Preparation method of high transmission glass-based porous aluminum oxide substrate

Abstract

The invention provides a preparation method of a novel glass-based porous aluminum oxide substrate. The preparation method comprises the following steps of: firstly, preparing a high purity aluminum film by using glass as a substrate and adopting a vacuum thermal evaporation method; secondly, generating a porous aluminum oxide layer by using a primary anode oxidation method or a secondary anode oxidation method; thirdly, optimizing pore diameters of the porous aluminum oxide layer by using a pore expanding process; and fourthly, improving the transmission of the whole glass-based porous aluminum oxide substrate by using high temperature annealing treatment. The glass-based porous aluminum oxide substrate has favorable mechanical strength, ordered aluminum oxide pore heights and high transmission of visible light.

Description

technical field [0001] The invention relates to a method for preparing a glass-based porous alumina substrate, in particular to a vacuum thermal evaporation method for plating high-purity aluminum on a glass substrate, using this as an anode, and adopting an anodic oxidation method to prepare (assemble) with reliable performance. A method for preparing a glass-based porous alumina substrate with controlled, uniform pore size and distribution, good stability, and high visible light transmittance. Background technique [0002] Nanotechnology and nanomaterials have begun to enter industrial applications and people's daily life from the laboratory. The development of nanomaterials and nanodevices is also one of the hottest scientific research frontiers today. Porous alumina is used as a preparation for nanowires, nanorods, The preferred template for nanowire arrays has also attracted the attention of many researchers in China. [0003] However, ordinary alumina templates are ba...

AI Technical Summary

Problems solved by technology

[0003] However, ordinary alumina templates are based on aluminum or are peeled off from the substrate. Due to the limitation of the material itself, the strength is not high and it is easy to break, especially for applications such as optics, optoelectronics, solar energy, optical waveguide sensors, and photoluminescence. In the field, the porous alumina layer needs to be peeled off and adhered to other substrates, which not only increases the complexity of the process, but also introduces other problems when the film is not well bonded to the substrate or the adhesive is not selected properly.

In order to obtain a film layer with a high degree of hole order, it is also possible to use glass coated with a transparent conductive film as the substrate, and then plate aluminum on this basis to prepare a porous alumina layer by anodic oxidation, which solves the problem to a certain extent. This problem is solved, but the transmittance of the transparent conductive film itself is low, which also limits the improvement of the optical performance of the entire device.

There is also a method of using semiconductor single crystal or polycrystalline silicon material as a template. This method does not need to be plated with a transparent conductive film, but the cost of the base material is relatively high, which is not conducive to industrial application and cost reduction.

Magnetron sputtering is more commonly used to coat aluminum films on substrate materials. This method is conducive to the preparation of large-area aluminum films, but its uniformity and thickness are not easy to control. In applications that require precise control of the thickness of porous aluminum oxide films fields, such as optics, are limited by the

Images