Efficient vacuum electroplating device with mixed plating
A vacuum electroplating and high-efficiency technology, applied in vacuum evaporation plating, sputtering plating, ion implantation plating, etc., can solve the problems of specification adjustment of placement structure, reduction of target placement efficiency, and limitation of device use range, etc. Achieve the effects of improving placement efficiency, reducing placement difficulty, and increasing the scope of use
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[0018] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0019] see Figure 1-Figure 3 As shown, the present invention provides the following technical solutions: a high-efficiency vacuum electroplating device with mixed plating, including a base plate 1, a first tube body 2 is installed on the top of the base plate 1, and a second tube body is rotatably connected to one side of the base plate 1 3. The inner walls of the second pipe body 3 and the first pipe body 2 are installed with a gasket 4, and a film thickness...
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