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Cathode plate for metal electrodeposition and manufacturing method thereof

A technology of metal electrodeposition and manufacturing method, applied in electrodes, electroforming, electrolysis components, etc., can solve the problems of difficult operation, uneven electroplating, etc., and achieve the effect of easy maintenance

Active Publication Date: 2020-09-15
SUMITOMO METAL MINING CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, for small pieces of electrolytic nickel, it is difficult to put them into the titanium basket because of their sharp corners.
Moreover, after putting such small pieces of electrolytic nickel into the titanium basket, sometimes its corners are hooked on the mesh of the titanium basket to cause so-called suspension, and the filling state in the titanium basket changes, which becomes the cause of uneven plating. important reason

Method used

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  • Cathode plate for metal electrodeposition and manufacturing method thereof
  • Cathode plate for metal electrodeposition and manufacturing method thereof
  • Cathode plate for metal electrodeposition and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0081] produced as figure 1 , figure 2 The cathode plate 1 is shown. Specifically, first, wet etching was performed on a stainless steel (cold-rolled material) metal plate 2 of 200 mm×100 mm×4 mm to form disc-shaped protrusions 2 a (18 pieces). At this time, the diameter of the protrusions 2a was 14 mm, the height L1 was 300 μm, and the minimum distance between the centers of adjacent protrusions 2 a was 21 mm. As a result of measuring the shape with a laser displacement meter, the height L2 of the approximately vertical portion 2d was 120 μm on average, the height L3 of the inclined portion 2e was 180 μm on average, and the length L4 of the inclined portion 2e was 420 μm on average.

[0082] Next, a thermosetting epoxy resin was applied on the flat portion 2 b of the metal plate 2 by the screen printing method, and cured by heating at 150° C. for 60 minutes to form the nonconductive film 3 .

Embodiment 2

[0084] The cathode plate 1 was fabricated in the same manner as in Example 1, except that the height L1 of the protruding portion 2 a of the metal plate 2 was 500 μm. In the cathode plate 1 produced in this way, the height L2 of the approximately vertical portion 2d was measured by a laser displacement meter and was 200 μm on average, the height L3 of the slope 2e was 300 μm on average, and the length L4 of the slope 2e was 650 μm on average.

Embodiment 3

[0086] The cathode plate 1 was fabricated in the same manner as in Example 1, except that the height L1 of the protruding portion 2 a of the metal plate 2 was 60 μm. In the cathode plate 1 produced in this way, the height L2 of the approximately vertical portion 2d was measured by a laser displacement meter and found to be 45 μm on average, the height L3 of the inclined portion 2e was 15 μm on average, and the length L4 of the inclined portion 2e was 20 μm on average.

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Abstract

The present invention provides a cathode plate for metal electrodeposition and a manufacturing method thereof, in which a nonconductive film on a metal plate is not easily peeled off and can be reused, and can be easily maintained even if the nonconductive film falls off. The cathode plate (1) of the present invention has: the metal plate (2) that is arranged with a plurality of disk-shaped protrusions (2a); and the flat portion (2) other than the protrusions (2a) of the metal plate (2) The nonconductive film (3) formed on 2b) has a shape consisting of a substantially vertical portion (2d) and an inclined portion (2e) on the side surface of the raised portion (2a). In addition, the height L1 of the raised portion (2a) is not less than 50 μm and not more than 1000 μm, and when the intersection point of the vertical line vertically downward from the position X at a distance of 20 μm from the outer peripheral edge of the raised portion and the side surface is Y, from The length L2 from X to Y is not less than 40 μm and not more than 0.8×L1 μm.

Description

technical field [0001] The present invention relates to a cathode plate for metal electrodeposition and a method for its manufacture. Background technique [0002] Conventionally, electrolytic nickel supplied as an anode material for nickel electroplating is generally put into a titanium basket serving as an anode support, and hung in a nickel electroplating tank for use. At this time, as the electrolytic nickel used as the anode raw material, the plate-shaped electrolytic nickel electrodeposited on the cathode plate was cut into small pieces of electrolytic nickel. [0003] However, since the corners of small pieces of electrolytic nickel are sharp, it is difficult to put them into the titanium basket. Moreover, after putting this small piece of electrolytic nickel into the titanium basket, sometimes its corners are hooked on the mesh of the titanium basket to cause so-called suspension, and the filling state in the titanium basket changes, which becomes the cause of uneve...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C25C7/02C23F1/02C25C1/08C25D17/12
CPCC23F1/02C25C1/08C25C7/02C25D17/12C25D17/16C25D1/003C25D1/20C23F1/04
Inventor 渡边宽人松冈逸见仙波祐辅小林宙
Owner SUMITOMO METAL MINING CO LTD