Method and device for manufacturing barrier film layer
A barrier film and equipment technology, applied in the field of solar cells, can solve the problems of difficult uniform preparation of non-metallic films in a large area, slow deposition rate, difficult control of film uniformity, etc., to achieve adjustable film deposition rate, film The effect of large layer area and controllable uniformity of the film layer
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[0039] The invention provides a method for preparing a barrier film layer, and the method is mainly applied in the preparation process of thin-film solar cells. Since thin film solar cells generally grow different thin film layers on a substrate, and the substrate may contain sodium, iron, and oxygen plasma, these ions may diffuse into the film in the subsequent film preparation process. Therefore, this method It can be applied to the process of preparing the barrier film layer on the substrate.
[0040] In the thin-film solar cell manufacturing process, sputtering or chemical vapor deposition can be used to prepare thin-film films, for example, direct-current sputtering can be used to prepare metal films. However, the DC sputtering method requires the target to be able to transfer the positive charge obtained from the ion bombardment process to the cathode in close contact with it. Therefore, this method can only sputter conductive materials and is not suitable for insulating ma...
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