Wavefront measurement equipment
A wavefront measurement and equipment technology, applied in the field of optical measurement, can solve the problems of low measurement accuracy and small wavefront error measurement range of the Hartmann wavefront test method.
Active Publication Date: 2021-12-07
CHANGCHUN UNIV OF SCI & TECH
View PDF7 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0004] In view of this, the embodiment of the present application provides a wavefront measurement device to solve the problem of small measurement range of wavefront error in the interference wavefront test method or low measurement accuracy of the Hartmann wavefront test method in the prior art
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0062] In order to better understand the technical solutions of the present application, the embodiments of the present application will be described in detail below in conjunction with the accompanying drawings.
[0063] It should be clear that the described embodiments are only some of the embodiments of the present application, not all of the embodiments. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of this application.
[0064] Terms used in the embodiments of the present application are only for the purpose of describing specific embodiments, and are not intended to limit the present application. The singular forms "a", "" and "the" used in the embodiments of this application and the appended claims are also intended to include plural forms unless the context clearly indicates otherwise.
[0065]It should be understood that the term "and / or" u...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The application provides a wavefront measurement device, including a laser, an optical processing module, a detection module, a Hartmann wavefront measurement module and an interference wavefront measurement module; the optical processing module is used to receive the light emitted by the laser, and separate the light The reflection forms the reference light and the light to be measured, and the reference light and the light to be measured are superimposed to form superimposed light; the detection module is used to receive the superimposed light and detect the optical path overlap between the reference light and the light to be measured; the Hartmann wavefront measurement module is used It is used to receive the superimposed light and obtain the wavefront error of the superimposed light through the Hartmann wavefront processing algorithm; the interference wavefront measurement module is used to receive the superimposed light and process the interference fringe pattern of the superimposed light to obtain the wavefront error of the superimposed light . When in use, the Hartmann wavefront measurement module can measure the larger wavefront error range of the superimposed light, and the interference wavefront measurement module can measure the higher wavefront accuracy of the superimposed light, and can measure a wide range of wavefront errors At the same time, the beneficial effect of high precision results is obtained.
Description
【Technical field】 [0001] The present application relates to the technical field of optical measurement, in particular to a wavefront measurement device. 【Background technique】 [0002] The wave front refers to the surface composed of particles that have just started to displace at a certain moment when the wave propagates in the medium. We call the surface formed by the points with the same vibration phase in the medium in the wave process as the wave front, and the wave front The frontal wavefront is the wavefront. [0003] With the rapid development of modern industry and science and technology, high-precision wavefront measurement technology is also constantly innovating. Wavefront measurement methods in the prior art mainly contain interference wavefront test method and Hartmann wavefront test method, wherein, the measurement accuracy of the interference wavefront test method is higher, but the wavefront error measurement range is smaller; Hartmann The wavefront error ...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Patents(China)
IPC IPC(8): G01J9/00G01J9/02
CPCG01J9/00G01J9/02G01J2009/002G01J2009/0238
Inventor 胡源王旭付跃刚景文博
Owner CHANGCHUN UNIV OF SCI & TECH