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Automatic cleaning device of coating platform

An automatic cleaning and platform technology, which is applied to the cleaning method, cleaning method and utensils using gas flow, and the use of sound waves/ultrasonic waves/infrasonic waves to analyze solids, etc., which can solve the problem of unclean cleaning at one time, low success rate, inconvenient cleaning of foreign objects, etc. problems, to achieve the effect of easy cleaning, convenient operation and time saving

Inactive Publication Date: 2019-09-24
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] This application relates to an automatic cleaning device for a coating platform, which is used to solve the problems in the prior art that foreign matter on the coating machine platform is not easy to clean, and the cleaning is not clean at one time and the success rate is not high during the coating process in the prior art

Method used

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  • Automatic cleaning device of coating platform
  • Automatic cleaning device of coating platform
  • Automatic cleaning device of coating platform

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Embodiment Construction

[0044] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, but not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the protection scope of the present application.

[0045] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", " rear, left, right, vertical, horizontal, top, bottom, inside, outside, clockwise, counterclockwise, etc., or The positional relationship is based on the orientation or positional relationship shown in the accompanying drawings, which is only for the convenience ...

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Abstract

The invention provides an automatic cleaning device of a coating platform. The cleaning device comprises a cleaning cavity, a motor, an ultrasonic detection device, a servo motor and a control system, wherein the cleaning cavity comprises a vacuum cavity and a pressure cavity which are arranged in the automatic cleaning device of the coating platform; the motor is arranged on the pressure cavity and used for driving the pressure cavity to form airflow; the ultrasonic detection device is arranged in the cleaning cavity and used for transmitting ultrasonic signals to the coating machine platform and detecting whether particulate matters exist on the coating machine platform; the servo motor is arranged on the cleaning cavity and used for driving the automatic cleaning device of the coating platform, so that the automatic cleaning device of the coating platform can move; and the control system is in wireless connection with the automatic cleaning device of the coating platform, so that particles on the coating platform can be cleaned and detected by the automatic cleaning device of the coating platform under different frequencies, and the movement of the automatic cleaning device of the coating platform can be controlled.

Description

technical field [0001] The present application relates to the field of coating cleaning, in particular to an automatic cleaning device for a coating platform. Background technique [0002] In the production process of the display panel, a coating machine needs to be used to coat the photoresist. During the coating process, if there are foreign objects such as particles on the coating platform, the photoresist coating will be uneven, resulting in butterfly patterns, etc. The occurrence of uneven coating. Butterfly pattern cleaning requires a waste of heavy-duty materials and equipment in a timely manner. If it is not cleaned in time, it will lead to line width variation, resulting in poor characteristics, which will affect the quality of large-scale products. At the same time, the cleaning of the particles on the coating machine platform requires a long shutdown, and generally requires multiple cleanings to be successful, which affects the processing efficiency and success r...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B5/02G01N29/04
CPCB08B5/02G01N29/04G01N2291/2698
Inventor 潘龙
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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