72results about How to "Uniformity controllable" patented technology

The invention relates to methods and devices for recording three-dimensional distance-measuring images of an object surface by measuring light propagation time using a short-term integrated photodetector. For starting a light-induced pulse on the transmission side, a trigger signal is produced that is at the same time used on the receiving side for opening at least one integration window for receiving back-scattered light-induced pulses with a predetermined time delay. A predetermined event such as a maximum or a zero crossing is detected which, by its interval relative to the integration windows, determines a trigger delay. The trigger delay is correlated with the light propagation time and allows calculation of the object point distance d.

The invention relates to a 2.5-dimension (2.5D) multidirectional extensible weaving method, which is characterized in that (1) a fabric adopts a 2.5D structure; (2) weaving of the fabric adopts core die simulation weaving; (3) top pavement weaving on the top of the center is finished by the conventional yarn paving and weft lining technology; and (4) after the top pavement weaving on the top of the center is finished, expansion is executed by selecting an expansion shape consistent with the top shape of the fabric according to the top shape. The 2.5D multidirectional extensible weaving method has the advantages that (1) bidirectional or multidirectional expansion of the top of the fabric can be realized, and overall forming of the fabric with a relatively complicated top shape is facilitated; (2) the fibers on the top are high in continuity; and (3) the uniformity during fabric forming is easy to control. The fabric woven by the weaving method has comprehensive performances such as high strength, high modulus, high damage tolerance, impact resistance, layering resistance and fatigue resistance; and the method can be widely applied to weaving fabrics which have sealed tops and are in various shapes in the field of stereo fabrics.

The invention provides a premixing pre-vaporization combustion chamber for a main combustible stage of a discrete pipe. The combustion chamber is in a single annulus structure, and consists of a combustion chamber outer case, a combustion chamber inner case, a flame tube outer wall, a flame tube inner wall and a combustion chamber head, wherein combusting air completely enters a flame tube from the combustion chamber head, a staged combustion scheme, namely a pre-combustible stage and the main combustible stage, is adopted; a swirl cup is adopted in the pre-combustible stage which is of a diffusion combustion organization mode; a premixing pre-vaporization device is adopted in the main combustible stage, a main combustible stage nozzle supplies fuel axially, the fuel is vaporized in the premixing pre-vaporization device and blended with air, the uniformly mixed combustible gas enters the combustion chamber to participate in combustion, namely a premixing combustion organization mode. The pre-combustible stage controls the range of stable work of the combustion chamber, and provides a stable ignition source for the main combustible stage; and the main combustible stage controls main pollution emission of the combustion chamber, and lower pollution emission of the combustion chamber is realized by controlling the equivalence ratio of premixed gas of the main combustible stage. The premixing pre-vaporization device has a simple structure, and can realize that the pollution emission of an aircraft engine combustion chamber can be reduced on the basis of not influencing the combustion stability.

The invention provides a DPF with a low-backpressure and low-initiation-temperature catalyst layer and a preparation process of the DPF. The invention discloses the DPF and the preparation process ofthe DPF, wherein the DPF is used for catching, purifying and conducting low-temperature catalytic oxidation on PM and PN particles in tail gas of diesel vehicles and has the low-backpressure catalystlayer. The preparation process includes the steps that soluble aluminum salt or aluminum oxide is added in a water-alcohol solvent system, and slurry A is obtained through high energy ball milling; soluble salt of cerium and zirconium is prepared into an ionic type mixed solution, the solution is added in the slurry A, slurry B is prepared through stirring, and high energy ultrasonic oscillation is conducted while the slurry B is aged, and a glue solution C with gel particles is formed; then, the glue solution C is dipped onto the wall face of a wall-flow type DPF gas inlet and holes in the wall through the dipping process, back flushing is conducted through gas flow finally so that the redundant glue solution C can be removed, a solution with active precious metal ions is dipped in the dried DPF with a coating layer in the form of gas mist spray, and a diesel particle catcher which can conduct low-temperature catalytic oxidation on PM and PN and has the low-backpressure characteristicis obtained through drying and roasting.

Disclosed is a manufacturing method, whereby a nonvolatile memory device having a stable memory performance can be manufactured with a simple process. The method includes: a step wherein a laminated structure is formed by alternately laminating, on a substrate (11), a plurality of conductive layers (13) containing a transition metal, and a plurality of interlayer insulating films (17) composed of an insulating material; a step wherein a contact hole, which penetrates the laminated structure and exposes parts of the respective conductive layers (13) is formed; a step wherein the conductive layer (13) parts exposed in the contact hole are oxidized, and variable-resistance layers (14) wherein resistance values reversibly change on the basis of electrical signals transmitted thereto are formed; and a step wherein a conductive material is embedded in the contact hole, and a columnar electrode (12) connected to the variable-resistance layers (14) is formed in the contact hole.

The invention provides a flexible area light source, and the area light source comprises a flexible substrate, a plurality of LED chips, and a fluorescent layer. The plurality of LED chips are arranged on the surface of the flexible substrate in an ordered manner. The fluorescent layer is a prefabricated fluorescent film which covers the surface, equipped with the LED chips, of the flexible substrate. The LED chips are packaged in the fluorescent layer. The invention also provides a method for manufacturing the area light source, and electronic equipment employing the area light source. According to the invention, the area light source provided by the invention, the area light source manufactured through the method and the electronic equipment employing the area light source are good in bending performances, and are good in light emitting effect.

The invention relates to a method and a device for attaching a polarizer. The device comprises absorption equipment, supporting equipment and power equipment, wherein the absorption equipment is used for absorbing first equipment; the supporting equipment is used for placing second equipment; an absorption plane of the absorption equipment is parallel to a supporting plane of the supporting equipment; the power equipment controls the absorption equipment and/or the supporting equipment to perform relative motion along the direction which is perpendicular to the absorption plane and the supporting plane, so the first equipment and the second equipment are attached; the first equipment is the polarizer and the second equipment is a liquid crystal display panel; and or the first equipment is the liquid crystal display panel and the second equipment is the polarizer. The method and the device for attaching the polarizer is characterized in that the uniformity of pressure applied to every area of the polarizer to be attached is easy to control, and the consistency of stress applied by the polarizer to be attached on the liquid crystal display panel in the X axis direction and the Y axis direction can be ensured.

The invention relates to a preparation method of an Fe<3>O<4>/graphene composite membrane. In summary, according to the method, by the process of mixing graphene oxide with Fe<3>O<4> nano-particles at a certain ratio to obtain a mixture solution, the Fe<3>O<4>/graphene composite membrane is prepared under drying and low-temperature stepped heating reduction conditions. The product prepared by the method is good in complex condition; the Fe<3>O<4> nano-particles are uniform to disperse; and the composite membrane has ferromagnetic property. The method disclosed by the invention is simple and easy to control; industrial production is facilitated; and the prepared self-supported composite membrane has a broad application prospect in the fields of information, electrons, energy, biology, military industry and the like.

The invention relates to a method for preparing a three-dimensional manometer load-type catalyst, comprising the following steps of: (1) covering solution with nanosphere on a substrate evenly and drying; (2) using the nanosphere as a mask plate and adopting dry etching or wet corrosion based on different etching or corroding rate with the substrate; and (3) depositing a catalyst material. The method has simple process, low cost and is easy to be promoted and used. The scale of the catalyst carrier in the three-dimensional direction is within the nanometer magnitude and the body of the carrier has larger specific surface area so that the catalyst acts on large areas, and the catalyst materials are highly dispersed, easily recycled and can be reused.

The invention relates to the cytobiology field, and discloses a neuronal cell and neuroglial cell ordered co-culture device and a preparation method and an application thereof. The device includes a substrate and a polydimethylsiloxane stamper, wherein the polydimethylsiloxane stamper can be removably compounded on the substrate; the polydimethylsiloxane stamper includes at least one micropore unit, the micropore unit includes at least one first through hole perpendicular to the substrate and at least one second through hole perpendicular to the substrate, the first through hole and the second through hole are arranged successively, and the first through hole and the second through hole respectively with the surface of the substrate form grooves having one end with an opening; the distance between the first through hole and the second through hole is 500 [mu]m-2000 [mu]m. Neuronal cells and neuroglial cells are inoculated through the first through hole and the second through hole which are perpendicular to the substrate, uniformity of the two kinds of cells is easy to control during inoculation in regions, cell quantity which can be used is increased, a population effect is obvious, and observation and study are facilitated.

The invention discloses a double-sleeve extrusion die for extruding a chalcogenide glass optical fiber preform rod and a use method. The double-sleeve extrusion die comprises an outer sleeve, an inner sleeve, a splitter and a piston, wherein the inner sleeve is positioned in the outer sleeve, an outer sleeve nozzle and an inner sleeve nozzle are arranged at the bottoms of the outer sleeve and the inner sleeve respectively, the splitter is provided with a circular plate with a plurality of through holes, the through holes include a center hole and a plurality of peripheral holes formed in the periphery of the center hole, the splitter is arranged at the bottom of the outer sleeve, the inner sleeve nozzle is inserted into the center hole in the splitter, an annular groove matched with the inner sleeve is formed in the piston, so that the piston is right arranged in annular cavity between the outer sleeve and the inner sleeve and an inner cavity of the inner sleeve. The double-sleeve extrusion die can extrude chalcogenide glass optical fiber preform rods with the specific core package proportion and a shape of a specific core clad shape.

The invention relates to the technical field of microelectronic processing and especially to a semiconductor silicon wafer corrosive liquid. The semiconductor silicon wafer corrosive liquid is formed by mixing nitric acid, hydrofluoric acid, and glacial acetic acid according to a volume ratio of 4-14: 4-14: 6-18. A semiconductor silicon wafer is placed in a closed container containing the semiconductor silicon wafer corrosive liquid in order to be corroded on a low-temperature condition. Different corrosion demands are satisfied by regulating the ratio of the nitric acid to the hydrofluoric acid. The corrosion rate and the corrosion depth of the semiconductor silicon wafer, and the surface cleanliness of the corroded semiconductor silicon wafer can be controlled on the low-temperature condition. The corrosion rate at a low-temperature environment is less than that at a normal-temperature environment, so the corrosive uniformity of the semiconductor silicon wafer is easier to control. The semiconductor silicon wafer corrosive liquid is easy to form, attainable in raw material, low in cost, and very suitable for industrial production of semiconductor microelectronics.

The invention discloses a high temperature-resistant ultrafine quartz glass fiber cotton and a preparation method thereof, and belongs to the field of quartz glass fiber cotton preparation. The preparation method comprises following steps: three to nine quartz glass rods with a diameter ranging from 1.6 to 2.0mm and silicon dioxide content of 99.95% or higher are selected; the quartz glass rods are heated to be molten using an electric heating device, and are made into quartz glass thin rods with a diameter ranging from 0.8 to 1.0mm via drawing of a primary roller at a linear speed ranging from 25 to 40mm/min; the quartz glass thin rods are heated to be molten in a primary fire head device at 1900 to 2300 DEG C, and are made into quartz glass silk with a diameter ranging from 50 to 80<mu>m via drawing of a secondary roller at a linear speed ranging from 6000 to 16000mm/min; and the quartz glass silk is made into the quartz glass fiber cotton with a diameter ranging from 1 to 3<mu>m via blowing in a secondary fire head device at 1900 to 2300 DEG C at a jet stream speed ranging from 200 to 400m/s. The high temperature-resistant ultrafine quartz glass fiber cotton is capable of resisting super high temperature as high as 1100 DEG C; signal silk diameter is low; diameter uniformity is better; and product quality is high.

The invention relates to a wafer suitable for a nanometer technology and a method for manufacturing the same. The manufacturing method comprises the following steps: a first annealing step, a first deposition step, an implantation step and a second annealing step. According to the first annealing step, annealing processing is carried out on a wafer at the temperature of over 650 DEG C so as to form a high-quality silicon layer on the surface of the wafer. According to the first deposition step, a silicon-germanium gas source is utilized to deposit a silicon-germanium deposition layer on the high-quality silicon layer of the wafer after the annealing processing. According to the implantation step, oxygen ions are implanted into the wafer. And according to the second annealing step, annealing processing is carried out on the wafer with implantation of the oxygen ions at the temperature of over 650 DEG C so as to form a silicon oxide layer. Therefore, it is easy to control uniformity and surface flatness of all material layers of the manufactured wafer and thus a wafer with nonuniform mass and low price can be manufactured into a wafer with uniform mass, so that the nanometer technology can be utilized conveniently.

The invention discloses a method for manufacturing a solid mandrel of an insulator. According to the method, a basic bar is manufactured by drawing an epoxy resin composite material by a pultrusion process; the basic bar is used as a base body, and one or more epoxy resin composite material pultrusion diameter-expansion processes are adopted. The diameter of the basic bar is between 70 and 90 millimeters; and in each epoxy resin composite material pultrusion, the diameter expansion amount of the basic bar is that: the cross section is expanded to be no more than 5,000 square millimeters. The epoxy resin composite material is a continuous glass fiber bundle dipped in epoxy resin glue solution. The method for manufacturing the solid mandrel of the insulator uses the basic bar as the base body and adopts one or more epoxy resin composite material pultrusion diameter-expansion process. The equipment and the process for manufacturing the basic bar can be adopted in the diameter expansion process, so the method has the advantages of simple process, easily controlled uniformity and equipment investment saving. The pultrusion diameter-expansion process also ensures that the mandrel has uniformly distributed glass fiber bundle and better mechanical performance.

The invention relates to a short-flow efficient production process of a double-metal composite belt material. The short-flow efficient production process of the double-metal composite belt material comprises the following steps: preparing a high-quality double-metal composite plate blanket with a metallurgical bonding interface by a continuous casting composite process and putting the high-qualitydouble-metal composite plate blanket into a heating furnace to heat; performing multi-pass rolling on the heated plate blanket by a rolling machine, wherein the pass reduction rate of the first passis controlled to be 50 to 70 percent, the pass reduction rate of the subsequent passes is controlled to be 25 to 45 percetn and the total rolling deformation quantity is controlled to be 85 to 95 percent; performing warm rolling forming, wherein the rolling process avoids lubrication; after performing acid-washing treatment, performing rolling forming on a cold-rolling machine, wherein the pass reduction rate is controlled to be 15 to 30 percent, the total rolling deformation quantity is controlled to be less than 90 percent and the rolling speed is 1 to 25 m/min; and performing rapid sensingheating continuous heat treatment on the composite belt material after cold rolling to obtain the double-metal composite belt material. The plate material prepared by the method is short in process flow, high in production efficiency and favorable for realizing large-scale production.

The invention discloses a method and device for manufacturing a barrier film layer. The method includes the steps that a ceramic material doped with metal is provided as a target, wherein the characteristics of metallic elements and metallic compounds are the same as those of the barrier film layer; the target is arranged in a reaction cavity; a substrate to be plated with a film is arranged in the reaction cavity; reactant gas and sputtering gas are introduced into the reaction cavity; a direct-current power source is adopted for providing the working voltage for the target; and when the direct-current power source is turned on, the barrier film layer is deposited on the substrate in a reaction sputtering manner. By the adoption of the method, the direct-current power source can be adopted for manufacturing the non-metallic ion barrier film layer, the method can be applied to actual production, the film layer manufactured through the method is large in area, the temperature is low, the deposition speed of the film layer is adjustable, and the evenness of the film layer is controllable.