A gated bipolar-field effect compound element semiconductor-based vdmos
A semiconductor and field-effect technology, applied in the field of vertical double-diffused metal-oxide-semiconductor transistors
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[0026] Such as figure 1 As shown, the gate-controlled bipolar-field-effect compound element semiconductor-based vertical double-diffused metal-oxide-semiconductor transistor includes:
[0027] Elemental semiconductor substrate 1, the doping concentration is the concentration of general elemental semiconductor single crystal material, the typical value is 1×10 13 cm -3 ~1×10 15 cm -3 ;
[0028] The drift region 2 is epitaxially formed on the substrate, and the doping concentration of the drift region is 3×10 15 cm -3 ;
[0029] a gate insulating layer formed on the surface of the drift region, and forming a gate 7 above the gate insulating layer;
[0030] A heavily doped region 3 and a base region 4 are formed on the drift region; wherein, the doping concentration of the base region is 5×10 16 cm -3 , the doping concentration in the heavily doped region is 1×10 16 cm -3 ;
[0031] forming a source region 5 on the base region and simultaneously forming a channel on s...
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