A kind of high entropy amorphous thin film and preparation method and application
An amorphous film, high-entropy technology, applied in metal material coating process, vacuum evaporation plating, coating and other directions, can solve the problems of rising maintenance costs, high maintenance costs, acid corrosion resistance, etc., to achieve improved fatigue life, The effect of improved elastic modulus and good corrosion resistance
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Embodiment 1
[0032] The preparation method of the high-entropy amorphous film of the present embodiment is as follows:
[0033] (1) Target material preparation: use high-purity CoCrFeMnNi alloy with a purity of 99.99%, heat preservation at 1000°C, and homogenization treatment for 2 hours as the target material;
[0034](2) Substrate preparation: After polishing the 304 stainless steel substrate, ultrasonically clean it in acetone, alcohol and deionized water for 15 minutes to remove impurities and dirt on the surface, fix the substrate on a circular baffle and send it into the sample chamber, and vacuumize it. Vacuum degree≤5×10 -5 Pa;
[0035] (3) Pre-sputtering: in the sputtering chamber with a power of 100W and a vacuum degree of ≤2.5×10 -6 Pa, argon flow rate 20sccm, and working pressure 0.4Pa, pre-sputter for 30 minutes to clean the impurities and oxides on the surface of the target. During the pre-sputtering process, observe the color of the plasma through the eyepiece, and the col...
Embodiment 2
[0043] The preparation method of the high-entropy amorphous film of the present embodiment is as follows:
[0044] (1) Target material preparation: use high-purity CoCrFeMnNi alloy with a purity of 99.99%, heat preservation at 1000°C, and homogenization treatment for 2 hours as the target material;
[0045] (2) Substrate preparation: After polishing the 304 stainless steel substrate, ultrasonically clean it in acetone, alcohol and deionized water for 15 minutes to remove impurities and dirt on the surface, fix the substrate on a circular baffle and send it into the sample chamber, and vacuumize it. Vacuum degree≤5×10 -5 Pa;
[0046] (3) Pre-sputtering: in the sputtering chamber with a power of 100W and a vacuum degree of ≤2.5×10 -6 Pa, argon flow rate 20sccm, and working pressure 0.4Pa, pre-sputter for 30 minutes to clean the impurities and oxides on the surface of the target. During the pre-sputtering process, observe the color of the plasma through the eyepiece, and the co...
Embodiment 3
[0054] The preparation method of the high-entropy amorphous film of the present embodiment is as follows:
[0055] (1) Target material preparation: use high-purity CoCrFeMnNi alloy with a purity of 99.99%, heat preservation at 1000°C, and homogenization treatment for 2 hours as the target material;
[0056] (2) Substrate preparation: After polishing the 304 stainless steel substrate, ultrasonically clean it in acetone, alcohol and deionized water for 15 minutes to remove impurities and dirt on the surface, fix the substrate on a circular baffle and send it into the sample chamber, and vacuumize it. Vacuum degree≤5×10 -5 Pa;
[0057] (3) Pre-sputtering: in the sputtering chamber with a power of 100W and a vacuum degree of ≤2.5×10 -6 Pa, argon flow rate 20sccm, and working pressure 0.4Pa, pre-sputter for 30 minutes to clean the impurities and oxides on the surface of the target. During the pre-sputtering process, observe the color of the plasma through the eyepiece, and the co...
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Abstract
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