Apparatus for handling a carrier in a vacuum chamber, vacuum deposition system, and method of handling a carrier in a vacuum chamber
A technology of vacuum chamber and carrier, used in vacuum evaporation coating, semiconductor/solid-state device manufacturing, coating, etc.
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[0022] Reference will now be made in detail to various embodiments of the present disclosure, one or more examples of which are illustrated in the Figures. In the following description of the figures, the same reference numerals refer to the same components. Generally, only differences with respect to a single implementation are described. Each example is provided by way of explanation of the disclosure, and not meant to be a limitation of the disclosure.
[0023] Additionally, features illustrated or described as part of one embodiment can be used on or in conjunction with other embodiments to yield a further embodiment. The intended description includes such modifications and variations.
[0024] figure 1 is a schematic cross-sectional view of an apparatus 100 for processing carriers in a vacuum chamber 101 according to embodiments described herein.
[0025] According to this disclosure, "handling a carrier" may, for example, include operations such as moving a carrier, ...
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