Improved method for evaluating error suppression capability of CCOS polishing removal function

A technology for suppressing ability and function error, which is applied in the field of improved evaluation of CCOS polishing to remove function error suppressing ability, to achieve accurate calculation results, concise mathematical model, and reduce the amount of calculation

Inactive Publication Date: 2019-07-26
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

For low-frequency errors, it is easier to eliminate by controlling the dwell time of the local area, but for small-scale medium and high-frequency errors, it is difficult to eliminate by the above method

Method used

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  • Improved method for evaluating error suppression capability of CCOS polishing removal function
  • Improved method for evaluating error suppression capability of CCOS polishing removal function
  • Improved method for evaluating error suppression capability of CCOS polishing removal function

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Embodiment Construction

[0033] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0034] figure 1 A flow chart showing an improved method for evaluating the error suppression capability of CCOS polishing removal function error in the present invention; in this embodiment, a viscoelastic polishing disc (rigid conformal tool) is used for polishing, with a diameter of 110 mm. The optical element to be polished is a flat glass-ceramic with a diameter of φ=620mm that has been traditionally polished. The surface shape detection equipment is a 24-inch Zygo interferometer with a detection wavelength of λ=632.8nm. Applying the method of the invention to calculate the error suppression ability of the viscoelastic disc polishing.

[0035] The method steps of the improved evaluation CCOS polishing removal functio...

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Abstract

The invention relates to an improved method for evaluating the error suppression capability of a CCOS polishing removal function. The method comprises the following steps: S1, utilizing power spectraldensity function PSDj-1 and PSDj of surface shape data of optical element after j-1-time polishing and jth-time polishing to construct a mathematical model of a smooth spectrum function H which is Fourier transform after normalization of a removal function; S2, performing mathematical transformation of item shifting and root removing on the smooth spectrum function H to obtain a relational expression (2): (1-H) 2 = PSDj / PSDj-1; S3, carrying out m multiplication operations on the relational expression (2), and constructing an improved mathematical model HOPT (m) for evaluating the error suppression capability of the polishing process; and S4, carrying out average value calculation on the error suppression capability calculation model of multiple times of polishing, and constructing an HTIF_OPT model of the removal function in the computer control surface forming polishing for different frequency bands under the determined polishing condition. According to the method, the calculation amount can be reduced when the error inhibition capability of the polishing process and the removal function is calculated in multiple times of polishing, so that the final calculation result is more accurate.

Description

technical field [0001] The invention belongs to the field of advanced optical manufacturing, and in particular relates to an improved method for evaluating the error suppression ability of CCOS polishing removal function. Background technique [0002] In strong laser and high-precision optical systems, the impact of manufacturing errors in different frequency bands on the performance of optical components has attracted more and more attention. Low-frequency errors distort the image of the imaging system and introduce various aberrations; intermediate-frequency errors cause light to scatter at small angles. , so that the imaging produces flare, which affects the contrast of the image; high-frequency errors cause light to scatter at a large angle and reduce the reflectivity of the mirror; therefore, it is very important to control these surface manufacturing errors in frequency bands. For low-frequency errors, it is relatively easy to eliminate by controlling the dwell time of...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F17/50B24B49/00
CPCB24B49/00G06F30/20
Inventor 王佳王朝阳万勇建侯溪张云胡跃
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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