Pixel definition layer and preparation method thereof, and display substrate and display device comprising same

Abstract

A pixel definition layer and a preparation method thereof and a display substrate and a display device comprising the same are provided. The invention provides a pixel definition layer which comprisesdikes defining a plurality of pixel regions. Each dike consists of a lower part of the dike adjacent to a base and an upper part of the dike on the lower part. A first inorganic material pattern layer and a lyophobic pattern layer formed by self-assembling a monomolecular layer on the first inorganic material pattern layer are stacked in turn on the upper part of each dike; and / or a second inorganic material pattern layer and a lyophilic pattern layer formed by self-assembling a monomolecular layer on the second inorganic material pattern layer are stacked in turn on the lower part of each dike. An inorganic material layer is deposited on the surface of a traditional PDL, and the formed inorganic material layer can be very thin, so that the problem of excessive thickness of inorganic material during traditional alternate film forming of different materials is solved, and the utilization rate and productivity of equipment are improved. Meanwhile, through surface modification of the pixel boundary layer by self-assembling monomolecular layers, the lyophilic / lyophobic property of the surface is improved.

Description

technical field [0001] The present invention relates to the field of display technology, and in particular, to a pixel defining layer and a method for preparing the same, as well as a display substrate and a display device including the same. Background technique [0002] In the printing process, in order to achieve the purpose of lyophilic substrate, lyophobic pixel definition layer (PDL), or the purpose of lyophilic sidewall of film-forming area and lyophobicity of non-film-forming area, there are usually strict requirements on materials, but In the current materials, after cleaning, the contact angle is generally below 90°, and generally can only reach 50°. [0003] US Patent US6476988B1 proposes to use a variety of materials with different properties to be stacked in sequence to construct the PDL, but the process is too complicated, and the preparation of each layer requires a photolithography step; and the coordination of fluorine-containing plasma is required. The lay...

AI Technical Summary

Problems solved by technology

However, due to the characteristics of the plasma, its performance is maintained for too short a time, so that it may fail when faced with a long-term manufacturing process or a high-temperature annealing process.

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