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Translucent mask

A semi-transparent and mask technology, which is applied in the photoplate making process of optics and pattern surface, and the original for optical mechanical processing, etc., can solve the problems of high cost and complicated preparation process.

Active Publication Date: 2020-10-27
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
  • Description
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AI Technical Summary

Problems solved by technology

[0005] The invention provides a semi-transparent mask to alleviate the problems of complex preparation process and high cost in the existing semi-transparent mask

Method used

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  • Translucent mask
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Embodiment Construction

[0043] The technical solutions in the embodiments and / or examples of the present invention will be clearly and completely described below in conjunction with specific embodiments of the present invention. Obviously, the embodiments and / or examples described below are only part of the implementation of the present invention. schemes and / or examples, rather than all implementations and / or examples. Based on the implementations and / or examples in the present invention, all other implementations and / or examples obtained by persons of ordinary skill in the art without creative work fall within the protection scope of the present invention.

[0044] The directional terms mentioned in the present invention, such as [top], [bottom], [left], [right], [front], [back], [inside], [outside], [side], etc., are only for reference The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the pre...

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Abstract

The invention provides a semi-transparent mask plate. The semi-transparent mask plate comprises a transparent region, a shading region and a semi-transparent region; a spectrum modulation layer is arranged on a substrate located in the semi-transparent region; and the spectrum modulation layer is doped with a specific rare-earth complex and can be used for converting light located in a first wavelength range in exposure irradiation light into light which cannot excite photoresist to generate a polymerization reaction and is located in a second wavelength range. Therefore, the attenuation of exposure irradiation energy of the semi-transparent region is realized; the semi-transparent effect is achieved; and by adjusting influence factors such as the type of the rare-earth complex, the dopingdensity, the thickness of the spectrum modulation layer and the like, different light wave conversion rates are achieved, thereby realizing the control of the thicknesses of different photoresist layers. The semi-transparent mask plate provided by the invention is accurate and controllable in semi-mask effect, simple in process and low in cost; and the problems of complex preparation process andhigh cost of an existing semi-transparent mask plate are relieved.

Description

technical field [0001] The invention relates to the field of display preparation, in particular to a semi-transparent mask plate. Background technique [0002] The semi-transparent mask has the characteristics of being opaque, fully transparent, and semi-transparent, which can reduce the number of exposure and development times in the patterning process and simplify the preparation process. It has been widely used in the field of display device preparation. [0003] However, due to the existence of the semi-transparent area, especially the climbing area at the junction of the semi-transparent area and the opaque area, the design and manufacturing process of the semi-transparent mask is difficult and the production cost is high. [0004] Therefore, the existing semi-transparent mask has the problems of complex preparation process and high cost, which need to be solved. Contents of the invention [0005] The invention provides a semi-transparent mask to alleviate the proble...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/00
CPCG03F1/00
Inventor 高攀
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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