Ultrasonic rinsing device for secondary silicon material

Abstract

The invention discloses an ultrasonic rinsing device for secondary silicon material which is convenient for realizing automatic cleaning of silicon material and improving cleaning efficiency. The ultrasonic rinsing device for secondary silicon material includes a base, a shell, and a rotating body; the shell is installed on the base, and the shell has an annular cavity with one side open, and the center of the annular cavity is set There is a central column with a hollow structure; one side of the housing is provided with a cover plate of a closed annular cavity; the outer surface of the bottom of the housing is provided with an ultrasonic generator; the bottom of the annular cavity is provided with a liquid outlet mouth; the top of the annular cavity is provided with a spray head; both sides of the upper end of the annular cavity are provided with driving racks; the back of the housing is provided with a driving motor that drives the racks to rotate; A circulating booster pump connected to the liquid outlet and the nozzle is provided; the ultrasonic rinsing device using the secondary silicon material can simplify the cleaning operation and improve the cleaning efficiency.

Description

technical field [0001] The invention relates to recycling of waste silicon materials, in particular to an ultrasonic rinsing device for secondary silicon materials. Background technique [0002] It is well known that when the waste silicon material is recycled, the impurities on the silicon material must be removed. Therefore, in the process of recycling waste silicon materials, it needs to go through multiple processes. In the prior art, methods such as sand blasting, foam flotation, centrifugal separation, and high-temperature fusion filtration have been used to remove impurities such as silicon carbide, silicon nitride, or graphite in silicon materials, but these methods have high operating costs and are not easy to carry out mass production , and because the processed silicon material is not thorough enough to remove impurities, it is generally difficult to directly reuse it as a raw material for polysilicon ingots, thus causing great waste. [0003] Existing silicon m...

AI Technical Summary

Problems solved by technology

In the prior art, methods such as sand blasting, foam flotation, centrifugal separation, and high-temperature fusion filtration have been used to remove impurities such as silicon carbide, silicon nitride, or graphite in silicon materials, but these methods have high operating costs and are not easy to carry out mass production , and because the impurity removal of the processed silicon material is not thorough enough, it is generally difficult to directly reuse it as a raw material for polysilicon ingots, thus causing great waste

[0003] The existing silicon material cleaning device generally uses a cleaning tank to realize alkali cleaning, pickling and ultrasonic cleaning of the silicon material. During the cleaning process, the loading and unloading work is cumbersome, so the cleaning efficiency is low

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