • Rectangular waveguide evanescent mode based electromagnetic field probe spatial resolution calibration device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0031] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. figure 1 The design flow chart of the rectangular waveguide of the electromagnetic field probe spatial resolution calibration device based on the rectangular waveguide litter mode of the present invention is shown, including the following steps:

[0032] In the first step, the upper limit of the size of the rectangular waveguide is determined according to the calibration frequency band.

[0033] In order to obtain a large field gradient, the waveguide litter mode needs to be used, and the present invention determines the upper limit of the designed rectangular waveguide size through the cutoff frequency condition of the waveguide. Specifically, the rectangular waveguide TE 10 The cutoff frequency of the mode (dominant mode) satisfies f c10 =c / 2a, where, c is the speed of light in vacuum, and a is the waveguide width. When the electromagnetic ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a rectangular waveguide evanescent mode based electromagnetic field probe spatial resolution calibration device. The device includes a rectangular waveguide connected to a matching load; the rectangular waveguide has a width a, a height b and a length l, wherein a <= 0.4c/f<max>, b < a, l > 8[lambda]c10, the c is the light velocity in vacuums, f<max> is the highest calibration frequency, and [lambda]c10 is the cut-off wavelength of a dominant mode TE10 mode of the rectangular waveguide; the half position on the upper broad wall of the rectangular waveguide is provided with a slit so as to form a calibration area; a probe can be completely stretched into the slit and move in the slit through the configuration of the width w of the slit and the height b of the rectangular waveguide; and the disturbance of the slit on a waveguide internal field structure can be in the allowed range of calibration precision through the configuration of the width w of the slit. The device is flexible and plastic in design and wide in calibration band, and can obtain large electromagnetic field gradients, so that the device is convenient in calibration operation and high in calibration precision.

Description

technical field [0001] The invention belongs to the field of electromagnetic metrology, in particular to an electromagnetic field probe spatial resolution calibration device based on a rectangular waveguide litter mode. Background technique [0002] When analyzing and rectifying electromagnetic interference (EMI: Electromagnetic Interference) problems, electromagnetic field probes are often used to locate radiation interference sources. The spatial resolution of the probe is an important parameter to evaluate its positioning accuracy. [0003] The spatial resolution of an electromagnetic field probe is considered to be the minimum spatial movement distance that can distinguish changes in the electromagnetic field distribution. At present, there are mainly two calibration methods: the first is to translate the probe horizontally (that is, perpendicular to the transmission direction) at a certain height directly above the conduction band after inputting a signal at the source...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01R35/00
CPCG01R35/005
Inventor 戴飞胡瑞韬金赟韬
Owner BEIHANG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products