94results about How to "Precise Control of Uniformity" patented technology

The invention discloses a carbon/carbon composite material laminated coating and a preparation method thereof. The laminated coating is sequentially composed of a SiC under layer, a SiC transition layer and an alternative layer of SiC layer/ceramic layer on a base body of the carbon/carbon composite material. According to the preparation method of the carbon/carbon composite material laminated coating, a preparation method of the SiC under layer is realized by brush coating, spray coating or magnetron sputtering. A preparation method of the SiC transition layer and the alternative layer of SiC layer/ceramic layer sequentially comprises the following steps: ultrasonically cleaning the carbon/carbon composite material with the SiC under layer through acetone, and drying the material; cleaning the material through ion source sputtering; and preparing the SiC transition layer and the alternative layer of SiC layer/ceramic layer through magnetron sputtering. The prepared laminated coating disclosed by the invention has excellent oxidation resistance and thermal shock resistance at 1500 DEG C. The preparation method disclosed by the invention has a characteristic of being able to control thickness, and the prepared coating is good in thickness uniformity.

The invention discloses a non-contact screen printing method and non-contact screen printing equipment. The non-contact screen printing equipment comprises: a printing table of which the table top can be used for placing a printed object; a screen printing plate which is arranged between the printing table and a printing scraper and is used for printing ink on the printed object through the screen printing plate; and a printing head mechanism used for synchronously driving at least one printing scraper to move through the up and down movement of at least one driving device and pressing the printing scraper against the screen printing plate under the action of a constant pressure. The printing scraper prints at a constant pressure under the condition that the screen printing plate does not contact the printed object; and to a fragile, light and thin printed object such as a silicon chip, the method and the device can accurately control the thickness and uniformity of the printing ink so as to improve the printing stability and realize accurate printing.

The invention discloses a novel automatic flat-plate film-coating machine, which includes a pedestal, a film-coating bench, a film-coating plate, a film-coating plate adjustment device, a scraper unit and a driving unit. The scraper unit includes: a scraper, a scraper adjustment device and a scraper support, wherein the driving unit is connected to the scraper unit for controlling the operation of the scraper. The film-coating plate adjustment device is used for adjust the height and the level of the film-coating plate. The scraper adjustment device is used for adjust the height and the level of the scraper. The thickness and uniformity of a film are accurately controlled by means of cooperative effects of the film-coating plate adjustment device and the scraper adjustment device. By means of a rotary lifting device, the scraper rotates around a shaft, so that the scraper is convenient to clean after film coating. The novel automatic flat-plate film-coating machine can not only coat glass with a film but also coat a film on the base materials such as nonwoven cloths according to requirement. The machine is uniform in film thickness, is good in repeatability, is simple in processes and is convenient to use.

The present invention discloses a Pt Ni Al bonding layer doped with binary trace active elements and capable of being completely oxidation resisting at 1200 DEG C and a preparation method thereof and belongs to the field of novel thermal barrier coatings and the preparation technologies. According to the invention, firstly, a Pt layer with the thickness of 5-10 microns is prepared on a nickel base monocrystal high temperature alloy matrix through the plating or the electron beam physical vapor deposition method, and then a NiAlHfZr coating with the thickness of 20-60 microns is deposited on the Pt layer through the electron beam physical vapor deposition method. The Pt layer reduces the interfacial holes and effectively improves the adhesion of an oxidation film; binary doping of Hf, Zr enables the NiAl coating surface to be smoother and denser and enables the oxidation film generated during the oxidation process on the coating surface to be straighter, especially with little oxidation increase, and greatly improves the oxidation resistance of the coating. The Pt Ni Al bonding layer is completely oxidation resisting at 1200 DEG C. The service life of the coating is prolonged to certain degree through doping of binary elements namely Hf and Zr and Pt modification.

The invention discloses a double-sleeve extrusion die for extruding a chalcogenide glass optical fiber preform rod and a use method. The double-sleeve extrusion die comprises an outer sleeve, an inner sleeve, a splitter and a piston, wherein the inner sleeve is positioned in the outer sleeve, an outer sleeve nozzle and an inner sleeve nozzle are arranged at the bottoms of the outer sleeve and the inner sleeve respectively, the splitter is provided with a circular plate with a plurality of through holes, the through holes include a center hole and a plurality of peripheral holes formed in the periphery of the center hole, the splitter is arranged at the bottom of the outer sleeve, the inner sleeve nozzle is inserted into the center hole in the splitter, an annular groove matched with the inner sleeve is formed in the piston, so that the piston is right arranged in annular cavity between the outer sleeve and the inner sleeve and an inner cavity of the inner sleeve. The double-sleeve extrusion die can extrude chalcogenide glass optical fiber preform rods with the specific core package proportion and a shape of a specific core clad shape.

The invention provides a preparation method of a novel glass-based porous aluminum oxide substrate. The preparation method comprises the following steps of: firstly, preparing a high purity aluminum film by using glass as a substrate and adopting a vacuum thermal evaporation method; secondly, generating a porous aluminum oxide layer by using a primary anode oxidation method or a secondary anode oxidation method; thirdly, optimizing pore diameters of the porous aluminum oxide layer by using a pore expanding process; and fourthly, improving the transmission of the whole glass-based porous aluminum oxide substrate by using high temperature annealing treatment. The glass-based porous aluminum oxide substrate has favorable mechanical strength, ordered aluminum oxide pore heights and high transmission of visible light.

The invention discloses a high-strength hot galvanized binding ribbon which consists of the following components in percentage by weight: 0.25-0.35% of C, 0.80-1.60% of Mn, not more than 0.010% of Si, less than or equal to 0.010% of P, less than or equal to 0.010% of S, 0.030-0.050% of Ti and 0.030-0.060% of Al. The high-strength hot galvanized binding ribbon is produced by the following steps: smelting, performing continuous casting to form ingots, and heating the ingots; roughing; finish-rolling; rolling; performing conventional electrolytic degreasing; performing cold rolling; and preparing the ribbon. The thickness of the high-strength hot galvanized binding ribbon is 0.60mm, the tensile strength is not less than 980MPa, the elongation is not less than 10%, the repeated bending frequency is not less than 10 (R=5mm), a layered brittle failure phenomenon is avoided, the thickness and uniformity of a zinc layer can be exactly controlled on the premise that the hot galvanized binding ribbon is not obviously rusted when placed in an indoor atmospheric environment for 180 days, and the mechanical property can be adjusted in the hot plating process. Subsequent procedures such as passivation and oil coating are eliminated, so that the process is shortened, and energy consumption is reduced.

The invention discloses an ultraviolet radiation electric calibration pyroelectric detector, which comprises a chip hanging up and encapsulated in a metallic tube case. The chip consists of a pyroelectric wafer; a metallic upper electrode layer, a polyimide insulation shielding layer, a multi-wall carbon nano-tube film capable of not only absorbing ultraviolet radiation but also being heated through conduction, which are deposited on the upper surface of the pyroelectric wafer in turn; and a signal electrode layer which is deposited on the lower surface of the pyroelectric wafer. The ultraviolet radiation electric calibration pyroelectric detector has the greatest advantage of adopting the multi-wall carbon nano-tube as an ultraviolet conduction and absorption film. Compared with the prior art adopting a black gold conduction and absorption film, the ultraviolet radiation electric calibration pyroelectric detector can absorb the ultraviolet radiation with higher efficiency and better heat conducting property, strengthen the photoelectric equivalence, and reduce calibration errors with stable performance of the multi-wall carbon nano-tube film. The ultraviolet radiation electric calibration pyroelectric detector adopts the insulation shielding layer made of polyimide, thereby bringing about compatibility with the micro-electronic technique, accurate control on the thickness and evenness of the film, and good heat stability.

Disclosed are a manufacturing method for a structure of extremely thin silicon on an insulator (ETSOI) and a manufacturing method for a semiconductor device. The manufacturing method for the semiconductor device includes: providing silicon on insulator (SOI); forming a hard-mask layer on a top-silicon layer and carrying out a patterning processing on the hard-mask layer; and measuring real thicknesses of exposed areas of the top-silicon layer; injecting doping ions into the exposed areas of the top-silicon layer with an injection quantity related to corresponding real thicknesses of the injected areas; carrying out an etching processing, and removing part of the exposed areas of the top-silicon layer and forming trenches; forming side walls on flanks of the trenches and forming gate structures on areas defined by the flanks; carrying out a planarization processing so that upper surfaces of the gate structures are flush with an upper surface of the hard-mask layer; removing the hard-mask layer; and injecting ions into the exposed areas of the top-silicon layer and forming elevated source/drain areas. The manufacturing method for the structure of the extremely thin SOI and the manufacturing method for the semiconductor device enable the thicknesses and uniformity of the areas of the top-silicon layer on the extremely thin SOI structure to be controlled precisely so that damages on the top-silicon layer are prevented.

The invention discloses a method for preparing a CZTS thin film solar cell using a group IIIA element doped cadmium sulfide film. The method comprises the steps of: cleaning a substrate; depositing metal molybdenum as a back electrode on the cleaned substrate; depositing a CZTS precursor film on the back electrode; annealing the CZTS precursor film to obtain a CZTS absorbing layer film; depositinga CdS film on the CZTS absorbing layer film, and doping the CdS film with a group IIIA element by ion implantation; and annealing the sample doped with CdS, then depositing a window layer on the doped CdS; preparing a top electrode on the window layer to obtain the CZTS thin film solar cell. Doping the Group IIIA element can improve the photoelectric performance of CdS, increase the width of a depletion region, and ensure high long-wave collection efficiency and photoelectric conversion efficiency. The ion implantation method can precisely control the concentration and depth distribution of the implanted ions, and the implanted layer does not peel off.

The invention in particular relates to a ceramic powder feeding device arranged on a ceramic wall ground tile production facility and a feeding method thereof. The ceramic powder feeding device comprises a storage hopper, a feeding screen plate, a rotary hair brush, a rotary device, ceramic powder, a load-bearing body and a middle screen plate open pore area, wherein the feeding screen plate is arranged in the storage hopper, feeding patterns are manufactured on the feeding screen plate, the middle screen plate open pore area of the feeding screen plate is a screen plate feeding area, the rotary hair brush is arranged in the storage hopper, the distance between the rotary hair brush and the feeding screen plate is adjustable, and the rotary device is arranged on the rotary hair brush. The ceramic powder feeding device can precisely control the feeding quantity, the feeding speed, the feeding evenness and the feeding patterns through the hair brush and related parts.

The invention relates to a micro-filtration membrane and a method for modifying the same, and belongs to the technical field of membrane modification. By the aid of the micro-filtration membrane and the method, the problem of difficulty in releasing enriched cells by micro-filtration membranes in the prior art can be solved. The micro-filtration membrane is modified by temperature-sensitive water-soluble polymer solution. The method for modifying the micro-filtration membrane includes (1), preparing the temperature-sensitive water-soluble polymer solution with the volume percent concentrationof 0.1%-6%; (2), coating the temperature-sensitive water-soluble polymer solution on the micro-filtration membrane to modify the micro-filtration membrane and drying the micro-filtration membrane coated with the temperature-sensitive water-soluble polymer solution to obtain a modified micro-filtration membrane. The micro-filtration membrane and the method have the advantages that membrane filtration technologies can be widely applied to the field of medical treatment, and accurate detection results can be obtained.

The invention relates to a method for preparation of inorganic powder with antioxidation susceptibility in the form of cladding. The method for preparation of composite powder of zirconium diboride in the form of cladding is characterized in that it contains the following steps: 1) mixing and stirring equably the mixture of the powder of zirconium diboride and the water with a proportion of 1 gram: 50-1000 milliliters to get the miscible liquid; 2) adding 1-100 kinds of saline solution in a same proportion as the former step, at the same time, adding precipitating reagents of PH value of 8-12 with the quantity added which can keep the PH value of the miscible liquid at 7-11.5 into the miscible liquid, obtaining composite powder of zirconium diboride in the form of cladding which is precursor of the cladding; and the said precipitating reagents is the materials generated by hydroxide ion of the water solution; 3) obtaining the products by washing, drying at 80-150 DEG C and calcining at 300-700 DEG C the composite powder. The invention is characterized in that it is of simple and convenient operation, easy control, low energy consumption, and good antioxidation susceptibility of the obtained composite powder of zirconium diboride in the form of cladding at the high temperature.

The invention provides a method for preparing a white-light LED package device with a high color rendering index. The white-light LED package device with the high color rendering index is prepared by atomizing and spraying fluorescent powders on a flip LED chip. By adopting the method provided by the invention, the color rendering index of the white-light LED package device can be effectively improved, and the color rendering index of the LED package device prepared from the same chip, silica gel and fluorescent powders can be improved to about 1 to 5; a problem that the white-light LED device has a relatively lower color rendering index is greatly solved, and the method is more suitable for the development tendency of the white-light LED device with the high color rendering index.

The invention discloses a manufacturing method of a printed circuit board (PCB) coil. The manufacturing method is characterized by comprising the following steps that (1) wiring design is conducted on the PCB coil by using electronic design automation (EDA) software; (2) a single-layer double-faced PCB is arranged; (3) a plurality of via holes are formed in the PCB of the step (2), and the inner sides and the outer sides of the via holes are distributed orderly in a double-row mode; (4) according to the wiring design of the step (1), etching wiring is conducted on the upper surface and the lower surface of the PCB of the step (2); (5) conductive materials are filled in the via holes of the step (3), the double-faced PCB is electrically connected through the via holes through electroless copper plating so that upper copper wires and lower copper wires are electrically connected; (6) protective layer rosin water is coated on the surfaces of wires arranged in the step (4), after the rosin water is condensed, the PCB coil is obtained. The invention further discloses the PCB coil prepared through the method.

The invention relates to a lubricant spraying system for a gasket. The lubricant spraying system for the gasket comprises a gasket platform used for placing the gasket to be sprayed, a spraying nozzle capable of obliquely moving to the inner side of the gasket, and a friction wheel capable of being arranged at one side of the gasket platform in a rotary mode, wherein at least two rotation rollers are symmetrically arranged on the gasket platform, and the gasket is in contacting connection with the rotation rollers and the friction wheel and rotates under the driving of rolling frictional force of the friction wheel. The lubricant spraying system for the gasket is capable of automatically spraying lubricant to the inner side of the gasket, accurately controls the dosage and uniformity of the lubricant on each gasket, and improves the lubricating quality of the gasket.

The invention relates to a preparation method of a visible light catalyst Cu2O/C3N4/TiO2 heterojunction visible light catalyst, comprising the following steps of: sputtering a layer of Cu on the surface of FTO glass, obtaining a Cu (OH) 2 nano array by an electroplating oxidation method, and carrying out annealing treatment to obtain a Cu2O nano array; compounding C3N4 and Cu2O nano arrays througha centrifugal compounding method; and finally, sputtering a layer of TiO2 to form a multi-stage heterojunction, so that separation and transmission of interlayer electron holes are promoted, and thecatalytic performance of the photocatalyst and the stability of an electrode material are further improved.

The invention discloses a method for manufacturing a hot galvanized plate with a high-conductivity surface. The method comprises the following procedures of performing degreasing cleaning on the surface; performing continuous annealing of an annealing furnace; putting the plate into a zinc pot and performing hot-dipping galvanization on the plate; performing finishing, and drawing and straightening, and performing surface coating treatment. In the finishing, and drawing and straightening procedure, a working roller of a finishing machine works under the capacitance mode to perform roughening, and the roller face roughness of the working roller is controlled between 2.0 micrometers and 2.5 micrometers. According to the method for manufacturing the hot galvanized plate with the high-conductivity surface, a galvanized steel strip is treated, the surface treatment process of the galvanized plate is improved, and therefore the hot galvanized plate with the extremely-low surface resistance, high conductivity and extremely-low non-conduction rate is obtained. Data safety of a data warehouse can be ensured, and the use requirement of a customer is met.